公开(公告)号：US10908518B2

公开(公告)日：2021-02-02

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. Delpuerto ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. Henderson ,  Raymond Wilhelmus Louis Lafarre ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US11988971B2

公开(公告)日：2024-05-21

申请号：US17612679

申请日：2020-05-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Matthew Lipson ,  Satish Achanta ,  Benjamin David Dawson ,  Matthew Anthony Sorna ,  Iliya Sigal ,  Tammo Uitterdijk

IPC: G03F7/00

CPC classification number: G03F7/70716

Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：US10001713B2

公开(公告)日：2018-06-19

申请号：US14762452

申请日：2014-02-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. Del Puerto ,  Matthew Lipson ,  Kenneth C. Henderson ,  Raymond Wilhelmus Louis LaFarre ,  Louis John Markoya ,  Tammo Uitterdijk ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Antonius Franciscus Johannes De Groot ,  Ronald Van Der Wilk

IPC: G03B27/52 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US12235592B2

公开(公告)日：2025-02-25

申请号：US18008283

申请日：2021-06-09

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Koos Van Berkel ,  Marcus Adrianus Van De Kerkhof ,  Roger Franciscus Mattheus Maria Hamelinck ,  Shahab Shervin ,  Marinus Augustinus Christiaan Verschuren ,  Johannes Bernardus Charles Engelen ,  Matthias Kruizinga ,  Tammo Uitterdijk ,  Oleksiy Sergiyovich Galaktionov ,  Kjeld Gertrudus Hendrikus Janssen ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Peter Van Delft

IPC: G03F7/00

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：USRE49066E1

公开(公告)日：2022-05-10

申请号：US16804549

申请日：2020-02-28

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US10324383B2

公开(公告)日：2019-06-18

申请号：US15764594

申请日：2016-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelius Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US20180267414A1

公开(公告)日：2018-09-20

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. DELPUERTO ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US09606448B2

公开(公告)日：2017-03-28

申请号：US13903885

申请日：2013-05-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

公开(公告)号：US09170498B2

公开(公告)日：2015-10-27

申请号：US13786400

申请日：2013-03-05

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel François Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Haico Victor Kok ,  Wilhelmus Jacobus Maria Rooijakkers ,  Tammo Uitterdijk

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system, support constructed to support patterning device, a projection system, an interferometric sensor and a detector. The interferometric sensor is designed to measure one or more wavefronts of a radiation beam projected by the projection system from an adjustable polarizer. The interferometric sensor includes a diffractive element disposed at a level of a substrate in the lithographic apparatus and a detector spaced apart from the diffractive element, the diffractive element being arranged to provide shearing interferometry between at least two wavefronts mutually displaced in a direction of shear. The detector is designed to determine, from the wavefront measurements, information on polarization affecting properties of the projection system.

Abstract translation: 光刻设备包括照明系统，构造成支撑图案形成装置的支撑，投影系统，干涉测量传感器和检测器。 干涉测量传感器被设计成测量由可调偏振器投射的投影系统投影的辐射束的一个或多个波前。 所述干涉测量传感器包括设置在所述光刻设备中的基底水平处的衍射元件和与所述衍射元件间隔开的检测器，所述衍射元件被布置成在剪切方向上相互移位的至少两个波前之间提供剪切干涉测量。 该检测器设计用于从波前测量中确定投影系统对偏振影响特性的信息。

公开(公告)号：US20140347642A1

公开(公告)日：2014-11-27

申请号：US14456845

申请日：2014-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof LOOPSTRA ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种用于位于投影系统和基板之间的浸液的光刻投影装置。公开了几种方法和机构来保护投影系统，基板台和液体限制系统的部件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。