公开(公告)号：US20140374024A1

公开(公告)日：2014-12-25

申请号：US13962575

申请日：2013-08-08

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  TOM K. CHO ,  KARTIK RAMASWAMY ,  YOGANANDA SARODE VISHWANATH

IPC: H01J37/32 ,  B08B7/00 ,  C23C16/48 ,  H01L21/67 ,  C23C16/455

Abstract: Embodiments of an apparatus for removing particles from a twin chamber processing system are provided herein. In some embodiments, an apparatus for removing particles from a twin chamber processing system includes a remote plasma system; and a plurality of conduits fluidly coupling the remote plasma system to each process chamber of a twin chamber processing system to provide a plasma to an exhaust volume of each process chamber, wherein each conduit of the plurality of conduits has an outlet disposed along a boundary of the respective exhaust volumes.

Abstract translation: 本文提供了用于从双室处理系统中去除颗粒的设备的实施例。 在一些实施例中，用于从双室处理系统中去除颗粒的装置包括远程等离子体系统; 以及多个导管将远程等离子体系统流体耦合到双室处理系统的每个处理室，以将等离子体提供给每个处理室的排气体积，其中多个管道中的每个导管具有沿着 各排气量。

公开(公告)号：US20140366953A1

公开(公告)日：2014-12-18

申请号：US14276289

申请日：2014-05-13

Applicant: APPLIED MATERIALS, INC.

Inventor： JARED AHMAD LEE ,  DMITRY LUBOMIRSKY ,  MARTIN JEFF SALINAS ,  ANDREW NGUYEN ,  TOM K. CHO ,  ERIC A. ENGLHARDT ,  FERNANDO SILVEIRA

IPC: F16K3/02 ,  B08B9/032

CPC classification number: B08B9/0325 ,  F16K3/02 ,  F16K51/02 ,  H01L21/67017 ,  H01L21/67253 ,  Y10T137/0419 ,  Y10T137/4259

Abstract: Methods and apparatus for particle reduction in throttle gate valves used in substrate process chambers are provided herein. In some embodiments, a gate valve for use in a process chamber includes a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening.

Abstract translation: 本文提供了在基板处理室中使用的节流闸阀中减小颗粒的方法和装置。 在一些实施例中，用于处理室的闸阀包括具有从主体的第一表面到相对的第二表面穿过的开口的主体; 从开口的侧壁延伸到主体中的口袋; 可移动地设置在所述口袋内的封闭位置，所述关闭位置密封所述开口和露出所述开口的打开位置，并完全将所述门置于所述口袋内; 以及设置在所述闸阀中的多个气体端口，其构造成将气流引导到与所述开口流体连接的所述闸阀的一部分。

公开(公告)号：US20230051800A1

公开(公告)日：2023-02-16

申请号：US17759257

申请日：2021-01-27

Applicant: APPLIED MATERIALS, INC.

Inventor： YIKAI CHEN ,  ANIRUDDHA PAL ,  SAURABH M. CHAUDHARI ,  YAO-HUNG YANG ,  SIAMAK SALIMIAN ,  TOM K. CHO

IPC: C23C4/10 ,  C23C4/134 ,  C04B35/565 ,  C04B35/622

Abstract: Methods and apparatus for producing bulk silicon carbide and producing silicon carbide coatings are provided herein. The method includes feeding a mixture of silicon carbide and ceramic into a plasma sprayer. The plasma generates a stream towards a substrate forming a bulk material or optionally a coating on the substrate such as an article upon contact therewith. In embodiments, the substrate can be removed, leaving a component part fabricated from bulk silicon carbide.