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    Micromachined fluidic device and method for making same
    3.
    发明申请
    Micromachined fluidic device and method for making same 有权

    公开(公告)号：US20060027523A1

    公开(公告)日：2006-02-09

    申请号：US11235713

    申请日：2005-09-26

    Applicant: Harald Van Lintel ,  Didier Maillefer ,  Stephan Gamper

    Inventor： Harald Van Lintel ,  Didier Maillefer ,  Stephan Gamper

    IPC: C23F1/00 ,  B44C1/22

    CPC classification number: F04B43/043 ,  A61M5/14244

    Abstract: The fluid-flow device (100) of the invention comprises a stack (30) covered by a closure wafer (20), said stack (30) comprising a support wafer (36), a layer of insulating material (34), and a silicon layer (32). The closure wafer (20) and/or said silicon layer (32) are machined so as to define a cavity (38) between said closure wafer (20) and said silicon layer (32), said support wafer (36) has at least one duct (102) passing right through it, said layer of insulating material (34) presenting at least one zone (35) that is entirely free of material placed at least in line with said duct (102) so as to co-operate with said cavity (38) to define a moving member (40) in said silicon layer (32), the moving member being suitable under the pressure of liquid in said cavity (38) for reversibly moving towards said support wafer (36) until contact is made between said moving member (40) and said support wafer (36).

    PASSIVE FLOW REGULATOR FOR INFUSION OF MEDICAMENTS
    4.
    发明申请
    PASSIVE FLOW REGULATOR FOR INFUSION OF MEDICAMENTS 审中-公开
    被动流量调节器用于输注药物

    公开(公告)号：US20100324504A1

    公开(公告)日：2010-12-23

    申请号：US12866840

    申请日：2009-02-06

    Applicant: Eric Chappel ,  Stephan Gamper

    Inventor： Eric Chappel ,  Stephan Gamper

    IPC: A61M5/168 ,  B23P17/00

    CPC classification number: A61M5/16881 ,  A61M2205/0244 ,  G05D7/0113 ,  Y10T29/494

    Abstract: Flow regulator for the infusion of medicaments, comprising, in succession, a substrate (1), a channel (5), a spacer (3) and a membrane (4), the latter having at least one hole (6) communicating with the channel (5), characterized in that the regulator is produced from at least two separate elements (1-4), the first element comprising the membrane (4) and the second element comprising the spacer (3).

    Abstract translation: 用于输注药物的流量调节器，包括依次包括基底（1），通道（5），间隔物（3）和膜（4），后者具有至少一个孔（6），与孔 通道（5），其特征在于，所述调节器由至少两个分离的元件（1-4）制成，所述第一元件包括所述膜（4），所述第二元件包括所述间隔物（3）。

    Micromachined fluidic device and method for making same
    5.
    发明授权
    Micromachined fluidic device and method for making same 有权
    微加工流体装置及其制造方法

    公开(公告)号：US07311503B2

    公开(公告)日：2007-12-25

    申请号：US11235713

    申请日：2005-09-26

    Applicant: Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

    Inventor： Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

    IPC: F04B17/00

    CPC classification number: F04B43/043 ,  A61M5/14244

    Abstract: The fluid-flow device (100) of the invention comprises a stack (30) covered by a closure wafer (20), said stack (30) comprising a support wafer (36), a layer of insulating material (34), and a silicon layer (32). The closure wafer (20) and/or said silicon layer (32) are machined so as to define a cavity (38) between said closure wafer (20) and said silicon layer (32), said support wafer (36) has at least one duct (102) passing right through it, said layer of insulating material (34) presenting at least one zone (35) that is entirely free of material placed at least in line with said duct (102) so as to co-operate with said cavity (38) to define a moving member (40) in said silicon layer (32), the moving member being suitable under the pressure of liquid in said cavity (38) for reversibly moving towards said support wafer (36) until contact is made between said moving member (40) and said support wafer (36).

    Abstract translation: 本发明的流体流动装置（100）包括由封闭晶片（20）覆盖的堆叠（30），所述堆叠（30）包括支撑晶片（36），绝缘材料层（34）和 硅层（32）。 加工闭合晶片（20）和/或所述硅层（32）以便在所述封闭晶片（20）和所述硅层（32）之间限定空腔（38），所述支撑晶片（36）至少具有 所述绝缘材料层（34）呈现出至少一个区域（35），所述至少一个区域（35）完全不含有至少与所述管道（102）成直线的材料，以便与 所述腔（38）在所述硅层（32）中限定移动构件（40），所述移动构件在所述空腔（38）内的液体压力下适合于可逆地朝向所述支撑晶片（36）移动，直到接触为止 在所述移动构件（40）和所述支撑晶片（36）之间形成。

    Micromachined fluidic device and method for making same
    6.
    发明授权
    Micromachined fluidic device and method for making same 有权
    微加工流体装置及其制造方法

    公开(公告)号：US07005078B2

    公开(公告)日：2006-02-28

    申请号：US10296466

    申请日：2001-05-25

    Applicant: Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

    Inventor： Harald T. Van Lintel ,  Didier Maillefer ,  Stephan Gamper

    IPC: G01D15/00

    CPC classification number: F04B43/043 ,  A61M5/14244

    Abstract: The fluid-flow device (100) of the invention comprises a stack (30) covered by a closure wafer (20), said stack (30) comprising a support wafer (36), a layer of insulating material (34), and a silicon layer (32). The closure wafer (20) and/or said silicon layer (32) are machined so as to define a cavity (38) between said closure wafer (20) and said silicon layer (32), said support wafer (36) has at least one duct (102) passing right through it, said layer of insulating material (34) presenting at least one zone (35) that is entirely free of material placed at least in line with said duct (102) so as to co-operate with said cavity (38) to define a moving member (40) in said silicon layer (32), the moving member being suitable under the pressure of liquid in said cavity (38) for reversibly moving towards said support wafer (36) until contact is made between said moving member (40) and said support wafer (36).

    Abstract translation: 本发明的流体流动装置（100）包括由封闭晶片（20）覆盖的堆叠（30），所述堆叠（30）包括支撑晶片（36），绝缘材料层（34）和 硅层（32）。 加工闭合晶片（20）和/或所述硅层（32）以便在所述封闭晶片（20）和所述硅层（32）之间限定空腔（38），所述支撑晶片（36）至少具有 所述绝缘材料层（34）呈现出至少一个区域（35），所述至少一个区域（35）完全不含有至少与所述管道（102）成直线的材料，以便与 所述腔（38）在所述硅层（32）中限定移动构件（40），所述移动构件在所述空腔（38）内的液体压力下适于可逆地朝所述支撑晶片（36）移动，直到接触为止 在所述移动构件（40）和所述支撑晶片（36）之间形成。

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