公开(公告)号：US20120199067A1

公开(公告)日：2012-08-09

申请号：US13366663

申请日：2012-02-06

申请人： Yuichiro MOROZUMI ,  Izumi SATO ,  Shinji ASARI

发明人： Yuichiro MOROZUMI ,  Izumi SATO ,  Shinji ASARI

IPC分类号： C23C16/455

CPC分类号： H01L21/67109 ,  C23C16/405 ,  C23C16/4412 ,  C23C16/45546

摘要： An atmosphere in a reaction pipe is replaced by supplying a purge gas into the reaction pipe from a slit of a third gas injector when process gases are switched, by providing the third gas injector including the slit along a length direction of the reaction pipe in addition to first and second gas injectors including gas ejection holes for respectively supplying process gases, such as s Zr-based gas and an O3 gas, into the reaction pipe.

摘要翻译： 当处理气体被切换时，通过沿着反应管的长度方向设置包括狭缝的第三气体注射器，另外从第三气体注射器的狭缝向反应管中提供净化气体，反应管中的气氛被更换 包括用于分别向反应管中供给诸如Zr基气体和O 3气体的工艺气体的气体喷射孔的第一和第二气体喷射器。

公开(公告)号：US20110303152A1

公开(公告)日：2011-12-15

申请号：US13159954

申请日：2011-06-14

申请人： Shinji ASARI ,  Izumi Sato ,  Yuichiro Morozumi

发明人： Shinji ASARI ,  Izumi Sato ,  Yuichiro Morozumi

IPC分类号： C23C16/46 ,  C23C16/458

CPC分类号： H01L21/67303 ,  H01L21/67109 ,  H01L21/67309

摘要： A support structure for supporting a plurality of objects to be processed and to be disposed in a processing container structure in which a processing gas flows horizontally from one side to the opposite side, includes a top plate section; a bottom section; and a plurality of support posts connecting the top plate section and the bottom section, wherein a plurality of support portions for supporting the objects to be processed are formed in each support post at a predetermined pitch along the longitudinal direction, and the distance between the topmost support portion of the support portions of each support post and the top plate section as well as the distance between the lowermost support portion of the support portions of each support post and the bottom section are set not more than the pitch of the support portions. The support structure can prevent the occurrence of a turbulent gas flow in the top and bottom areas of the processing container structure.

摘要翻译： 一种支撑结构，用于支撑待处理的多个物体并且被布置在处理气体从一侧向相对侧流动的处理容器结构中，包括顶板部分; 底部; 以及连接顶板部和底部的多个支撑柱，其中，用于支撑待处理物体的多个支撑部分沿着纵向方向以预定间距形成在每个支撑柱中，并且最上面的距离 每个支撑柱和顶板部分的支撑部分的支撑部分以及每个支撑柱的支撑部分的最下部支撑部分与底部之间的距离设定为不大于支撑部分的间距。 支撑结构可以防止处理容器结构的顶部和底部区域中产生紊流气流。

公开(公告)号：US20110309562A1

公开(公告)日：2011-12-22

申请号：US13161920

申请日：2011-06-16

申请人： Shinji Asari ,  Mitsuhiro Okada

发明人： Shinji Asari ,  Mitsuhiro Okada

IPC分类号： B23Q3/00

CPC分类号： H01L21/67109 ,  C23C16/405 ,  C23C16/45546 ,  C23C16/4583 ,  H01L21/67309

摘要： A support structure for supporting a plurality of objects to be processed and to be disposed in a processing container structure in which a processing gas flows from the bottom to the top or from the top to the bottom, includes: a top plate portion; a bottom portion; and a plurality of support posts connecting the top plate portion and the bottom portion. A plurality of support portions for supporting the objects to be processed are formed in each support post along the longitudinal direction, and the pitch of the support portions is set larger on the downstream side than on the upstream side in the flow direction of the processing gas. The support structure can enhance the in-plane uniformity of the thickness of a film formed on a processing object.

摘要翻译： 一种支撑结构，用于支撑待处理的多个物体，并且被设置在处理气体从底部流向顶部或从顶部到顶部的处理容器结构中，包括：顶板部分; 底部; 以及连接顶板部分和底部部分的多个支撑柱。 沿着长度方向在各个支柱上形成有用于支撑待处理物体的多个支撑部，在处理气体的流动方向的下游侧比上游侧的支撑部的间距大 。 支撑结构可以增强在加工对象上形成的膜的厚度的面内均匀性。

公开(公告)号：US07632354B2

公开(公告)日：2009-12-15

申请号：US11463180

申请日：2006-08-08

申请人： Anthony Dip ,  Shinji Asari ,  Meenakshisundaram Gandhi

发明人： Anthony Dip ,  Shinji Asari ,  Meenakshisundaram Gandhi

IPC分类号： C23C16/455 ,  H01L21/302

CPC分类号： H01L21/67109 ,  C23C16/45578 ,  C23C16/45591 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67115

摘要： A thermal processing system with improved gas flow and method for injecting a process gas into a thermal processing system. The thermal processing system has an injection section with injection outlets that inject process gas into a processing space and a delivery section that delivers process gas to the injection section. The delivery section may be coupled with the injection section at an inlet disposed between opposite ends of the injection section. A fluid lumen of the injection section may have a larger cross-sectional area than a fluid lumen of the delivery section. The thermal processing system may include an inner tube, which surrounds the processing space, having a slit through which the processing space communicates with an annular pumping space defined between the inner tube and an outer tube of the thermal processing system.

