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公开(公告)号：US11094502B2
公开(公告)日：2021-08-17
申请号：US16064193
申请日：2016-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Bernardo Kastrup , Johannes Catharinus Hubertus Mulkens , Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erwin Paul Smakman , Tamara Druzhinina , Coen Adrianus Verschuren
Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
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公开(公告)号：US20240186107A1
公开(公告)日：2024-06-06
申请号：US18411525
申请日：2024-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Bernardo KASTRUP , Johannes Catharinus Hubertus Mulkens , Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erwin Paul Smakman , Tamara Druzhinina , Coen Adrianus Verschuren
CPC classification number: H01J37/263 , H01J37/023 , H01J37/15 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/0245 , H01J2237/2817
Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
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公开(公告)号：USRE46933E1
公开(公告)日：2018-07-03
申请号：US14715314
申请日：2015-05-18
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70733 , G03F7/70341
Abstract: The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
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Patent Agency Ranking
公开(公告)号：US11875966B2
公开(公告)日：2024-01-16
申请号：US17403006
申请日：2021-08-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bernardo Kastrup , Johannes Catharinus Hubertus Mulkens , Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erwin Paul Smakman , Tamara Druzhinina , Coen Adrianus Verschuren
CPC classification number: H01J37/263 , H01J37/023 , H01J37/15 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/0245 , H01J2237/2817
Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
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公开(公告)号：US10698312B2
公开(公告)日：2020-06-30
申请号：US16247179
申请日：2019-01-14
Applicant: ASML Netherlands B.V.
Inventor： Pieter-Jan Van Zwol , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Florian Didier Albin Dhalluin , Mária Péter , Luigi Scaccabarozzi , Willem Joan Van Der Zande
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.
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公开(公告)号：USRE45576E1
公开(公告)日：2015-06-23
申请号：US13970429
申请日：2013-08-19
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70733 , G03F7/70341
Abstract: The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
Abstract translation: 本发明涉及一种双级光刻设备，其中构造和布置两个基板台以进行相互配合以进行联合扫描运动。 联合扫描运动使平版印刷设备从第一配置中获得，其中将浸没液体限制在由第一级保持的第一基板和设备的投影系统之间，其中浸没液体被限制在第二配置之间 由两级的第二级保持的第二衬底和投影系统，使得在联合扫描运动期间，液体基本上被限制在相对于投影系统的空间内。
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公开(公告)号：US10228615B2
公开(公告)日：2019-03-12
申请号：US15320749
申请日：2015-07-02
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Arjen Boogaard , Florian Didier Albin Dhalluin , Alexey Sergeevich Kuznetsov , Mária Péter , Luigi Scaccabarozzi , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Andrei Mikhailovich Yakunin
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
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公开(公告)号：US09335638B2
公开(公告)日：2016-05-10
申请号：US13973703
申请日：2013-08-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC classification number: G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
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