公开(公告)号：US11422473B2

公开(公告)日：2022-08-23

申请号：US17256332

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jiao Liang ,  Chen Zhang ,  Qiang Zhang ,  Yunbo Guo

IPC: G03F7/20

Abstract: A method for improving a process model by measuring a feature on a printed design that was constructed based in part on a target design is disclosed. The method includes obtaining a) an image of the printed design from an image capture device and b) contours based on shapes in the image. The method also includes identifying, by a pattern recognition program, patterns on the target design that include the feature and determining coordinates, on the contours, that correspond to the feature. The method further includes improving the process model by at least a) providing a measurement of the feature based on the coordinates and b) calibrating the process model based on a comparison of the measurement with a corresponding feature in the target design.

公开(公告)号：US12182983B2

公开(公告)日：2024-12-31

申请号：US17268128

申请日：2019-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Chen Zhang ,  Qiang Zhang ,  Jen-Shiang Wang ,  Jiao Liang

IPC: G06T7/00 ,  G01N23/2251 ,  G03F7/00

Abstract: A method for evaluating images of a printed pattern. The method includes obtaining a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying one or more features of the first averaged image. The method further includes evaluating the first averaged image, using an image quality classification model and based at least on the one or more features. The evaluating includes determining, by the image quality classification model, whether the first averaged image satisfies a metric.

公开(公告)号：US11567413B2

公开(公告)日：2023-01-31

申请号：US17430517

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Chang An Wang ,  Alvin Jianjiang Wang ,  Jiao Liang ,  Jen-Shiang Wang ,  Mu Feng

IPC: G03F7/20

Abstract: A method for determining measurement data of a printed pattern on a substrate. The method involves obtaining (i) images of the substrate including a printed pattern corresponding to a reference pattern, (ii) an averaged image of the images, and (iii) a composite contour based on the averaged image. Further, the composite contour is aligned with respect to a reference contour of the reference pattern and contours are extracted from the images based on both the aligned composite contour and the output of die-to-database alignment of the composite contour. Further, the method determines a plurality of pattern measurements based on the contours and the measurement data corresponding to the printed patterns based on the plurality of the pattern measurements. Further, the method determines a one or more process variations such as stochastic variation, inter-die variation, intra-die variation and/or total variation.