公开(公告)号：US09651877B2

公开(公告)日：2017-05-16

申请号：US14439130

申请日：2013-11-08

Applicant: ASML Netherlands B.V.

Inventor： Willem Herman Gertruda Anna Koenen

IPC: G03F9/00 ,  G03F7/20 ,  G01D5/347 ,  G02B5/18 ,  G01D5/38

CPC classification number: G03F9/7076 ,  G01D5/347 ,  G01D5/34776 ,  G01D5/38 ,  G02B5/1861 ,  G03F7/70133 ,  G03F7/70775 ,  G03F9/7049 ,  G03F9/7088

Abstract: A position measurement system to determine a position of a first object relative to a second object, includes an encoder head mounted on the first object, a grating mounted on the second object, wherein the grating includes a first array of grating lines in a first direction and a second array of grating lines in a second direction to diffract a measurement beam incident on the first and second arrays in at least one first diffracted beam in the first direction and in at least one second diffracted beam in the second direction, wherein the first diffracted beam is for position measurement in the first direction and the second diffracted beam is for position measurement in the second direction, wherein the measurement beam has a power quantity, and the grating is configured to distribute the power quantity unevenly over the first and second diffracted beams.

公开(公告)号：US20150212428A1

公开(公告)日：2015-07-30

申请号：US14419910

申请日：2013-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。

公开(公告)号：US09470988B2

公开(公告)日：2016-10-18

申请号：US14437441

申请日：2013-10-17

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Albert Johannes Maria Jansen ,  Andre Bernardus Jeunink ,  Johannes Mathias Theodorus Antonius Adriaens ,  Frank Auer ,  Peterjan Broomans ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Willem Herman Gertruda Anna Koenen ,  Sebastiaan Smit ,  Joris Wilhelmus Henricus Vermunt

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Abstract translation: 一种用于将物体定位在光刻设备中的定位系统，包括：可在操作区域中移动的第一和第二物镜台; 第一位置测量系统，用于在操作区域中提供相对于参考的第二对象表的增量位置测量，其中第一位置测量系统被配置为提供第一对象表相对于参考的绝对位置测量; 第二位置测量系统，用于提供相对于第二对象表的第一对象表的绝对位置测量，并且其中，第一位置测量系统还被配置为提供第二对象表相对于参考的绝对位置测量，基于 第一对象表相对于参考的绝对位置测量以及第一对象表相对于第二对象表的绝对位置测量。

公开(公告)号：US20150277242A1

公开(公告)日：2015-10-01

申请号：US14437441

申请日：2013-10-17

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Albert Johannes Maria Jansen ,  Andre Bernardus Jeunink ,  Johannes Mathias Theodorus Antonius Adriaens ,  Frank Auer ,  Peterjan Broomans ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Willem Herman Gertruda Anna Koenen ,  Sebastiaan Smit ,  Joris Wilhelmus Henricus Vermunt

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Abstract translation: 一种用于将物体定位在光刻设备中的定位系统，包括：可在操作区域中移动的第一和第二物镜台; 第一位置测量系统，用于在操作区域中提供相对于参考的第二对象表的增量位置测量，其中第一位置测量系统被配置为提供第一对象表相对于参考的绝对位置测量; 第二位置测量系统，用于提供相对于第二对象表的第一对象表的绝对位置测量，并且其中，第一位置测量系统还被配置为提供第二对象表相对于参考的绝对位置测量，基于 第一对象表相对于参考的绝对位置测量以及第一对象表相对于第二对象表的绝对位置测量。

公开(公告)号：US11774865B2

公开(公告)日：2023-10-03

申请号：US17636765

申请日：2020-07-24

Applicant: ASML Netherlands B.V.

Inventor： Thijs Adriaan Cornelis Van Keulen ,  Hendrikus Herman Marie Cox ,  Ramidin Izair Kamidi ,  Willem Herman Gertruda Anna Koenen

IPC: G03F7/20 ,  G03F7/00 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70216 ,  G03F9/7003 ,  H01L21/682

Abstract: A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.

公开(公告)号：US09575416B2

公开(公告)日：2017-02-21

申请号：US14419910

申请日：2013-08-02

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。