公开(公告)号：US20130056737A1

公开(公告)日：2013-03-07

申请号：US13604452

申请日：2012-09-05

Applicant: Kazuyuki FUJIWARA ,  Kazunori INOUE ,  Takahito YAMABE

Inventor： Kazuyuki FUJIWARA ,  Kazunori INOUE ,  Takahito YAMABE

IPC: H01L29/786

CPC classification number: H01L21/76838 ,  H01L21/283 ,  H01L27/1244 ,  H01L29/458 ,  H01L29/4908

Abstract: An Al wiring film having a tapered shape is obtained easily and in a stable manner. An Al wiring film has a double-layer structure including a first Al alloy layer made of Al or an Al alloy, and a second Al alloy layer laid on the first Al alloy layer and having a composition different from a composition of the first Al alloy layer by containing at least one element of Ni, Pd, and Pt. The second Al alloy layer is etched by an alkaline chemical solution used in a developing process of a photoresist, and an end portion of the second Al alloy layer recedes from an end portion of the photoresist. Thereafter, by performing wet etching using the photoresist as a mask, a cross section of the Al wiring film becomes a tapered shape.

Abstract translation: 容易且稳定地获得具有锥形形状的Al布线膜。 Al布线膜具有包括由Al或Al合金制成的第一Al合金层和在第一Al合金层上铺设的第二Al合金层并且具有与第一Al合金的组成不同的组成的双层结构 包含Ni，Pd和Pt中的至少一种元素。 通过用于光致抗蚀剂显影过程的碱性化学溶液蚀刻第二Al合金层，并且第二Al合金层的端部从光致抗蚀剂的端部后退。 此后，通过使用光致抗蚀剂作为掩模进行湿蚀刻，Al布线膜的截面变为锥形。

公开(公告)号：US20070026324A1

公开(公告)日：2007-02-01

申请号：US11484606

申请日：2006-07-12

Applicant: Takuji Yoshida ,  Hatsumi Kimura ,  Nobuaki Ishiga ,  Takahito Yamabe ,  Toshio Araki

Inventor： Takuji Yoshida ,  Hatsumi Kimura ,  Nobuaki Ishiga ,  Takahito Yamabe ,  Toshio Araki

IPC: G03F1/00 ,  G03F1/08

CPC classification number: C23F1/26 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3649 ,  C03C17/3657 ,  C03C17/3671 ,  C03C2217/948 ,  C23C14/0036 ,  C23C14/083 ,  C23C14/3492 ,  G02F1/133512

Abstract: A substrate with a light-shielding film according to one mode of the invention is obtained in a method of manufacture of a substrate with a light-shielding film having a light-shielding film pattern formed on a substrate, by depositing in order a first film having chromium oxide and a second film having chromium on a substrate, to form a multilayer film; forming a resist pattern on the multilayer film; performing etching of the multilayer film, using an etching liquid comprising ceric ammonium nitrate to which nitric acid is added at a concentration of at least 2.5 mol/liter, to form a light-shielding film pattern; and removing the resist pattern.

Abstract translation: 根据本发明的一种模式的具有遮光膜的基板是在具有通过在基板上形成的遮光膜图案的遮光膜的基板的制造方法中获得的，通过依次沉积第一膜 具有氧化铬和在基板上具有铬的第二膜，以形成多层膜; 在所述多层膜上形成抗蚀剂图案; 使用包含浓度为2.5摩尔/升的硝酸的硝酸铈铵的蚀刻液进行多层膜的蚀刻，形成遮光膜图案; 并去除抗蚀剂图案。

公开(公告)号：US09704742B2

公开(公告)日：2017-07-11

申请号：US13604452

申请日：2012-09-05

Applicant: Kazuyuki Fujiwara ,  Kazunori Inoue ,  Takahito Yamabe

Inventor： Kazuyuki Fujiwara ,  Kazunori Inoue ,  Takahito Yamabe

IPC: H01L29/786 ,  H01L21/283 ,  H01L21/768 ,  H01L29/45 ,  H01L29/49 ,  H01L27/12

CPC classification number: H01L21/76838 ,  H01L21/283 ,  H01L27/1244 ,  H01L29/458 ,  H01L29/4908

Abstract: An Al wiring film having a tapered shape is obtained easily and in a stable manner. An Al wiring film has a double-layer structure including a first Al alloy layer made of Al or an Al alloy, and a second Al alloy layer laid on the first Al alloy layer and having a composition different from a composition of the first Al alloy layer by containing at least one element of Ni, Pd, and Pt. The second Al alloy layer is etched by an alkaline chemical solution used in a developing process of a photoresist, and an end portion of the second Al alloy layer recedes from an end portion of the photoresist. Thereafter, by performing wet etching using the photoresist as a mask, a cross section of the Al wiring film becomes a tapered shape.