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公开(公告)号：US12235592B2
公开(公告)日：2025-02-25
申请号：US18008283
申请日：2021-06-09
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Koos Van Berkel , Marcus Adrianus Van De Kerkhof , Roger Franciscus Mattheus Maria Hamelinck , Shahab Shervin , Marinus Augustinus Christiaan Verschuren , Johannes Bernardus Charles Engelen , Matthias Kruizinga , Tammo Uitterdijk , Oleksiy Sergiyovich Galaktionov , Kjeld Gertrudus Hendrikus Janssen , Johannes Adrianus Cornelis Maria Pijnenburg , Peter Van Delft
IPC: G03F7/00
Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
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公开(公告)号：US11009803B2
公开(公告)日：2021-05-18
申请号：US16587483
申请日：2019-09-30
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Matthias Kruizinga , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Erik Willem Bogaart , Derk Servatius Gertruda Brouns , Marc Bruijn , Richard Joseph Bruls , Jeroen Dekkers , Paul Janssen , Mohammad Reza Kamali , Ronald Harm Gunther Kramer , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Matthew Lipson , Erik Roelof Loopstra , Joseph H. Lyons , Stephen Roux , Gerrit Van Den Bosch , Sander Van Den Heijkant , Sandra Van Der Graaf , Frits Van Der Meulen , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US11762281B2
公开(公告)日：2023-09-19
申请号：US17130537
申请日：2020-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich Nasalevich , Erik Achilles Abegg , Nirupam Banerjee , Michiel Alexander Blauw , Derk Servatius Gertruda Brouns , Paul Janssen , Matthias Kruizinga , Egbert Lenderink , Nicolae Maxim , Andrey Nikipelov , Arnoud Willem Notenboom , Claudia Piliego , Mária Péter , Gijsbert Rispens , Nadja Schuh , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Antonius Willem Verburg , Johannes Petrus Martinus Bernardus Vermeulen , David Ferdinand Vles , Willem-Pieter Voorthuijzen , Aleksandar Nikolov Zdravkov
CPC classification number: G03F1/62 , G02B5/208 , G02B5/283 , G03F1/82 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G03F7/70958 , G03F7/70983
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US11635681B2
公开(公告)日：2023-04-25
申请号：US17375283
申请日：2021-07-14
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Arnoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US10908496B2
公开(公告)日：2021-02-02
申请号：US16093537
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich Nasalevich , Erik Achilles Abegg , Nirupam Banerjee , Michiel Alexander Blauw , Derk Servatius Gertruda Brouns , Paul Janssen , Matthias Kruizinga , Egbert Lenderink , Nicolae Maxim , Andrey Nikipelov , Arnoud Willem Notenboom , Claudia Piliego , Mária Péter , Gijsbert Rispens , Nadja Schuh , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Antonius Willem Verburg , Johannes Petrus Martinus Bernardus Vermeulen , David Ferdinand Vles , Willem-Pieter Voorthuijzen , Aleksandar Nikolov Zdravkov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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Patent Agency Ranking
公开(公告)号：US10558129B2
公开(公告)日：2020-02-11
申请号：US15526654
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： Matthias Kruizinga , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Erik Willem Bogaart , Derk Servatius Gertruda Brouns , Marc Bruijn , Richard Joseph Bruls , Jeroen Dekkers , Paul Janssen , Mohammad Reza Kamali , Ronald Harm Gunther Kramer , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Matthew Lipson , Erik Roelof Loopstra , Joseph H. Lyons , Stephen Roux , Gerrit Van Den Bosch , Sander Van Den Heijkant , Sandra Van Der Graaf , Frits Van Der Meulen , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US10539886B2
公开(公告)日：2020-01-21
申请号：US15526639
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kesters , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.
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公开(公告)号：US11086213B2
公开(公告)日：2021-08-10
申请号：US16798688
申请日：2020-02-24
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Amoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US11029595B2
公开(公告)日：2021-06-08
申请号：US16707201
申请日：2019-12-09
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda Brouns , Dennis De Graaf , Robertus Cornelis Martinus De Kruif , Paul Janssen , Matthias Kruizinga , Arnoud Willem Notenboom , Daniel Andrew Smith , Beatrijs Louise Marie-Joseph Katrien Verbrugge , James Norman Wiley
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US10969701B2
公开(公告)日：2021-04-06
申请号：US16572156
申请日：2019-09-16
Applicant: ASML Netherlands B.V.
Inventor： Frits Van Der Meulen , Maarten Mathijs Marinus Jansen , Jorge Manuel Azeredo Lima , Derk Servatius Gertruda Brouns , Marc Bruijn , Jeroen Dekkers , Paul Janssen , Ronald Harm Gunther Kramer , Matthias Kruizinga , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Gerrit Van Den Bosch , Jérôme François Sylvain Virgile Van Loo , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Angelo Cesar Peter De Klerk , Jacobus Maria Dings , Maurice Leonardus Johannes Janssen , Roland Jacobus Johannes Kerstens , Martinus Jozef Maria Kester , Michel Loos , Geert Middel , Silvester Matheus Reijnders , Frank Johannes Christiaan Theuerzeit , Anne Johannes Wilhelmus Van Lievenoogen
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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