公开(公告)号：US09134527B2

公开(公告)日：2015-09-15

申请号：US13079599

申请日：2011-04-04

申请人： Hojin Lee ,  Fan Zhong ,  Yi Tao

发明人： Hojin Lee ,  Fan Zhong ,  Yi Tao

IPC分类号： G02B26/00 ,  B81B7/00

CPC分类号： G02B26/001 ,  B81B7/0006 ,  B81B2201/047 ,  Y10T29/49002

摘要： This disclosure provides systems, methods and apparatuses for pixel vias. In one aspect, a method of forming an electromechanical device having a plurality of pixels includes depositing an electrically conductive black mask on a substrate at each of four corners and along at least one edge region of each pixel, depositing a dielectric layer over the black mask, depositing an optical stack including a stationary electrode over the dielectric layer, and depositing a mechanical layer over the optical stack. The method further includes providing a conductive via in a first pixel of the plurality of pixels, the via disposed in the dielectric layer and electrically connecting the stationary electrode to the black mask, the via disposed in a position along an edge of the first pixel, spaced offset from the edge of the first pixel in a direction towards the center of the first pixel.

摘要翻译： 本公开提供了用于像素通孔的系统，方法和装置。 在一个方面，一种形成具有多个像素的机电装置的方法包括在四个角中的每一个并且沿着每个像素的至少一个边缘区域在基板上沉积导电黑色掩模，在黑色掩模上沉积介电层 在电介质层上沉积包括固定电极的光学堆叠，并在光学堆叠上沉积机械层。 所述方法还包括在所述多个像素的第一像素中提供导电通孔，所述通孔设置在所述电介质层中，并且将所述固定电极电连接到所述黑色掩模，所述通孔设置在沿着所述第一像素的边缘的位置， 在朝向第一像素的中心的方向上偏离第一像素的边缘。

公开(公告)号：US20140071139A1

公开(公告)日：2014-03-13

申请号：US13614973

申请日：2012-09-13

申请人： Kostadin D. Djordjev ,  Alok Govil ,  Yi Tao ,  Fan Zhong

发明人： Kostadin D. Djordjev ,  Alok Govil ,  Yi Tao ,  Fan Zhong

IPC分类号： G06T1/00 ,  B05D5/12 ,  G02B26/00 ,  B05D5/06

CPC分类号： G02B26/001

摘要： Pixels that include display elements that are configured with different structural dimensions corresponding to the color of light they provide are disclosed. In one implementation, a display device includes an array having a plurality of electromechanical pixels disposed on a substrate, each pixel including at least a first display element and a second display element. Each of the first and second display elements interferometrically modulating light by moving a reflective element between a relaxed position spaced apart from the substrate to an actuated position further away from the substrate than the relaxed position by applying a voltage across the reflective element and a stationary electrode. The stationary electrode of each display element is sized to provide actuation of the movable reflective element using the same actuation voltage even though the electrical gap through which the reflective element moves is different within a pixel.

摘要翻译： 公开了包括配置有不同结构尺寸的显示元件的像素，其对应于它们提供的光的颜色。 在一个实施方式中，显示装置包括具有设置在基板上的多个机电像素的阵列，每个像素至少包括第一显示元件和第二显示元件。 第一和第二显示元件中的每一个通过在反射元件和电极之间施加电压使反射元件在与基板间隔开的松弛位置与远离基板的致动位置之间移动而干涉地调制光， 。 每个显示元件的固定电极的尺寸设置成使用相同的致动电压来提供可移动反射元件的致动，即使反射元件移动的电隙在像素内是不同的。

公开(公告)号：US20130088498A1

公开(公告)日：2013-04-11

申请号：US13269285

申请日：2011-10-07

申请人： Yi Tao ,  Kostadin Djordjev ,  Fan Zhong

发明人： Yi Tao ,  Kostadin Djordjev ,  Fan Zhong

IPC分类号： G06T1/00 ,  G02B26/00 ,  H01L21/30

CPC分类号： G02B26/001

摘要： Systems, methods and apparatus are provided for electromechanical systems devices having a non-uniform gap under a mechanical layer. An electromechanical systems device includes a movable element supported at its edges over a substrate by at least two support structures. The movable element can be spaced from the substrate by a gap having two or more different heights in two or more corresponding distinct regions. The gap has a first height in a first region below the gap, such as an active area of the device, and a second height in a second region adjacent the support structure. In an interferometric modulator implementation, the second region can be encompasses within an anchor region with a black mask.

