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公开(公告)号：US20070085987A1
公开(公告)日：2007-04-19
申请号：US11252230
申请日：2005-10-18
申请人： Joost Ottens , Aschwin Lodewijk Hendricus Van Meer , Wim Tel , Jacob Vink , Rene Theodorus Compen , Petrus Gerrits
发明人： Joost Ottens , Aschwin Lodewijk Hendricus Van Meer , Wim Tel , Jacob Vink , Rene Theodorus Compen , Petrus Gerrits
IPC分类号： G03B27/42
CPC分类号： G03F7/70916 , G03F7/7065 , G03F7/707 , G03F9/7003
摘要： The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.
摘要翻译： 本发明提供一种用于光刻设备的高度检测装置。 高度测绘装置包括高度测绘单元，用于提供待放置在光刻设备的辐射束中的待放置物体的顶表面的至少一个高度图，待施加到其上的夹持力夹持在被构造的支撑体上 支持对象。 高度测绘装置还包括控制单元，用于控制映射单元以相对于至少两个不同的夹紧压力水平提供对象的至少一个高度图。
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公开(公告)号：US20100195080A1
公开(公告)日：2010-08-05
申请号：US12451749
申请日：2008-06-20
申请人： Rene Theodorus Compen , Jahannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Martin Frans Pierre Smeets
发明人： Rene Theodorus Compen , Jahannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Martin Frans Pierre Smeets
CPC分类号： G03F7/70783 , G03F7/707 , H01L21/6838 , H01L21/68742 , H01L21/6875
摘要： The present invention relates to a c lamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.
摘要翻译： 本发明涉及一种构造成将物体（20,120）夹持在支撑件（1,101）上的梳理装置。 夹紧装置包括：第一装置，其被配置为使用第一力将物体和支撑件彼此远离;以及第二装置，其被配置为使用第二力将物体和支撑件朝向彼此强制。 第一装置和第二装置构造成在完成将物体夹持在支撑件上之前分别同时施加第一力和第二力以将物体成形为期望的形状。
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公开(公告)号：US20060006340A1
公开(公告)日：2006-01-12
申请号：US10886050
申请日：2004-07-08
CPC分类号： G03F7/707 , G03F7/70783 , G03F7/7095 , G03F7/70975
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a beam production system configured to provide a beam of radiation, pattern the beam, and project the patterned beam onto a target portion of a substrate, and a support table for supporting an article so that a planar surface of the article lies in a predetermined plane transverse to a propagation direction of the projection beam. The support table has a support surface and an array of protrusions disposed on the support surface that are constructed and arranged to support the article. A position selective material surface melting device is configured to act on individual protrusions when the support table is operable in the apparatus, such that localized areas of an upper surface of the protrusion are melted and subsequently allowed to cool, thereby causing the localized areas to be raised with respect to the upper surface of the protrusion.
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4.发明申请Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus 有权平版印刷设备，清洁系统和用于原位去除光刻设备中部件污染的清洁方法公开(公告)号：US20060072085A1
公开(公告)日：2006-04-06
申请号：US10957754
申请日：2004-10-05
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/707
摘要： A lithographic apparatus is disclosed. The apparatus includes a cleaning system for cleaning a component in the lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.
摘要翻译： 公开了一种光刻设备。 该设备包括用于在原位清洁光刻设备中的部件的清洁系统。 清洁系统被布置成在要清洁的部件上的预定位置附近提供清洁环境。 该系统还布置成提供基本上与在预定位置处存在的污染物类型无关的清洁环境。
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