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    Projection system for EUV lithography
    3.
    发明授权
    Projection system for EUV lithography 有权
    EUV光刻投影系统

    公开(公告)号：US07151592B2

    公开(公告)日：2006-12-19

    申请号：US10454830

    申请日：2003-06-04

    申请人： Russell Hudyma ,  Hans-Jürgen Mann ,  Udo Dinger

    发明人： Russell Hudyma ,  Hans-Jürgen Mann ,  Udo Dinger

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G02B5/10

    CPC分类号： G03F7/70233 ,  G02B17/0652 ,  G02B17/0657 ,  G03F7/70275

    摘要： An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.

    摘要翻译： EUV光学投影系统包括用于将物体（OB）成像到图像（IM）的至少六个反射镜（M 1，M 2，M 3，M 4，M 5，M 6）。 优选地，至少一个镜对配置为至少相位补偿镜对。 该系统优选地被配置成沿着从物体（OB）到第二反射镜（M 2）和第三反射镜（M 3）之间的图像（IM））的光路形成中间图像（IMI），使得第一 反射镜（M 1）和第二反射镜（M 2）形成第一光学组（G 1）和第三反射镜（M 3），第四反射镜（M 4），第五反射镜（M5）和第六反射镜 （M 6）形成第二光学组（G 1）。 该系统还优选地包括沿着从物体（OB）到第一反射镜（M 1）和第二反射镜（M 2）之间的图像（IM））的光路定位的孔径光阑（APE）。 第二镜（M 2）优选为凸面，第三镜（M 3）优选为凹面。 该系统优选地形成数值孔径大于0.18的图像（IM）。

    Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
    4.
    发明申请
    Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 有权
    投影物镜包括多个镜子，前视镜M3

    公开(公告)号：US20060171040A1

    公开(公告)日：2006-08-03

    申请号：US11356525

    申请日：2006-02-16

    申请人： Hans-Juergen Mann ,  Russell Hudyma ,  Alexander Epple

    发明人： Hans-Juergen Mann ,  Russell Hudyma ,  Alexander Epple

    IPC分类号： G02B17/00

    CPC分类号： G02B17/0892 ,  G02B17/0844 ,  G02B17/0856 ,  G03F7/70225

    摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.

    摘要翻译： 根据一个示例性实施例，提供了一种投影物镜，并且包括至少两个非平面（弯曲）反射镜，其中，沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离 路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。 在一个示例性实施例中，第一折射表面与单遍型透镜相关联。 当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。 优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。

    Projection system for EUV lithography
    6.
    发明申请
    Projection system for EUV lithography 有权

    公开(公告)号：US20060050258A1

    公开(公告)日：2006-03-09

    申请号：US11243407

    申请日：2005-10-04

    申请人： Russell Hudyma ,  Hans-Jurgen Mann ,  Udo Dinger

    发明人： Russell Hudyma ,  Hans-Jurgen Mann ,  Udo Dinger

    IPC分类号： G03B27/54

    CPC分类号： G02B17/0657 ,  G02B17/0652 ,  G03B27/54 ,  G03F7/70233 ,  G03F7/70275

    摘要： An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).

    High numerical aperture ring field projection system for extreme ultraviolet lithography
    8.
    发明授权
    High numerical aperture ring field projection system for extreme ultraviolet lithography 有权
    用于极紫外光刻的高数值孔径环形场投影系统

    公开(公告)号：US6033079A

    公开(公告)日：2000-03-07

    申请号：US270127

    申请日：1999-03-15

    申请人： Russell Hudyma

    发明人： Russell Hudyma

    IPC分类号： G02B17/06 ,  G03F7/20 ,  G02B5/08

    CPC分类号： G03F7/70233 ,  G02B17/0657 ,  G03F7/70275

    摘要： An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.

    摘要翻译： 用于投影光刻照相机的全反射光学系统具有EUV辐射源，要在晶片上成像的晶片和掩模。 光学系统包括第一凹面镜，第二镜，第三凸面镜，第四凹面镜，第五凸面镜和第六凹面镜。 该系统被配置为使得六个反射镜中的五个以小于大致12度的入射角接收主光线，并且六个反射镜中的每一个以大于15°的入射角接收主光线。 六个反射面中的四个具有小于大约7μm的非球面偏离。 六个反射面中的五个具有小于14μm的非球面偏离。 六个反射面中的每一个都具有小于16.0μm的非球面偏离。

    Laser thin film poly-silicon annealing optical system
    9.
    发明授权
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US08362391B2

    公开(公告)日：2013-01-29

    申请号：US12979292

    申请日：2010-12-27

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。

    LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM
    10.
    发明申请
    LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM 有权
    激光薄膜聚硅氧烷退火光学系统

    公开(公告)号：US20110163077A1

    公开(公告)日：2011-07-07

    申请号：US12979292

    申请日：2010-12-27

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/06 ,  B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。