公开(公告)号：US20150212428A1

公开(公告)日：2015-07-30

申请号：US14419910

申请日：2013-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。

公开(公告)号：US20190049852A1

公开(公告)日：2019-02-14

申请号：US16079169

申请日：2017-02-03

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Fransiscus Mathijs Jacobs ,  Pavel Kagan ,  Jeroen Pieter Starreveld ,  Maurice Willem Jozef Etienne Wijckmans

IPC: G03F7/20 ,  F16F13/00 ,  F16F9/02 ,  F16F15/023

Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator pan arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.

公开(公告)号：US09575416B2

公开(公告)日：2017-02-21

申请号：US14419910

申请日：2013-08-02

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。

公开(公告)号：US10816910B2

公开(公告)日：2020-10-27

申请号：US16079169

申请日：2017-02-03

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Cornelius Adrianus Lambertus De Hoon ,  Fransiscus Mathijs Jacobs ,  Pavel Kagan ,  Jeroen Pieter Starreveld ,  Maurice Willem Jozef Etienne Wijckmans

IPC: G03F7/20 ,  F16F9/02 ,  F16F15/023 ,  F16F13/00 ,  F16F15/027

Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.

公开(公告)号：US10191393B2

公开(公告)日：2019-01-29

申请号：US15558552

申请日：2016-02-22

Applicant: ASML Netherlands B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Marcel Koenraad Marie Baggen ,  Fransiscus Mathijs Jacobs ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Frank Pieter Albert Van Den Berkmortel ,  Marc Wilhelmus Maria Van Der Wijst

IPC: G03F7/20 ,  G03F9/00

Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.