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公开(公告)号：US20080252869A1
公开(公告)日：2008-10-16
申请号：US12140628
申请日：2008-06-17
申请人： Tetsuya Mori , Yuichi Osakabe , Tadayasu Nichikawa
发明人： Tetsuya Mori , Yuichi Osakabe , Tadayasu Nichikawa
IPC分类号： G03B27/42
CPC分类号： G03F9/7034 , G03F9/7088
摘要： An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.
摘要翻译： 曝光装置包括用于保持原始形式的原稿台，用于将原始形式的光引入待曝光的物体的投影光学系统，以及用于检测原稿上的多个点的位置的检测光学系统， 投影光学系统的光轴方向，其中用于封闭原稿台的空间与用于包围至少一部分检测光学系统的空间不同。
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公开(公告)号：US06989885B2
公开(公告)日：2006-01-24
申请号：US10726541
申请日：2003-12-04
申请人： Yuichi Osakabe , Yoshinori Ohsaki
发明人： Yuichi Osakabe , Yoshinori Ohsaki
CPC分类号： G03F9/7011 , G03B27/42
摘要： A scanning exposure apparatus for exposing a substrate (8) to a pattern with an original (1) through a projection optical system (5), while scanning the original and the substrate, includes a first detection system (14c) which detects a first substrate reference mark (18c1, 18c3) corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system (2, 9) which aligns the original and the substrate on the basis of a detection result of the first detection system.
摘要翻译： 一种用于通过投影光学系统（5）将基板（8）暴露于具有原稿（1）的图案的扫描曝光装置，在扫描原件和基板的同时，包括第一检测系统（14c），其检测第一 通过投影光学系统对应于基板的基板参照标记（18c1,18c3），在投影光学的光轴和离开光轴的扫描方向上偏离的离轴位置 以及基于第一检测系统的检测结果对准原件和基板的对准系统（2,9）。
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公开(公告)号：US20050219487A1
公开(公告)日：2005-10-06
申请号：US11130174
申请日：2005-05-17
申请人： Yuichi Osakabe , Yoshinori Ohsaki
发明人： Yuichi Osakabe , Yoshinori Ohsaki
IPC分类号： G03F7/22 , G03B27/42 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7011 , G03B27/42
摘要： A scanning exposure apparatus for exposing a substrate (8) to a pattern with an original (1) through a projection optical system (5), while scanning the original and the substrate, includes a first detection system (14c) which detects a first substrate reference mark (18c1, 18c3) corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system (2, 9) which aligns the original and the substrate on the basis of a detection result of the first detection system.
摘要翻译： 一种用于通过投影光学系统（5）将基板（8）暴露于具有原稿（1）的图案的扫描曝光装置，在扫描原件和基板的同时，包括第一检测系统（14c），其检测第一 通过投影光学系统对应于基板的基板参照标记（18c1,18c3），在投影光学的光轴和离开光轴的扫描方向上偏离的离轴位置 以及基于第一检测系统的检测结果对准原件和基板的对准系统（2,9）。
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公开(公告)号：US07218379B2
公开(公告)日：2007-05-15
申请号：US11130174
申请日：2005-05-17
申请人： Yuichi Osakabe , Yoshinori Ohsaki
发明人： Yuichi Osakabe , Yoshinori Ohsaki
CPC分类号： G03F9/7011 , G03B27/42
摘要： A scanning exposure apparatus for exposing a substrate (8) to a pattern with an original (1) through a projection optical system (5), while scanning the original and the substrate, includes a first detection system (14c) which detects a first substrate reference mark (18c1, 18c3) corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system (2, 9) which aligns the original and the substrate on the basis of a detection result of the first detection system.
