公开(公告)号：US20240090109A1

公开(公告)日：2024-03-14

申请号：US18512264

申请日：2023-11-17

Applicant: ASML Netherlands B.V.

Inventor： Georgiy Olegovich Vaschenko ,  Bob Rollinger

IPC: H05G2/00 ,  G03F7/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/008

Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.

公开(公告)号：US11856681B2

公开(公告)日：2023-12-26

申请号：US17421055

申请日：2020-01-09

Applicant: ASML Netherlands B.V.

Inventor： Georgiy Olegovich Vaschenko ,  Bob Rollinger

IPC: H05G2/00 ,  G03F7/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/008

Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.

公开(公告)号：US11690159B2

公开(公告)日：2023-06-27

申请号：US17284060

申请日：2019-10-25

Applicant: ASML Netherlands B.V.

Inventor： Bob Rollinger ,  Georgiy Olegovich Vaschenko ,  Chirag Rajyaguru ,  Alexander Igorevich Ershov ,  Joshua Mark Lukens ,  Mathew Cheeran Abraham

IPC: H05G2/00

CPC classification number: H05G2/006

Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.

公开(公告)号：US20220361310A1

公开(公告)日：2022-11-10

申请号：US17432985

申请日：2020-02-06

Applicant: ASML Netherlands B.V.

Inventor： Pooriya Beyhaghi ,  Bob Rollinger

IPC: H05G2/00 ,  G03F7/20

Abstract: Apparatus for and method of controlling formation of droplets used to generate EUV radiation. The droplet source includes a fluid exiting an nozzle and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The droplet source produces a stream that breaks down into droplets that in turn coalesce into larger droplets as they progress towards the irradiation region. The electro-actuatable element is driven by a control signal having a sine wave component and a square wave component. Various parameters such as a phase difference between the sine wave component and the square wave component are measured and controlled to minimize the formation of noncoalesced satellite droplets in the stream.

公开(公告)号：US20220061144A1

公开(公告)日：2022-02-24

申请号：US17421055

申请日：2020-01-09

Applicant: ASML Netherlands B.V.

Inventor： Georgiy Olegovich Vaschenko ,  Bob Rollinger

IPC: H05G2/00 ,  G03F7/20

Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.

公开(公告)号：US11240904B2

公开(公告)日：2022-02-01

申请号：US16960947

申请日：2019-01-03

Applicant: ASML Netherlands B.V.

Inventor： Joshua Mark Lukens ,  Bob Rollinger ,  Pooriya Beyhaghi

IPC: H05G2/00

Abstract: Provided is an apparatus for and method of controlling formation of droplets (102a, b) used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source (92) includes a fluid exiting an nozzle (98) and a sub-system having an electro-actuatable element (104) producing a disturbance in the fluid (96). The droplet source produces a stream (100) that breaks down into droplets that in turn coalesce into larger droplets as they progress towards the irradiation region. The electro-actuatable element is driven by a hybrid waveform that controls the droplet generation/coalescence process. Also disclosed is a method of determining the transfer function for the nozzle.

公开(公告)号：US20230010985A1

公开(公告)日：2023-01-12

申请号：US17782696

申请日：2020-12-02

Applicant: ASML Netherlands B.V.

Inventor： Pooriya Beyhaghi ,  Charles Edward Kinney ,  Bob Rollinger ,  Joshua Mark Lukens

IPC: H05G2/00

Abstract: A method includes ejecting initial droplets of a material using a nozzle. The method includes applying a pressure on the nozzle using an electromechanical element. The method includes controlling the applied pressure on the nozzle using an electrical signal generated by a waveform generator. The electrical signal includes a first periodic waveform and a second periodic waveform. The method includes coalescing the initial droplets to generate coalesced droplets based on the first and second periodic waveforms and drag. The method includes generating a detection signal, using a detector, corresponding to time intervals between crossings of coalesced droplets at the detector. The method includes determining at least first and second ones of the time intervals using a processor.

公开(公告)号：US20220295625A1

公开(公告)日：2022-09-15

申请号：US17637654

申请日：2020-09-04

Applicant: ASML Netherlands B.V.

Inventor： Georgiy Olegovich Vaschenko ,  Bob Rollinger ,  Joshua Mark Lukens ,  Alexander Igorevich Ershov ,  Yoshiho Amada

IPC: H05G2/00

Abstract: An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction that is different than the first direction, a first portion of the tube passes through an opening in the second body wall the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.

公开(公告)号：US20220213981A1

公开(公告)日：2022-07-07

申请号：US17609842

申请日：2020-05-22

Applicant: ASML Netherlands B.V.

Inventor： Benjamin Andrew Sams ,  Dietmar Uwe Herbert Trees ,  Theodorus Wilhelmus Driessen ,  Bob Rollinger

IPC: F16K51/02 ,  H05G2/00

Abstract: A fluid control device (100) includes a structure (120) defining a valve cavity, a first fluid port (135), a second fluid port (140), and a third fluid port (145) configured to be fluidly coupled to a hermetic interior (105) of a body; and a plunger valve (130) within the valve cavity and configured to move between first and second modes while maintaining the hermetic interior of the body. In the first mode, the plunger valve is open such that a first fluid flow path is open between the hermetic interior and the first fluid port and fluid is free to pass between the first fluid port and the hermetic interior. In the second mode, the plunger valve is closed such that the first fluid port is blocked from the hermetic interior by the plunger valve and a second fluid flow path is open between the hermetic interior and the second fluid port.

公开(公告)号：US20210392733A1

公开(公告)日：2021-12-16

申请号：US17284060

申请日：2019-10-25

Applicant: ASML Netherlands B.V.

Inventor： Bob Rollinger ,  Georgiy Olegovich Vaschenko ,  Chirag Rajyaguru ,  Alexander Igorevich Ershov ,  Joshua Mark Lukens ,  Mathew Cheeran Abraham

IPC: H05G2/00

Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.