公开(公告)号：US12235592B2

公开(公告)日：2025-02-25

申请号：US18008283

申请日：2021-06-09

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Koos Van Berkel ,  Marcus Adrianus Van De Kerkhof ,  Roger Franciscus Mattheus Maria Hamelinck ,  Shahab Shervin ,  Marinus Augustinus Christiaan Verschuren ,  Johannes Bernardus Charles Engelen ,  Matthias Kruizinga ,  Tammo Uitterdijk ,  Oleksiy Sergiyovich Galaktionov ,  Kjeld Gertrudus Hendrikus Janssen ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Peter Van Delft

IPC: G03F7/00

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US10126663B2

公开(公告)日：2018-11-13

申请号：US15823247

申请日：2017-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg ,  Peter Van Delft

IPC: G03F7/20 ,  B05D1/00

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

公开(公告)号：US09829803B2

公开(公告)日：2017-11-28

申请号：US15131986

申请日：2016-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg ,  Peter Van Delft

IPC: G03F7/20 ,  B05D1/00

CPC classification number: G03F7/70716 ,  B05D1/005 ,  G03F7/70341 ,  G03F7/70691 ,  G03F7/707

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.