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公开(公告)号：USRE45284E1
公开(公告)日：2014-12-09
申请号：US13744340
申请日：2013-01-17
Applicant: ASML Netherlands B.V.
Inventor： Cheng-Qun Gui
CPC classification number: G03F7/70275 , G03F7/70291
Abstract: A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.
Abstract translation: 使用系统和方法在基板上形成特征。 该系统和方法包括使用包括选择性地对辐射束进行图案化的单独可控元件的第一阵列，包括一组透镜的第二阵列和在第一平面中从单独可控元件中的相应一个形成图像的孔止动件， 第三阵列，包括从第二平面中的第二阵列中的相应一个形成图像的透镜，以及将基板保持在第二平面中的基板台，使得基板从第二阵列中的相应一个接收图像。 在第一，第二和第三阵列中的元件之间形成相同的间隔。
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公开(公告)号：US20130201466A1
公开(公告)日：2013-08-08
申请号：US13791477
申请日：2013-03-08
Applicant: ASML Netherlands B.V.
Inventor： Richard Alexander GEORGE , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
IPC: G03B27/53
CPC classification number: G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
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公开(公告)号：US09335638B2
公开(公告)日：2016-05-10
申请号：US13973703
申请日：2013-08-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC classification number: G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
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公开(公告)号：US08675175B2
公开(公告)日：2014-03-18
申请号：US13791477
申请日：2013-03-08
Applicant: ASML Netherlands B.V.
Inventor： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC classification number: G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
Abstract translation: 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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