摘要翻译： 一种用于通过投影光学系统（5）将基板（8）暴露于具有原稿（1）的图案的扫描曝光装置，在扫描原件和基板的同时，包括第一检测系统（14c），其检测第一 通过投影光学系统对应于基板的基板参照标记（18c1,18c3），在投影光学的光轴和离开光轴的扫描方向上偏离的离轴位置 以及基于第一检测系统的检测结果对准原件和基板的对准系统（2,9）。
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公开(公告)号：US06683673B2
公开(公告)日：2004-01-27
申请号：US10337887
申请日：2003-01-08
申请人： Yuichi Osakabe , Nobuhiro Kodachi
发明人： Yuichi Osakabe , Nobuhiro Kodachi
IPC分类号： G03B2742
CPC分类号： G03F9/7088 , G03F9/7015
摘要： An exposure apparatus for transferring a pattern of an original, having an original mark, onto a substrate having a substrate mark, through a projection optical system. The apparatus includes a movable stage, having a stage mark, for holding the substrate, an optical member having first and second marks and being held fixed with respect to the projection optical system, a first position detecting system having a detection center and for detecting (i) a relative position between the detection center and the stage mark, and (ii) a relative position between the detection center and the substrate mark, and a second position detecting system for detecting (i) a relative position between the stage mark and the first mark of the optical member, and (ii) a relative position between the original mark and the second mark of the optical member. The original can be aligned with respect to the projection optical system on the basis of the relative position of the original mark and the second mark as detected by the second position detecting system. A base line offset can be determined on the basis of the relative position of the detection center and the stage mark as detected by the first position detecting system, and the relative position of the stage mark and the first mark as detected by the second position detecting system. The substrate can be aligned with respect to the projection optical system on the basis of the thus determined base line offset and the relative position of the detection center and the substrate mark as detected by the first position detecting system.
摘要翻译： 一种用于通过投影光学系统将具有原始标记的原稿的图案转印到具有基板标记的基板上的曝光装置。 该装置包括：具有用于保持基板的平台标记的可移动台，具有第一和第二标记并相对于投影光学系统固定的光学构件;第一位置检测系统，具有检测中心并用于检测（ i）检测中心与阶段标记之间的相对位置，以及（ii）检测中心与基板标记之间的相对位置，以及第二位置检测系统，用于检测（i）台阶标记与基准标记之间的相对位置 光学构件的第一标记，和（ii）原始标记与光学构件的第二标记之间的相对位置。 基于由第二位置检测系统检测到的原始标记和第二标记的相对位置，原件可以相对于投影光学系统对准。 可以基于由第一位置检测系统检测到的检测中心和平台标记的相对位置以及由第二位置检测检测到的平台标记和第一标记的相对位置来确定基线偏移 系统。 基于如此确定的基线偏移以及由第一位置检测系统检测到的检测中心和基板标记的相对位置，可以相对于投影光学系统对准基板。
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公开(公告)号：US06532056B2
公开(公告)日：2003-03-11
申请号：US09186160
申请日：1998-11-05
申请人： Yuichi Osakabe , Nobuhiro Kodachi
发明人： Yuichi Osakabe , Nobuhiro Kodachi
IPC分类号： G03B2742
CPC分类号： G03F9/7088 , G03F9/7015
摘要： An alignment system for aligning a reticle, having a pattern to be transferred and a mark for alignment, with a photosensitive substrate to which the pattern of the reticle is to be transferred by exposure. The alignment system includes a substrate stage being movable while holding the photosensitive substrate thereon, the substrate stage having at least one mark for relative position detection, and a light transmissive flat plate-like member separate from the reticle and disposed between positions of the reticle and the substrate when the reticle and the substrate are placed to be aligned with each other. The plate-like member has a mark for relative position detection with respect to the reticle and another mark for relative position detection with respect to the substrate stage, which marks are provided separately.
