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Patent Agency Ranking
公开(公告)号：US20230280660A1
公开(公告)日：2023-09-07
申请号：US18196108
申请日：2023-05-11
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Sebastian Thomas BAUERSCHMIDT , Peter Maximilian GÖTZ , Patrick Sebastian UEBEL , Ronald Franciscus Herman HUGERS , Jan Adrianus BOER , Edwin Johannes Cornelis BOS , Andreas Johannes Antonius BROUNS , Vitaliy PROSYENTSOV , Paul William SCHOLTES - VAN EIJK , Paulus Antonius Andreas TEUNISSEN , Mahesh Upendra AJGAONKAR
CPC classification number: G03F7/70625 , G02B1/005 , G02B6/02 , G03F7/7065 , G01B11/27 , G01J1/4257 , G03F7/70525 , G01M11/30
Abstract: A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.
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公开(公告)号：US20230091241A1
公开(公告)日：2023-03-23
申请号：US17909223
申请日：2021-02-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Vitaliy PROSYENTSOV , Yongfeng NI
Abstract: An assembly including a non-linear element configured for generating broadband radiation from input radiation coupled into the non-linear element. The assembly further includes an optical element positioned downstream of the non-linear element configured to reflect a fraction of the broadband radiation back into the non-linear element. The non-linear element can be a nonlinear fiber, such as a hollow-core photonic crystal fiber (HC-PCF).
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公开(公告)号：US20150029481A1
公开(公告)日：2015-01-29
申请号：US14512120
申请日：2014-10-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Vitaliy PROSYENTSOV , Willem Jurrianus Venema , Kars Zeger Troost , Adrianus Martinus Van Der Wielen
IPC: G03F7/20
CPC classification number: G03F7/705 , G03F1/44 , G03F7/70133 , G03F7/70783 , G03F7/70875
Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.
Abstract translation: 光刻掩模版被照射以将图案转印到基板上，引起由于加热引起的变形。 使用标线的周边部分中的参考标记计算变形，并测量其相对位置随时间的变化。 定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。 在一个实施例中，每个方程将标记对对于沿着连接每对的线（s，s1，s2）的细胞的扩张的位置。 可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。 校正可以根据计算结果进行应用。 可以将能量施加到图案形成装置（例如通过热输入或机械致动器）以修改局部位置偏差的分布。
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公开(公告)号：US20210063894A1
公开(公告)日：2021-03-04
申请号：US17004140
申请日：2020-08-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastian Thomas BAUERSCHMIDT , Peter Maximilian GÖTZ , Patrick Sebastian UEBEL , Ronald Franciscus Herman HUGERS , Jan Adrianus BOER , Edwin Johannes Cornelis BOS , Andreas Johannes Antonius BROUNS , Vitaliy PROSYENTSOV , Paul William SCHOLTES - VAN EIJK , Paulus Antonius Andreas TEUNISSEN , Mahesh Upendra AJGAONKAR
Abstract: A mode control system and method for controlling an output mode of a broadband radiation source including a photonic crystal fiber (PCF). The mode control system includes at least one detection unit configured to measure one or more parameters of radiation emitted from the broadband radiation source to generate measurement data, and a processing unit configured to evaluate mode purity of the radiation emitted from the broadband radiation source, from the measurement data. Based on the evaluation, the mode control system is configured to generate a control signal for optimization of one or more pump coupling conditions of the broadband radiation source. The one or more pump coupling conditions relate to the coupling of a pump laser beam with respect to a fiber core of the photonic crystal fiber.
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公开(公告)号：US20170123323A1
公开(公告)日：2017-05-04
申请号：US15405009
申请日：2017-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Vitaliy PROSYENTSOV , Willem Jurrianus VENEMA , Kars Zeger TROOST , Adrianus Martinus VAN DER WIELEN
CPC classification number: G03F7/705 , G03F1/44 , G03F7/70133 , G03F7/70783 , G03F7/70875
Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.
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