METROLOGY APPARATUS WITH RADIATION SOURCE HAVING MULTIPLE BROADBAND OUTPUTS

    公开(公告)号:US20210240088A1

    公开(公告)日:2021-08-05

    申请号:US17213983

    申请日:2021-03-26

    Abstract: Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation.

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