Illumination devices and methods of fabrication thereof
    1.
    发明授权
    Illumination devices and methods of fabrication thereof 有权
    照明装置及其制造方法

    公开(公告)号:US08979349B2

    公开(公告)日:2015-03-17

    申请号:US12789404

    申请日:2010-05-27

    摘要: Illumination devices and methods of making same are disclosed. In one embodiment, an illumination apparatus includes a light source, a light guide having a planar first surface, a first end and a second end, and a length therebetween, the light guide positioned to receive light from the light source into the light guide first end, and the light guide configured such that light from the light source provided into the first end of the light guide propagates towards the second end, and a plurality of light turning features that are configured to reflect light propagating towards the second end of the light guide out of the planar first surface of the light guide, each light turning feature having a turning surface and an interferometric stack formed on the turning surface.

    摘要翻译: 公开了照明装置及其制造方法。 在一个实施例中,照明装置包括光源,具有平面第一表面的光导,第一端和第二端以及它们之间的长度,所述光导被定位成将来自光源的光首先接收到光导中 并且所述光导构造成使得设置在所述光导的所述第一端的光源的光朝向所述第二端传播;以及多个光转动特征,其被配置为反射朝向所述光的第二端传播的光 引导出光导的平面第一表面,每个光转动特征具有形成在转向表面上的转动表面和干涉叠层。

    BACKSIDE PATTERNING TO FORM SUPPORT POSTS IN AN ELECTROMECHANICAL DEVICE
    5.
    发明申请
    BACKSIDE PATTERNING TO FORM SUPPORT POSTS IN AN ELECTROMECHANICAL DEVICE 审中-公开
    在电气设备中形成支持位置的背景图

    公开(公告)号:US20120194897A1

    公开(公告)日:2012-08-02

    申请号:US13014973

    申请日:2011-01-27

    申请人: Fan Zhong Sapna Patel

    发明人: Fan Zhong Sapna Patel

    IPC分类号: G02B26/00 H01L33/60

    CPC分类号: G02B26/001

    摘要: This disclosure provides systems, methods and apparatus for backside patterning of structures in electromechanical devices. In one aspect, backside patterning of supports in an electromechanical device allows the size of the supports to be reduced, increasing the active region of the electromechanical device. In electromechanical devices having black masks, the black masks may include a partially transmissive aperture aligned with the supports which enable backside patterning of the support through the black mask. The black mask may include an interferometric black mask in which an upper reflective layer has been patterned to form an aperture extending therethrough.

    摘要翻译: 本公开提供了用于机电装置中的结构背面图案化的系统,方法和装置。 在一个方面,机电装置中的支撑件的背面图案化可以减小支撑件的尺寸,增加机电装置的有效区域。 在具有黑色掩模的机电装置中,黑色掩模可以包括与支撑件对准的部分透射孔,其能够通过黑色掩模进行背面图案化支撑。 黑色掩模可以包括干涉式黑色掩模,其中上反射层已被图案化以形成延伸穿过其中的孔。

    ILLUMINATION DEVICES AND METHODS OF FABRICATION THEREOF
    6.
    发明申请
    ILLUMINATION DEVICES AND METHODS OF FABRICATION THEREOF 有权
    照明装置及其制造方法

    公开(公告)号:US20100302616A1

    公开(公告)日:2010-12-02

    申请号:US12789415

    申请日:2010-05-27

    IPC分类号: G02B26/00 C23F1/00 B29D11/00

    摘要: Illumination devices and methods of making same are disclosed. In one embodiment, a display device includes a light modulating array and a light guide configured to receive light into at least one edge of the light guide. The light guide can be characterized by a first refractive index. The display device can also include a light turning layer disposed such that the light guide is at least partially between the turning layer and the array. The turning layer can comprise an inorganic material characterized by a second refractive index that is substantially the same as the first refractive index.

