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公开(公告)号：US20150273656A1
公开(公告)日：2015-10-01
申请号：US14736568
申请日：2015-06-11
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
摘要翻译： 描述了具有基础层和抛光表面层的抛光垫。 在一个实例中，用于抛光衬底的抛光垫包括基础层。 抛光表面层结合到基础层。 还描述了制造具有结合到基础层的抛光表面层的抛光垫的方法。
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公开(公告)号：US20150273655A1
公开(公告)日：2015-10-01
申请号：US14732497
申请日：2015-06-05
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
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公开(公告)号：US20150266160A1
公开(公告)日：2015-09-24
申请号：US14727586
申请日：2015-06-01
摘要： Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described.
摘要翻译： 描述具有开槽基础层和抛光表面层的抛光垫。 在一个示例中，用于抛光衬底的抛光垫包括其中布置有凹槽图案的基础层。 连续的抛光表面层附着到基础层的凹槽的图案上。 在另一个实例中，用于抛光衬底的抛光垫包括具有设置在其上的突起图案的表面的基础层。 每个突起具有顶表面和侧壁。 不连续的抛光表面层附着到基础层上并且包括离散的部分。 每个离散部分附接到基础层的相应的一个突起的顶表面。 还描述了制造具有与沟槽基础层结合的抛光表面层的抛光垫的方法。
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公开(公告)号：US09067298B2
公开(公告)日：2015-06-30
申请号：US13306849
申请日：2011-11-29
摘要： Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described.
摘要翻译： 描述具有开槽基础层和抛光表面层的抛光垫。 在一个示例中，用于抛光衬底的抛光垫包括其中布置有凹槽图案的基础层。 连续的抛光表面层附着到基础层的凹槽的图案上。 在另一个实例中，用于抛光衬底的抛光垫包括具有设置在其上的突起图案的表面的基础层。 每个突起具有顶表面和侧壁。 不连续的抛光表面层附着到基础层上并且包括离散的部分。 每个离散部分附接到基础层的相应的一个突起的顶表面。 还描述了制造具有与沟槽基础层结合的抛光表面层的抛光垫的方法。
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公开(公告)号：US20140167305A1
公开(公告)日：2014-06-19
申请号：US14183894
申请日：2014-02-19
申请人： Ping Huang , Diane Scott , James P. LaCasse , William C. Allison
发明人： Ping Huang , Diane Scott , James P. LaCasse , William C. Allison
IPC分类号： B24B37/24
摘要： Polishing pads with multi-modal distributions of pore diameters are described. Methods of fabricating polishing pads with multi-modal distributions of pore diameters are also described.
摘要翻译： 描述了具有多孔分布孔径的抛光垫。 还描述了制造具有多孔分布的孔径的抛光垫的方法。
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公开(公告)号：US09067297B2
公开(公告)日：2015-06-30
申请号：US13306845
申请日：2011-11-29
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
摘要翻译： 描述了具有基础层和抛光表面层的抛光垫。 在一个实例中，用于抛光衬底的抛光垫包括基础层。 抛光表面层结合到基础层。 还描述了制造具有结合到基础层的抛光表面层的抛光垫的方法。
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公开(公告)号：US08702479B2
公开(公告)日：2014-04-22
申请号：US12979123
申请日：2010-12-27
申请人： Ping Huang , Diane Scott , James P. LaCasse , William C. Allison
发明人： Ping Huang , Diane Scott , James P. LaCasse , William C. Allison
IPC分类号： B24D11/00
摘要： Polishing pads with multi-modal distributions of pore diameters are described. Methods of fabricating polishing pads with multi-modal distributions of pore diameters are also described.
摘要翻译： 描述了具有多孔分布孔径的抛光垫。 还描述了制造具有多孔分布的孔径的抛光垫的方法。
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8.发明申请POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OPENING ABOVE A TRANSPARENT FOUNDATION LAYER 有权具有抛光表面的抛光垫具有透气性或开放于透明的基础层公开(公告)号：US20130324020A1
公开(公告)日：2013-12-05
申请号：US13488149
申请日：2012-06-04
申请人： Paul Andre Lefevre , William C. Allison , James P. LaCasse , Diane Scott , Alexander William Simpson , Ping Huang , Leslie M. Charns
发明人： Paul Andre Lefevre , William C. Allison , James P. LaCasse , Diane Scott , Alexander William Simpson , Ping Huang , Leslie M. Charns
CPC分类号： B24B37/205 , B24B37/16 , B24B37/22 , B24B37/26 , B24D11/003 , B24D18/0009
摘要： Polishing pads with a polishing surface layer having an aperture or opening above a transparent foundation layer are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a global top surface and a transparent region. A polishing surface layer is attached to the global top surface of the foundation layer. The polishing surface layer has a polishing surface and a back surface. An aperture is disposed in the polishing pad from the back surface through to the polishing surface of the polishing surface layer, and aligned with the transparent region of the foundation layer. The foundation layer provides an impermeable seal for the aperture at the back surface of the polishing surface layer. Methods of fabricating such polishing pads are also described.
摘要翻译： 描述具有在透明基底层上方具有开口或开口的抛光表面层的抛光垫。 在一个实例中，用于抛光衬底的抛光垫包括具有全局顶表面和透明区域的基础层。 抛光表面层附着到基础层的全局顶表面上。 抛光表面层具有抛光表面和后表面。 在抛光垫中从研磨表面层的后表面到抛光表面设置孔，并与基底层的透明区域对齐。 基础层为抛光表面层的后表面处的孔提供不可渗透的密封。 还描述了制造这种抛光垫的方法。
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公开(公告)号：US20130137350A1
公开(公告)日：2013-05-30
申请号：US13306845
申请日：2011-11-29
申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
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公开(公告)号：US20130137349A1
公开(公告)日：2013-05-30
申请号：US13306849
申请日：2011-11-29
摘要： Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described.
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