摘要翻译： 为在机械层下具有不均匀间隙的机电系统装置提供系统，方法和装置。 机电系统装置包括通过至少两个支撑结构在其衬底上的边缘处支撑的可移动元件。 可移动元件可以在两个或更多个相应的不同区域中与衬底间隔开具有两个或更多个不同高度的间隙。 间隙在间隙下方的第一区域中具有第一高度，例如装置的有效面积，以及与支撑结构相邻的第二区域中的第二高度。 在干涉式调制器实现中，第二区域可以包围在具有黑色掩模的锚定区域内。

公开(公告)号：US08270056B2

公开(公告)日：2012-09-18

申请号：US12409425

申请日：2009-03-23

申请人： Yi Tao ,  Fan Zhong ,  Marc Mignard

发明人： Yi Tao ,  Fan Zhong ,  Marc Mignard

IPC分类号： G02B26/08 ,  G02B7/188

CPC分类号： G02B26/001 ,  B81B3/0086 ,  B81B2201/047 ,  B81B2203/053 ,  B81B2207/053

摘要： An electromechanical systems device includes a plurality of supports disposed over a substrate and a deformable reflective layer disposed over the plurality of supports. The deformable reflective layer includes a plurality of substantially parallel columns extending in a first direction. Each column has one or more slots extending in a second direction generally perpendicular to the first direction. The slots can be created at boundary edges of sub-portions of the columns so as to partially mechanically separate the sub-portions without electrically disconnecting them. A method of fabricating an electromechanical device includes depositing an electrically conductive deformable reflective layer over a substrate, removing one or more portions of the deformable layer to form a plurality of electrically isolated columns, and forming at least one crosswise slot in at least one of the columns.

摘要翻译： 机电系统装置包括设置在基板上的多个支撑件和设置在多个支撑件上的可变形反射层。 可变形反射层包括沿第一方向延伸的多个大致平行的列。 每列具有一个或多个槽，其大致垂直于第一方向在第二方向上延伸。 可以在列的子部分的边界边缘处创建槽，以便部分地机械地分离子部分而不断开它们。 制造机电装置的方法包括在衬底上沉积导电的可变形反射层，去除可变形层的一个或多个部分以形成多个电隔离的柱，并且在至少一个 列。

公开(公告)号：US20120194496A1

公开(公告)日：2012-08-02

申请号：US13019159

申请日：2011-02-01

申请人： Fan Zhong ,  David Heald ,  Wenyu Sun ,  Chuan Pu ,  Chandra Tupelly

发明人： Fan Zhong ,  David Heald ,  Wenyu Sun ,  Chuan Pu ,  Chandra Tupelly

IPC分类号： G06F3/038 ,  G02B26/00 ,  H02N11/00 ,  B05D5/12 ,  C03C15/00

CPC分类号： G02B26/001

摘要： This disclosure provides systems, methods and apparatuses for supporting a mechanical layer. In one aspect, an electromechanical systems device includes a substrate, a mechanical layer, and a post positioned on the substrate for supporting the mechanical layer. The mechanical layer is spaced from the substrate and defines one side of a gap between the mechanical layer and the substrate, and the mechanical layer is movable in the gap between an actuated position and a relaxed position. The post includes a wing portion in contact with a portion of the mechanical layer, the wing portion positioned between the gap and the mechanical layer. The wing portion can include a plurality of layers configured to control the curvature of the mechanical layer.

