公开(公告)号：US20220082947A1

公开(公告)日：2022-03-17

申请号：US17423328

申请日：2019-12-13

Applicant: ASML Netherlands B.V.

Inventor： Marinus Engelbertus Cornelis MUTSAERS ,  Robertus Johannes Marinus DE JONGH ,  Jeroen Pieter STARREVELD

IPC: G03F7/20

Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.

公开(公告)号：US20250053102A1

公开(公告)日：2025-02-13

申请号：US18717684

申请日：2022-12-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Robertus Johannes Marinus DE JONGH

IPC: G03F7/00

Abstract: A method of reducing cyclic error effects in a lithographic process having a projection phase and an idle phase, the method including controlling in a first control loop a first position of a first module, the first module being a position controlled mirror of a projection system, the first control loop having a first bandwidth and including a first position measurement system having a first cyclic error, wherein controlling the first position includes continuously moving the first module at least during the projection phase, such that a first main frequency of the first cyclic error will be above the first bandwidth of the first control loop.

公开(公告)号：US20170363965A1

公开(公告)日：2017-12-21

申请号：US15525610

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Raoul Maarten Simon KNOPS ,  Bob STREEFKERK ,  Christiaan Louis VALENTIN ,  Jan Bernard Plechelmus VAN SCHOOT ,  Wilhelmus Franciscus Johanne SIMONS ,  Leon Leonardus Franciscus MERKX ,  Robertus Johannes Marinus DE JONGH ,  Roel Johannes Elisabeth MERRY ,  Michael Frederik YPMA

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70266 ,  G03F7/705 ,  G03F7/706

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

公开(公告)号：US20170038693A1

公开(公告)日：2017-02-09

申请号：US15303478

申请日：2015-03-19

Applicant: ASML Netherlands B.V.

Inventor： Robertus Johannes Marinus DE JONGH ,  Leon Leonardus Franciscus MERKX ,  Roel Johannes Elisabeth MERRY

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G02B7/1828 ,  G03F7/70258 ,  G03F7/70758 ,  G03F7/70825

Abstract: A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (200) to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.

Abstract translation: 一种光刻设备，包括用于重定向辐射束的反射器（15），例如， 一个EUV光束。 使用控制器和定位系统控制反射器的位置。 定位系统包括非补偿致动器装置（300）和用于补偿非补偿致动器装置的寄生力的补偿致动装置（200）。 定位系统和控制器可以提供更准确的反射器位置，减少反射器的变形并减小通过反射器透射的力的大小。