公开(公告)号：US20190106788A1

公开(公告)日：2019-04-11

申请号：US16213702

申请日：2018-12-07

Applicant: ASM IP Holding B.V.

Inventor： Mark Hawkins ,  Bradley Leonard Halleck ,  Tom Kirschenheiter ,  Benjamin Hossa ,  Clay Pottebaum ,  Claudio Miskys

IPC: C23C16/52 ,  C23C16/455

Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.

公开(公告)号：US12043899B2

公开(公告)日：2024-07-23

申请号：US17840960

申请日：2022-06-15

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4411 ,  C23C16/4586

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：US20220307139A1

公开(公告)日：2022-09-29

申请号：US17840960

申请日：2022-06-15

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/44 ,  C23C16/458

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：US20180195174A1

公开(公告)日：2018-07-12

申请号：US15402993

申请日：2017-01-10

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4411 ,  C23C16/4586

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：US10604847B2

公开(公告)日：2020-03-31

申请号：US16213702

申请日：2018-12-07

Applicant: ASM IP Holding B.V.

Inventor： Mark Hawkins ,  Bradley Leonard Halleck ,  Tom Kirschenheiter ,  Benjamin Hossa ,  Clay Pottebaum ,  Claudio Miskys

IPC: C23C16/455 ,  C23C16/52

Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.

公开(公告)号：US10167557B2

公开(公告)日：2019-01-01

申请号：US14218690

申请日：2014-03-18

Applicant: ASM IP Holding B.V.

Inventor： Mark Hawkins ,  Bradley Leonard Halleck ,  Tom Kirschenheiter ,  Benjamin Hossa ,  Clay Pottebaum ,  Claudio Miskys

IPC: C23C16/455 ,  C23C16/52

Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.

公开(公告)号：US20150267299A1

公开(公告)日：2015-09-24

申请号：US14218690

申请日：2014-03-18

Applicant: ASM IP Holding B.V.

Inventor： Mark Hawkins ,  Bradley Leonard Halleck ,  Tom Kirschenheiter ,  Benjamin Hossa ,  Clay Pottebaum ,  Claudio Miskys

IPC: C23C16/52 ,  G05D7/06 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/45502 ,  C23C16/45523 ,  C23C16/45561 ,  C23C16/45574 ,  Y10T137/87249 ,  Y10T137/87877

Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.

Abstract translation: 公开了一种气体分配系统，包括气体分配系统的反应器系统以及使用气体分配系统和反应器系统的方法。 气体分配系统可以用于气相反应器系统，以独立地微调反应器的反应物体的气源位置和气体流量。