摘要翻译： 本公开提供了用于支撑机械层的系统，方法和装置。 在一个方面，机电系统装置包括基板，机械层和位于基板上用于支撑机械层的柱。 机械层与衬底间隔开并且限定机械层和衬底之间的间隙的一侧，并且机械层可以在致动位置和松弛位置之间的间隙中移动。 该柱包括与机械层的一部分接触的翼部，翼部位于间隙和机械层之间。 机翼部分可以包括被配置为控制机械层的曲率的多个层。

公开(公告)号：US07609917B2

公开(公告)日：2009-10-27

申请号：US12079930

申请日：2008-03-28

申请人： Farnaz Parhami ,  Liang Zhao ,  Fan Zhong

发明人： Farnaz Parhami ,  Liang Zhao ,  Fan Zhong

IPC分类号： G02B6/12 ,  G02B6/10 ,  G02B6/34

CPC分类号： G02B6/12023 ,  G02B6/126

摘要： A method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a tuned top clad is described herein. In one example, a dopant concentration within a top cladding material is between 3-6% (wt.). Given a tuned top cladding composition, a width of the waveguide core is pre-selected such that birefringence is minimized, i.e., a zero, or near zero. The desirable width of the waveguide core is determined by calculating the distribution of stress in the top cladding over a change in temperature. From this distribution of stress, a relationship between the polarization dependent wavelength and variable widths of the waveguide in the arrayed waveguide grating are determined. This relationship determines a zero value, or near zero value, of polarization dependent wavelength for a given range of waveguide widths. Accordingly, the width of the waveguide may be selected such that the polarization dependent wavelength is minimized.

摘要翻译： 本文描述了通过选择用于调谐顶部包层的波导芯宽度来控制波导双折射的方法和装置。 在一个实例中，顶部包层材料内的掺杂剂浓度在3-6％（重量）之间。 给定一个调整的顶部包层组成，预先选择波导芯的宽度，使得双折射最小化，即零或接近零。 通过计算在顶部包层中的应力在温度变化中的分布来确定波导芯的期望宽度。 根据这种应力分布，确定阵列波导光栅中波导的偏振相关波长与可变宽度之间的关系。 对于给定的波导宽度范围，该关系确定偏振相关波长的零值或近零值。 因此，可以选择波导的宽度使得偏振相关波长最小化。

公开(公告)号：US20070047889A1

公开(公告)日：2007-03-01

申请号：US11591085

申请日：2006-11-01

申请人： Fan Zhong ,  Michael Lennon

发明人： Fan Zhong ,  Michael Lennon

IPC分类号： G02B6/10

CPC分类号： C23C16/401 ,  G02B6/122 ,  G02B2006/121

摘要： A method of depositing a top clad layer for an optical waveguide of a planar lightwave circuit. A GeBPSG top clad layer for an optical waveguide structure of a planar lightwave circuit is fabricated such that the top clad layer comprises doped silica glass, wherein the dopant includes Ge (Germanium), P (Phosphorus), and B (Boron). In depositing a top clad layer for the optical waveguide, three separate doping gasses (e.g., GeH4, PH3, and B2H6) are added during the PECVD (plasma enhanced chemical vapor deposition) process to make Ge, P and B doped silica glass (GeBPSG). The ratio of the Ge, P, and B dopants is configured to reduce the formation of crystallization areas within the top clad layer and maintain a constant refractive index within the top clad layer across an anneal temperature range. A thermal anneal process for the top clad layer can be a temperature within a range of 950 C to 1050 C. The GeBPSG top clad layer reduces the insertion loss of passive arrayed waveguide grating devices and active planar lightwave circuit devices.

摘要翻译： 一种沉积用于平面光波电路的光波导的顶包层的方法。 制造用于平面光波电路的光波导结构的GeBPSG顶包层，使得顶包层包括掺杂的石英玻璃，其中掺杂剂包括Ge（锗），P（磷）和B（硼）。 在沉积用于光波导的顶部包覆层时，三个单独的掺杂气体（例如，GeH 4，PH 3 3和B 2 H） 在PECVD（等离子体增强化学气相沉积）工艺中添加制备Ge，P和B掺杂的石英玻璃（GeBPSG）的工艺。 Ge，P和B掺杂剂的比例被配置为减少顶部包层内的结晶区域的形成，并且在整个退火温度范围内在顶部包覆层内保持恒定的折射率。 用于顶部包层的热退火工艺可以是在950℃至1050℃范围内的温度.GeBPSG顶部包层降低了无源阵列波导光栅器件和有源平面光波电路器件的插入损耗。