摘要翻译： 具有改善气流的热处理系统和将工艺气体注入热处理系统的方法。 热处理系统具有注射部分，其具有将处理气体注入处理空间的注射出口和将处理气体输送到注射部分的输送部分。 输送部分可以在设置在喷射部分的相对端之间的入口处与喷射部分联接。 注射部分的流体腔可以具有比输送部的流体腔更大的横截面面积。 热处理系统可以包括围绕处理空间的内管，其具有狭缝，处理空间通过狭缝与限定在热处理系统的内管和外管之间的环形泵送空间连通。

公开(公告)号：US09103029B2

公开(公告)日：2015-08-11

申请号：US13161874

申请日：2011-06-16

申请人： Yu Wamura ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

发明人： Yu Wamura ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  H01L21/673

CPC分类号： C23C16/4412 ,  C23C16/45546 ,  C23C16/52 ,  H01L21/67303

摘要： A processing apparatus for processing objects, includes: a processing container structure having a bottom opening and including a processing container having a processing space for housing the objects, the container having a nozzle housing area on one side of the processing space and a slit-like exhaust port on the opposite side of the processing space from the nozzle housing area; a lid for closing the bottom opening of the processing container structure; a support structure for supporting the objects and which can be inserted into and withdrawn from the processing container structure; a gas introduction means including a gas nozzle housed in the nozzle housing area; an exhaust means including a plurality of exhaust systems for exhausting the atmosphere in the processing container structure; a heating means for heating the objects; and a control means for controlling the gas introduction means, the exhaust means and the heating means.

摘要翻译： 一种用于处理物体的处理装置，包括：处理容器结构，其具有底部开口并且包括具有用于容纳物体的处理空间的处理容器，所述容器在处理空间的一侧具有喷嘴容纳区域和狭缝状 排气口在处理空间的与喷嘴外壳区域相反的一侧; 用于封闭处理容器结构的底部开口的盖子; 支撑结构，用于支撑物体并且可以插入处理容器结构中并从处理容器结构中取出; 气体引入装置，包括容纳在喷嘴容纳区域中的气体喷嘴; 排气装置，包括用于排出处理容器结构中的气氛的多个排气系统; 用于加热物体的加热装置; 以及用于控制气体引入装置，排气装置和加热装置的控制装置。

公开(公告)号：US20110312188A1

公开(公告)日：2011-12-22

申请号：US13161874

申请日：2011-06-16

申请人： Yu WAMURA ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

发明人： Yu WAMURA ,  Yuichiro Morozumi ,  Izumi Sato ,  Shinji Asari

IPC分类号： C23C16/455 ,  H01L21/30 ,  H01L21/306

CPC分类号： C23C16/4412 ,  C23C16/45546 ,  C23C16/52 ,  H01L21/67303

摘要： A processing apparatus for processing objects, includes: a processing container structure having a bottom opening and including a processing container having a processing space for housing the objects, the container having a nozzle housing area on one side of the processing space and a slit-like exhaust port on the opposite side of the processing space from the nozzle housing area; a lid for closing the bottom opening of the processing container structure; a support structure for supporting the objects and which can be inserted into and withdrawn from the processing container structure; a gas introduction means including a gas nozzle housed in the nozzle housing area; an exhaust means including a plurality of exhaust systems for exhausting the atmosphere in the processing container structure; a heating means for heating the objects; and a control means for controlling the gas introduction means, the exhaust means and the heating means.

摘要翻译： 一种用于处理物体的处理装置，包括：处理容器结构，其具有底部开口并且包括具有用于容纳物体的处理空间的处理容器，所述容器在处理空间的一侧具有喷嘴容纳区域和狭缝状 排气口在处理空间的与喷嘴外壳区域相反的一侧; 用于封闭处理容器结构的底部开口的盖子; 支撑结构，用于支撑物体并且可以插入处理容器结构中并从处理容器结构中取出; 气体引入装置，包括容纳在喷嘴容纳区域中的气体喷嘴; 排气装置，包括用于排出处理容器结构中的气氛的多个排气系统; 用于加热物体的加热装置; 以及用于控制气体引入装置，排气装置和加热装置的控制装置。

公开(公告)号：US20080035055A1

公开(公告)日：2008-02-14

申请号：US11463180

申请日：2006-08-08

申请人： Anthony Dip ,  Shinji Asari ,  Meenakshisundaram Gandhi

发明人： Anthony Dip ,  Shinji Asari ,  Meenakshisundaram Gandhi

IPC分类号： C23C16/00

CPC分类号： H01L21/67109 ,  C23C16/45578 ,  C23C16/45591 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67115

摘要： A thermal processing system with improved gas flow and method for injecting a process gas into a thermal processing system. The thermal processing system has an injection section with injection outlets that inject process gas into a processing space and a delivery section that delivers process gas to the injection section. The delivery section may be coupled with the injection section at an inlet disposed between opposite ends of the injection section. A fluid lumen of the injection section may have a larger cross-sectional area than a fluid lumen of the delivery section. The thermal processing system may include an inner tube, which surrounds the processing space, having a slit through which the processing space communicates with an annular pumping space defined between the inner tube and an outer tube of the thermal processing system.

摘要翻译： 具有改善气流的热处理系统和将工艺气体注入热处理系统的方法。 热处理系统具有注射部分，其具有将处理气体注入处理空间的注射出口和将处理气体输送到注射部分的输送部分。 输送部分可以在设置在喷射部分的相对端之间的入口处与喷射部分联接。 注射部分的流体腔可以具有比输送部的流体腔更大的横截面面积。 热处理系统可以包括围绕处理空间的内管，其具有狭缝，处理空间通过狭缝与限定在热处理系统的内管和外管之间的环形泵送空间连通。