    摘要翻译: 公开了照明装置及其制造方法。 在一个实施例中,显示装置包括光调制阵列和被配置为将光接收到光导的至少一个边缘中的光导。 光导可以由第一折射率表征。 显示装置还可以包括光转向层,其设置成使得光导至少部分地在转向层和阵列之间。 转向层可以包括以与第一折射率基本相同的第二折射率为特征的无机材料。

    Multi-thickness layers for MEMS and mask-saving sequence for same
    8.
    发明授权
    Multi-thickness layers for MEMS and mask-saving sequence for same 有权
    用于MEMS的多层厚层和相同的掩模保存顺序

    公开(公告)号:US07719754B2

    公开(公告)日:2010-05-18

    申请号:US12242189

    申请日:2008-09-30

    申请人: Sapna Patel Fan Zhong

    发明人: Sapna Patel Fan Zhong

    IPC分类号: G02B26/00 G02B26/08

    摘要: In various embodiments described herein, methods for forming a plurality of microelectromechanical systems (MEMS) devices on a substrate are described. The MEMS devices comprise x number of different sacrificial or mechanical structures with x number of different sacrificial structure thicknesses or mechanical structure stiffnesses and wherein the x number of sacrificial or mechanical structures are formed by x-1 depositions and x-1 masks.

    摘要翻译: 在本文描述的各种实施例中,描述了在衬底上形成多个微机电系统(MEMS)器件的方法。 MEMS器件包括x个不同的具有x个不同牺牲结构厚度或机械结构刚度的牺牲或机械结构,并且其中x个牺牲或机械结构由x-1沉积和x-1掩模形成。

    Method for producing and testing a corrosion-resistant channel in a silicon device
    9.
    发明授权
    Method for producing and testing a corrosion-resistant channel in a silicon device 有权
    在硅器件中生产和测试耐腐蚀通道的方法

    公开(公告)号:US07125739B2

    公开(公告)日:2006-10-24

    申请号:US10929145

    申请日:2004-08-27

    IPC分类号: H01L21/00

    摘要: A method for producing a corrosion-resistant channel in a wetted path of a silicon device enables such device to be used with corrosive compounds, such as fluorine. A wetted path of a MEMS device is coated with either (1) an organic compound resistant to attack by atomic fluorine or (2) a material capable of being passivated by atomic fluorine. The device is then exposed to a gas that decomposes into active fluorine compounds when activated by a plasma discharge. One example of such a gas is CF4, an inert gas that is easier and safer to work with than volatile gases like ClF3. The gas will passivate the material (if applicable) and corrode any exposed silicon. The device is tested in such a manner that any unacceptable corrosion of the wetted path will cause the device to fail. If the device operates properly, the wetted path is deemed to be resistant to corrosion by fluorine or other corrosive compounds, as applicable.

    摘要翻译: 在硅装置的润湿路径中制造耐腐蚀通道的方法使得这种装置能够与诸如氟的腐蚀性化合物一起使用。 MEMS器件的润湿路径涂覆有(1)抗原子氟侵蚀的有机化合物或(2)能够被原子氟钝化的材料。 然后将该装置暴露于当通过等离子体放电激活时分解成活性氟化合物的气体。 这种气体的一个实例是CF 4 SO 3,惰性气体比诸如ClF 3 3的挥发性气体更容易和更安全地工作。 气体将钝化材料(如果适用)并腐蚀任何暴露的硅。 该装置以这样的方式被测试,使得湿润路径的任何不可接受的腐蚀将导致装置失效。 如果设备正常工作,则湿润路径被认为是耐氟或其他腐蚀性化合物的腐蚀,如适用的。

    Illumination devices and methods of fabrication thereof
    10.
    发明授权
    Illumination devices and methods of fabrication thereof 有权
    照明装置及其制造方法

    公开(公告)号:US09121979B2

    公开(公告)日:2015-09-01

    申请号:US12789415

    申请日:2010-05-27

    摘要: Illumination devices and methods of making same are disclosed. In one embodiment, a display device includes a light modulating array and a light guide configured to receive light into at least one edge of the light guide. The light guide can be characterized by a first refractive index. The display device can also include a light turning layer disposed such that the light guide is at least partially between the turning layer and the array. The turning layer can comprise an inorganic material characterized by a second refractive index that is substantially the same as the first refractive index.

    摘要翻译: 公开了照明装置及其制造方法。 在一个实施例中,显示装置包括光调制阵列和被配置为将光接收到光导的至少一个边缘中的光导。 光导可以由第一折射率表征。 显示装置还可以包括光转向层,其设置成使得光导至少部分地在转向层和阵列之间。 转向层可以包括以与第一折射率基本相同的第二折射率为特征的无机材料。