公开(公告)号：US06850670B2

公开(公告)日：2005-02-01

申请号：US09894049

申请日：2001-06-28

申请人： Farnaz Parhami ,  Liang Zhao ,  Fan Zhong

发明人： Farnaz Parhami ,  Liang Zhao ,  Fan Zhong

IPC分类号： G02B6/12 ,  G02B6/126 ,  G02B6/34

CPC分类号： G02B6/126 ,  G02B2006/121

摘要： A method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a tuned top clad is described herein. A tuned top cladding describes a pre-existing dopant concentration within a top cladding material. Given a tuned top cladding composition, a width of the waveguide core is pre-selected such that birefringence is minimized, i.e., a zero, or near zero. The desirable width of the waveguide core is determined by calculating the distribution of stress in the top cladding over a change in temperature. From this distribution of stress, a relationship between the polarization dependent wavelength and variable widths of the waveguide in the arrayed waveguide grating are determined. This relationship determines a zero value, or near zero value, of polarization dependent wavelength for a given range of waveguide widths. Accordingly, the width of the waveguide may be selected such that the polarization dependent wavelength is minimized.

摘要翻译： 本文描述了通过选择用于调谐顶部包层的波导芯宽度来控制波导双折射的方法和装置。 调谐的顶部包层描述了顶部包层材料中预先存在的掺杂剂浓度。 给定一个调整的顶部包层组成，预先选择波导芯的宽度，使得双折射最小化，即零或接近零。 通过计算在顶部包层中的应力在温度变化中的分布来确定波导芯的期望宽度。 根据这种应力分布，确定阵列波导光栅中波导的偏振相关波长与可变宽度之间的关系。 对于给定的波导宽度范围，该关系确定偏振相关波长的零值或近零值。 因此，可以选择波导的宽度使得偏振相关波长最小化。

公开(公告)号：US06690025B2

公开(公告)日：2004-02-10

申请号：US09902960

申请日：2001-07-10

申请人： Jongik Won ,  Calvin Ka Kuen Ho ,  Fan Zhong ,  Liang Zhao

发明人： Jongik Won ,  Calvin Ka Kuen Ho ,  Fan Zhong ,  Liang Zhao

IPC分类号： H01L2904

CPC分类号： G02B6/12011 ,  G02B6/136 ,  G02B6/2852 ,  G02B2006/121

摘要： This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.

摘要翻译： 这涉及诸如平面光波分量/电路的光学器件，其被设计为具有影响光学器件上的功能波导的更高蚀刻选择性和全面改进的尺寸控制的高波导图案密度。

公开(公告)号：US06542687B2

公开(公告)日：2003-04-01

申请号：US09873068

申请日：2001-05-31

申请人： Jongik Won ,  Fan Zhong ,  Farnaz Parhami ,  Nizar S. Kheraj

发明人： Jongik Won ,  Fan Zhong ,  Farnaz Parhami ,  Nizar S. Kheraj

IPC分类号： G02B610

CPC分类号： G02B6/136 ,  G02B6/126 ,  G02B6/132 ,  G02B2006/121 ,  G02B2006/12173

摘要： A method of making a polarization insensitive optical waveguide structure. An optical core layer is formed on a substrate, wherein the optical core layer has a higher refractive index than the substrate. A mask is formed over the optical core layer. The unmasked areas of the optical core layer are then over-etched to define the core, wherein the over-etching removes the unmasked area of the optical core layer and a portion of the substrate disposed beneath the unmasked area, and defines the optical core. The mask is subsequently removed from the optical core. A cladding layer is then formed over the optical core and the substrate, the cladding layer having a lower refractive index than the optical core, to form a polarization insensitive optical waveguide structure. The amount of over-etching can be controlled to control an amount of substrate disposed beneath the unmasked area of the optical core layer that is removed. The amount of substrate removed, in turn, controls the polarization sensitivity of the optical waveguide structure. The amount of the portion of the substrate removed during the over-etching can be determined to minimize the polarization dependent wavelength shift and the polarization dependent loss of the optical waveguide structure. The amount of the portion of the substrate removed during the over-etching can be determined in accordance with a blanket stress of the cladding layer. The over-etching can be within a range between 7.5 percent and 30 percent.