公开(公告)号：US20160210397A1

公开(公告)日：2016-07-21

申请号：US14913670

申请日：2014-08-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Bart LAENENS ,  Sander Frederik WUISTER

IPC: G06F17/50 ,  G03F1/36

CPC classification number: G06F17/5081 ,  G03F1/36 ,  G03F7/0002 ,  G06F17/5009

Abstract: A method of determining a characteristic of a guiding template for guiding self-assembly of block copolymer to form an entirety of a design layout, or a portion thereof, including a plurality of design features, each design feature including one or more elemental features, the method including selecting a characteristic of a guiding template for each of the one or more elemental features of the plurality of design features from a database or a computer readable non-transitory medium, the database or the computer readable non-transitory medium storing a characteristic of a guiding template for each of the one or more elemental features, and determining the characteristic of the guiding template to form the entirety of the design layout, or the portion thereof, by combining the selected characteristic of the guiding template for the one or more elemental features for each of the plurality of design features.

Abstract translation: 一种确定引导模板的特征的方法，用于引导嵌段共聚物的自组装以形成包括多个设计特征的整个设计布局或其一部分，每个设计特征包括一个或多个元素特征， 方法，包括从数据库或计算机可读的非暂时介质中选择所述多个设计特征中的所述一个或多个元素特征中的每一个的指导模板的特征，所述数据库或所述计算机可读非暂时介质存储 用于所述一个或多个元素特征中的每一个的引导模板，以及通过组合用于所述一个或多个元素的所述引导模板的所选特征来确定所述引导模板的特征以形成所述设计布局的整体或其部分 用于多个设计特征中的每一个的特征。

公开(公告)号：US20210096474A1

公开(公告)日：2021-04-01

申请号：US16499349

申请日：2018-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Bart LAENENS

IPC: G03F7/20

Abstract: Methods and apparatus for determining a focus of a projection system are disclosed. In one arrangement, a method includes obtaining first data derived from a first measurement of one or more selected properties of a target pattern formed on a substrate by exposing the substrate using the projection system. The first measurement is performed before the substrate is etched based on the target pattern. The method further includes obtaining second data derived from a second measurement of the one or more selected properties of the target pattern. The second measurement is performed after the substrate is etched based on the target pattern. The method further includes determining the focus of the projection system using the first data and the second data.

公开(公告)号：US20160178999A1

公开(公告)日：2016-06-23

申请号：US14909057

申请日：2014-07-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Frederik WUISTER ,  Bart LAENENS ,  David AMBESI

IPC: G03F1/70 ,  G06F17/50

CPC classification number: G03F1/70 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  G06F17/5072 ,  G06F17/5081

Abstract: A method of design or verification for a self-assemblable block copolymer feature, the block copolymer feature including a first domain having a first polymer type and a second domain having a second polymer type, the method including, based on the length of the second polymer type or on an uncertainty in position of the first domain within the block copolymer feature calculated based on the length of the second polymer type, adjusting a parameter of the self-assembly process of a block copolymer feature or verifying a placement of a block copolymer feature.

Abstract translation: 一种用于可自组装嵌段共聚物特征的设计或验证方法，所述嵌段共聚物特征包括具有第一聚合物类型的第一结构域和具有第二聚合物类型的第二结构域，所述方法包括基于第二聚合物的长度 类型或基于第二聚合物类型的长度计算的嵌段共聚物特征中的第一结构域的不确定性，调节嵌段共聚物特征的自组装过程的参数或验证嵌段共聚物特征的放置 。