公开(公告)号：US20230062206A1

公开(公告)日：2023-03-02

申请号：US18046872

申请日：2022-10-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Thomas Li ,  Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

IPC: G03F7/20

Abstract: Spectral data associated with a first prior substrate and/or a second prior substrate is obtained. A metrology measurement value associated with the first portion of the first prior substrate is determined based on one or more metrology measurement values measured for at least one of a second portion of the first prior substrate or a third portion of a second prior substrate. Training data for training a machine learning model to predict metrology measurement values of a current substrate is generated. Generating the training data includes generating a first training input including the spectral data associated with the first prior substrate and generating a first target output for the first training input, the first target output including the determined metrology measurement value associated with the first portion of the first prior substrate. The training data is provided to train the machine learning model.

公开(公告)号：US12191176B2

公开(公告)日：2025-01-07

申请号：US18335899

申请日：2023-06-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

IPC: H01L21/67 ,  H01L21/66

Abstract: A process recipe associated with a substrate at a manufacturing system is identified. A first set of measurements for the substrate is obtained from a substrate measurement subsystem. A second set of measurements for the substrate is obtained from one or more sensors of a chamber of the manufacturing system. A determination is made based on the obtained first set of measurements and the obtained second set of measurements of whether to modify the process recipe by at least one of modifying an operation of the process recipe or generating an instruction to prevent completion of execution of one or more operations of the process recipe.

公开(公告)号：USD977504S1

公开(公告)日：2023-02-07

申请号：US29743600

申请日：2020-07-22

Applicant: APPLIED MATERIALS, INC.

Designer： Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

公开(公告)号：US20220028716A1

公开(公告)日：2022-01-27

申请号：US17379677

申请日：2021-07-19

Applicant: APPLIED MATERIALS, INC.

Inventor： Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

IPC: H01L21/67 ,  G01N21/25 ,  G01N21/95 ,  G01B11/00

Abstract: A method for a substrate measurement subsystem is provided. An indication is received that a substrate being processed at a manufacturing system has been loaded into a substrate measurement subsystem. First positional data of the substrate within the substrate measurement subsystem is determined. One or more portions of the substrate to be measured by one or more sensing components of the substrate measurement subsystem are determined based on the first positional data of the substrate and a process recipe for the substrate. Measurements of each of the determined portions of the substrate are obtained by one or more sensing components of the substrate measurement subsystem. The obtained measurements of each of the determined portions of the substrate are transmitted to a system controller.

公开(公告)号：US11693053B2

公开(公告)日：2023-07-04

申请号：US17892441

申请日：2022-08-22

Applicant: Applied Materials, Inc.

Inventor： Tao Zhang ,  Upendra V. Ummethala ,  Ajit Balakrishna

IPC: G01D21/02 ,  G01F1/86 ,  G05B13/02 ,  G01F1/84 ,  G01R31/3177

CPC classification number: G01R31/3177 ,  G01D21/02 ,  G01F1/8436 ,  G01F1/86 ,  G05B13/025

Abstract: A non-transitory computer-readable storage medium stores instructions, which when executed by a processing device of a diagnostic server, cause the processing device to perform certain operations. The operations include receiving, from a processing chamber, (i) measurement values of a combined signal that is based on an injection of an alternating signal wave onto a first output signal of a controller of the processing chamber, and (ii) measurement values of a second output signal of the controller that incorporates feedback from the processing chamber. The operations further include generating, based on the measurement values of the combined signal and the measurement values of the second output signal of the controller, a baseline bode fingerprint pertaining to a state associated with the processing chamber. The operations further include storing, in computer storage, the baseline bode fingerprint to be used in performing diagnostics of the processing chamber.

公开(公告)号：US11486927B2

公开(公告)日：2022-11-01

申请号：US16838834

申请日：2020-04-02

Applicant: Applied Materials, Inc.

Inventor： Tao Zhang ,  Upendra V. Ummethala ,  Ajit Balakrishna

IPC: G01D21/02 ,  G05B13/02 ,  G01F1/84 ,  G01R31/3177 ,  G01F1/86

Abstract: A non-transitory computer-readable storage medium stores instructions, which when executed by a processing device of a diagnostic server, cause the processing device to perform certain operations. The operations include receiving, from a processing chamber, (i) measurement values of a combined signal that is based on an injection of an alternating signal wave onto a first output signal of a controller of the processing chamber, and (ii) measurement values of a second output signal of the controller that incorporates feedback from the processing chamber. The operations further include generating, based on the measurement values of the combined signal and the measurement values of the second output signal of the controller, a baseline bode fingerprint pertaining to a state associated with the processing chamber. The operations further include storing, in computer storage, the baseline bode fingerprint to be used in performing diagnostics of the processing chamber.

