公开(公告)号：US09372412B2

公开(公告)日：2016-06-21

申请号：US14839663

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin John Van Zwet ,  Pieter Willem Herman De Jager ,  Johannes Onvlee ,  Erik Christiaan Fritz

IPC: G03B27/32 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

公开(公告)号：US09335638B2

公开(公告)日：2016-05-10

申请号：US13973703

申请日：2013-08-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman De Jager ,  Vadim Yevgenyevich Banine ,  Jozef Petrus Henricus Benschop ,  Cheng-Qun Gui ,  Johannes Onvlee ,  Erwin John Van Zwet

IPC: G03B27/52 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70183 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.

公开(公告)号：US11953835B2

公开(公告)日：2024-04-09

申请号：US17793726

申请日：2020-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin John Van Zwet

IPC: G03F7/00

CPC classification number: G03F7/70558

Abstract: Method of exposing a substrate by a patterned radiation beam, comprising: —providing a radiation beam; —imparting the radiation beam by an array of individually controllable elements; —generating, from the radiation beam, a patterned radiation beam, by tilting the individually controllable elements between different positions about a tilting axis; —projecting the patterned radiation beam towards a substrate; —scanning a substrate across the patterned radiation beam in a scanning direction so as to expose the substrate to the patterned radiation beam, whereby the tilting axis of the individually controllable elements is substantially perpendicular to the scanning direction.

公开(公告)号：US10928736B2

公开(公告)日：2021-02-23

申请号：US16064274

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman De Jager ,  Coen Adrianus Verschuren ,  Erwin Paul Smakman ,  Erwin John Van Zwet ,  Wouter Frans Willem Mulckhuyse ,  Pieter Verhoeff ,  Robert Albertus Johannes Van Der Werf

IPC: G03F7/20 ,  G03B27/42

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.

公开(公告)号：US09715183B2

公开(公告)日：2017-07-25

申请号：US14365549

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Wouter Dick Koek ,  Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Heine Melle Mulder ,  Erwin John Van Zwet ,  Dries Smeets ,  Robert Paul Ebeling

IPC: G03B27/52 ,  G03F7/20 ,  G02B6/42

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

公开(公告)号：US20140347641A1

公开(公告)日：2014-11-27

申请号：US14365549

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Wouter Dick Koek ,  Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Heine Melle Mulder ,  Erwin John Van Zwet ,  Dries Smeets ,  Robert Paul Ebeling

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

Abstract translation: 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。