摘要:
A thyristor has a semiconductor body exhibiting an n-p-n-p layer sequence with the small n-emitter and the p-emitter being contacted by first and second electrodes. The p-base layer has a third electrode connected to the first electrode through a first current source connectible with a first polarity. For triggering or quenching the thyristor as quickly and efficiently as possible, the n-base layer has a fourth electrode connected to the second electrode through a second connectible current source, the second current source being connectible to the fourth electrode with a second polarity opposite the first polarity.
摘要:
A thyristor has a semiconductor member with a pnpn-layer sequence, a plurality of n(p)-emitter parts, and switching transistors arranged at the edges of the n(p)-emitter parts. The switching transistors respectively include a p(n) semiconductor zone inserted in one of the n(p)-emitter parts, a partial zone of the p(n)-base, and an intermediately disposed channel zone covered by an insulated gate. Rapid and effective reduction of the electron-hole plasma flooding the p-base and n-base during quenching of the thyristor is achieved by a current source connected between electrodes for the p(n) semiconductor zones and a cathode (anode) feed line, the current source delivering an extraction current pulse.
摘要:
A thyristor has a plurality of gate-controlled MIS-FET structures which serve the purpose of controlling emitter short-circuit paths with the objective of achieving stabilization short-circuits and, if necessary, quenching short-circuits. MIS-FET structures are disclosed which are effective, yet make economical use of surface area. In accordance with the invention, this is achieved since structures are provided at a plurality of recesses of the layered n-type emitter such that the electrode contacting the n-type emitter has recesses permitting it to contact the MIS-FET structures only on a border side.
摘要:
Homogeneously doped Si monocrystals of the n-type are produced from p- or n-type Si crystals having a random dopant concentration in radial and axial directions of the crystal and the dopant concentration within such crystals is adjusted by subjecting such crystals to controlled thermal neutron radiation.