公开(公告)号：US11289387B2

公开(公告)日：2022-03-29

申请号：US16944285

申请日：2020-07-31

Applicant: APPLIED MATERIALS, INC.

Inventor： Prayudi Lianto ,  Sik Hin Chi ,  Shih-Chao Hung ,  Pin Gian Gan ,  Ricardo Fujii Vinluan ,  Gaurav Mehta ,  Ramesh Chidambaram ,  Guan Huei See ,  Arvind Sundarrajan ,  Upendra V. Ummethala ,  Wei Hao Kew ,  Muhammad Adli Danish Bin Abdullah ,  Michael Charles Kutney ,  Mark McTaggart Wylie ,  Amulya Ligorio Athayde ,  Glen T. Mori

IPC: H01L21/768 ,  H01L21/66 ,  H01L21/304 ,  H01L21/306 ,  H01L21/02 ,  H01L21/3105 ,  H01L21/683

Abstract: Methods and apparatus perform backside via reveal processes using a centralized control framework for multiple process tools. In some embodiments, a method for performing a backside via reveal process may include receiving process tool operational parameters from process tools involved in the backside via reveal process by a central controller, receiving sensor metrology data from at least one or more of the process tools involved in the backside via reveal process, and altering the backside reveal process based, at least in part, on the process tool operational parameters and the sensor metrology data by adjusting two or more of the process tools involved in the backside via reveal process. The profile parameters are configured to prevent backside via breakage during a chemical mechanical polishing (CMP) process.

公开(公告)号：US20220066411A1

公开(公告)日：2022-03-03

申请号：US17379728

申请日：2021-07-19

Applicant: APPLIED MATERIALS, INC.

Inventor： Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

IPC: G05B19/401 ,  G06N20/00 ,  G06N5/04

Abstract: Methods and systems for detecting and correcting substrate process drift using machine learning are provided. Data associated with processing each of a first set of substrates at a manufacturing system according to a process recipe is provided as input to a trained machine learning model. One or more outputs are obtained from the trained machine learning model. An amount of drift of a first set of metrology measurement values for the first set of substrates from a target metrology measurement value is determined from the one or more outputs. Process recipe modification identifying one or more modifications to the process recipe is also determined. For each modification, an indication of a level of confidence that a respective modification to the process recipe satisfies a drift criterion for a second set of substrates is determined. In response to an identification of the respective modification with a level of confidence that satisfies a level of confidence criterion, the process recipe is updated based on the respective modification.

公开(公告)号：US12136557B2

公开(公告)日：2024-11-05

申请号：US18335899

申请日：2023-06-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Upendra V. Ummethala ,  Blake Erickson ,  Prashanth Kumar ,  Michael Kutney ,  Steven Trey Tindel ,  Zhaozhao Zhu

IPC: H01L21/67 ,  H01L21/66

Abstract: A process recipe associated with a substrate at a manufacturing system is identified. A first set of measurements for the substrate is obtained from a substrate measurement subsystem. A second set of measurements for the substrate is obtained from one or more sensors of a chamber of the manufacturing system. A determination is made based on the obtained first set of measurements and the obtained second set of measurements of whether to modify the process recipe by at least one of modifying an operation of the process recipe or generating an instruction to prevent completion of execution of one or more operations of the process recipe.

公开(公告)号：US20230042432A1

公开(公告)日：2023-02-09

申请号：US17892441

申请日：2022-08-22

Applicant: Applied Materials, Inc.

Inventor： Tao Zhang ,  Upendra V. Ummethala ,  Ajit Balakrishna

IPC: G01R31/3177 ,  G01D21/02 ,  G01F1/86 ,  G05B13/02 ,  G01F1/84

Abstract: A non-transitory computer-readable storage medium stores instructions, which when executed by a processing device of a diagnostic server, cause the processing device to perform certain operations. The operations include receiving, from a processing chamber, (i) measurement values of a combined signal that is based on an injection of an alternating signal wave onto a first output signal of a controller of the processing chamber, and (ii) measurement values of a second output signal of the controller that incorporates feedback from the processing chamber. The operations further include generating, based on the measurement values of the combined signal and the measurement values of the second output signal of the controller, a baseline bode fingerprint pertaining to a state associated with the processing chamber. The operations further include storing, in computer storage, the baseline bode fingerprint to be used in performing diagnostics of the processing chamber.