摘要翻译： 对准系统，用于将具有要转印的图案和用于对准的标记的掩模版与通过曝光转印掩模版的图案的感光基板对准。 对准系统包括：基板载台，其上保持感光基板可移动，基板台具有至少一个用于相对位置检测的标记;以及透光平板状部件，与光掩模分离并且设置在光罩和 当掩模版和基板被放置成彼此对准时的基板。 板状构件具有相对于掩模版的相对位置检测的标记和用于相对于基板台的相对位置检测的另一标记，该标记被分开设置。
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公开(公告)号：US06226133B1
公开(公告)日：2001-05-01
申请号：US09456286
申请日：1999-12-08
申请人： Yuichi Osakabe
发明人： Yuichi Osakabe
IPC分类号： G02B702
CPC分类号： G03F7/70975 , G02B7/00 , G03F7/70833 , G03F7/70883
摘要： An optical apparatus includes an optical system having optical elements, an enclosure, enclosing the optical system, for keeping a gas-tight environment inside the enclosure, and a pressure absorber which absorbs variations in differential pressure between the inside and the outside of the enclosure, while maintaining the gas-tight environment in the enclosure during at least one of transportation and storage of the optical apparatus. The optical system is one of a projection optical system and an illumination optical system of an exposure apparatus, and the inside of the enclosure is filled with one of an inert gas and a low-oxygen content gas.
摘要翻译： 光学装置包括具有光学元件的光学系统，封闭光学系统的外壳，用于保持外壳内的气密环境，以及吸收外壳内外的差压变化的压力吸收器， 同时在光学设备的运输和存储的至少一个过程中保持外壳中的气密环境。 光学系统是曝光装置的投影光学系统和照明光学系统之一，并且外壳的内部填充有惰性气体和低氧含量气体中的一种。
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公开(公告)号：US07626680B2
公开(公告)日：2009-12-01
申请号：US12140628
申请日：2008-06-17
申请人： Tetsuya Mori , Yuichi Osakabe , Tadayasu Nishikawa
发明人： Tetsuya Mori , Yuichi Osakabe , Tadayasu Nishikawa
CPC分类号： G03F9/7034 , G03F9/7088
摘要： An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.
摘要翻译： 曝光装置包括用于保持原始形式的原稿台，用于将原始形式的光引入待曝光的物体的投影光学系统，以及用于检测原稿上的多个点的位置的检测光学系统， 投影光学系统的光轴方向，其中用于封闭原稿台的空间与用于包围至少一部分检测光学系统的空间不同。
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公开(公告)号：US20050052633A1
公开(公告)日：2005-03-10
申请号：US10938356
申请日：2004-09-09
申请人： Tetsuya Mori , Yuichi Osakabe , Tadayasu Nishikawa
发明人： Tetsuya Mori , Yuichi Osakabe , Tadayasu Nishikawa
CPC分类号： G03F9/7034 , G03F9/7088
摘要： An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.
摘要翻译： 曝光装置包括用于保持原始形式的原稿台，用于将原始形式的光引入待曝光的物体的投影光学系统，以及用于检测原稿上的多个点的位置的检测光学系统， 投影光学系统的光轴方向，其中用于封闭原稿台的空间与用于包围至少一部分检测光学系统的空间不同。
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公开(公告)号：US07050150B2
公开(公告)日：2006-05-23
申请号：US10794032
申请日：2004-03-04
申请人： Yoshinori Ohsaki , Yuichi Osakabe
发明人： Yoshinori Ohsaki , Yuichi Osakabe
CPC分类号： G03F9/7026 , G03B27/42 , G03F9/7034
摘要： Provided is an exposure apparatus for exposing a pattern of a reticle mounted on a first stage onto a substrate which is mounted on a second stage through a projection optical system, in which focus calibration can be conducted with high precision and a throughput can be increased. The exposure apparatus includes at least three detection systems capable of simultaneously detecting three or more marks formed at different positions on at least one of the substrate and the second stage through the projection optical system.
摘要翻译： 提供一种曝光装置，用于通过投影光学系统将安装在第一平台上的标线的图案曝光到安装在第二台上的基板上，其中可以高精度地进行聚焦校准，并且可以提高生产量。 曝光装置包括至少三个检测系统，其能够通过投影光学系统同时检测形成在基板和第二平台中的至少一个上的不同位置处的三个或更多个标记。
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