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公开(公告)号：US10591828B2
公开(公告)日：2020-03-17
申请号：US16270958
申请日：2019-02-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US09823589B2
公开(公告)日：2017-11-21
申请号：US15078814
申请日：2016-03-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
CPC classification number: G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US10649346B2
公开(公告)日：2020-05-12
申请号：US16271303
申请日：2019-02-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Joost Jeroen Ottens , Raymond Wilhelmus Louis Lafarre
Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
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公开(公告)号：US10437156B2
公开(公告)日：2019-10-08
申请号：US16203693
申请日：2018-11-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Kornelis Tijmen Hoekerd
IPC: G03F7/20
Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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公开(公告)号：US09261796B2
公开(公告)日：2016-02-16
申请号：US14310873
申请日：2014-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Kornelis Tijmen Hoekerd
CPC classification number: G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
Abstract translation: 提供了一种用于清洁光刻设备的污染表面的设备和方法。 液体限制结构包括用于向结构下方的间隙供应和提取液体的至少两个开口。 可以切换开口之间的流动方向。 液体可以被供应到适于双流的开口的径向向外的间隙。 供应和提取线分别从液体限制结构提供液体和从液体中提取液体具有耐有机液体腐蚀的内表面。 腐蚀性清洁液可用于清洁光刻胶污染物。
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Patent Agency Ranking
公开(公告)号：US09645508B2
公开(公告)日：2017-05-09
申请号：US15018582
申请日：2016-02-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Kornelis Tijmen Hoekerd
CPC classification number: G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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公开(公告)号：US10203611B2
公开(公告)日：2019-02-12
申请号：US15818232
申请日：2017-11-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC: G03F7/20
Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
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公开(公告)号：US20140362355A1
公开(公告)日：2014-12-11
申请号：US14310873
申请日：2014-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Kornelis Tijmen Hoekerd
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
Abstract translation: 提供了一种用于清洁光刻设备的污染表面的设备和方法。 液体限制结构包括用于向结构下方的间隙供应和提取液体的至少两个开口。 可以切换开口之间的流动方向。 液体可以被供应到适于双流的开口的径向向外的间隙。 供应和提取线分别从液体限制结构提供液体和从液体中提取液体具有耐有机液体腐蚀的内表面。 腐蚀性清洁液可用于清洁光刻胶污染物。
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公开(公告)号：US10203612B2
公开(公告)日：2019-02-12
申请号：US15344994
申请日：2016-11-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Joost Jeroen Ottens , Raymond Wilhelmus Louis Lafarre
Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
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公开(公告)号：US09927716B2
公开(公告)日：2018-03-27
申请号：US15589674
申请日：2017-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi Kaneko , Kornelis Tijmen Hoekerd
CPC classification number: G03F7/70341 , G03F7/70925 , G03F7/7095 , G03F7/70975
Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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