-
公开(公告)号：US12220678B2
公开(公告)日：2025-02-11
申请号：US17073111
申请日：2020-10-16
Applicant: Applied Materials, Inc
Inventor： Govindraj Desai , Sekar Krishnasamy , Sumedh Acharya , Dakshalkumar Patel , Jonathan Frankel , Quoc Truong , Mario Cambron , Ravindra Patil
Abstract: A reactor for coating particles includes a stationary vacuum chamber to hold a bed of particles to be coated, a chemical delivery system, and a paddle assembly. The paddle assembly includes a rotatable drive shaft and a first plurality of paddles and a second plurality of paddles that extend radially from the drive shaft. The spacing, cross-sections, and oblique angles of the paddles are such that orbiting of the paddles causes the first plurality of paddles and the second plurality of paddles to displace substantially equal volumes in opposite directions in the lower portion of the stationary vacuum chamber.
-
公开(公告)号：US20220032258A1
公开(公告)日：2022-02-03
申请号：US17073111
申请日：2020-10-16
Applicant: Applied Materials, Inc
Inventor： Govindraj Desai , Sekar Krishnasamy , Sumedh Acharya , Dakshalkumar Patel , Jonathan Frankel , Quoc Truong , Mario Cambron , Ravindra Patil
Abstract: A reactor for coating particles includes a stationary vacuum chamber to hold a bed of particles to be coated, a chemical delivery system, and a paddle assembly. The paddle assembly includes a rotatable drive shaft and a first plurality of paddles and a second plurality of paddles that extend radially from the drive shaft. The spacing, cross-sections, and oblique angles of the paddles are such that orbiting of the paddles causes the first plurality of paddles and the second plurality of paddles to displace substantially equal volumes in opposite directions in the lower portion of the stationary vacuum chamber.
-
Patent Agency Ranking
公开(公告)号：US10177002B2
公开(公告)日：2019-01-08
申请号：US15459536
申请日：2017-03-15
Applicant: APPLIED MATERIALS, INC.
Inventor： Geetika Bajaj , Ravindra Patil , Prerna Goradia , Robert Jan Visser
IPC: H01L21/322 , H01L21/3065 , H01L21/02 , H01L21/311 , H01L21/306
Abstract: Improved methods for chemically etching silicon are provided herein. In some embodiments, a method of etching a silicon material includes: (a) exposing the silicon material to a halogen-containing gas; (b) evacuating the halogen-containing gas from the semiconductor processing chamber; (c) exposing the silicon material to an amine vapor to etch a monolayer of the silicon material; (d) evacuating the amine vapor from the semiconductor processing chamber and; (e) optionally repeating (a)-(d) to etch the silicon material to a predetermined thickness.
-
公开(公告)号：US10081036B2
公开(公告)日：2018-09-25
申请号：US15269324
申请日：2016-09-19
Applicant: APPLIED MATERIALS, INC.
Inventor： Sankesha Bhoyar , Mahesh Arcot , Nilesh Chimanrao Bagul , Hemantha Raju , Ravindra Patil
CPC classification number: B08B3/12 , B08B3/00 , B08B3/14 , C02F1/001 , C02F1/42 , C02F2103/346 , C02F2209/40 , C02F2301/046 , G01N15/0618 , G01N15/1436 , G01N15/1459 , G01N2015/0053 , G01N2015/0693 , G01N2015/1486
Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.
-
公开(公告)号：US20180078975A1
公开(公告)日：2018-03-22
申请号：US15269324
申请日：2016-09-19
Applicant: APPLIED MATERIALS, INC.
Inventor： Sankesha Bhoyar , Mahesh Arcot , Nilesh Chimanrao Bagul , Hemantha Raju , Ravindra Patil
CPC classification number: B08B3/12 , B08B3/00 , B08B3/14 , C02F1/001 , C02F1/42 , C02F2103/346 , C02F2209/40 , C02F2301/046 , G01N15/0618 , G01N15/1436 , G01N15/1459 , G01N2015/0053 , G01N2015/0693 , G01N2015/1486
Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.
-
公开(公告)号：US11192153B2
公开(公告)日：2021-12-07
申请号：US16049355
申请日：2018-07-30
Applicant: APPLIED MATERIALS, INC.
Inventor： Sankesha Bhoyar , Mahesh Arcot , Nilesh Chimanrao Bagul , Hemantha Raju , Ravindra Patil
IPC: B08B3/12 , B08B3/00 , C02F1/00 , G01N15/14 , B08B3/14 , C02F1/42 , G01N15/06 , G01N15/00 , C02F103/34
Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.
-
公开(公告)号：US20180339314A1
公开(公告)日：2018-11-29
申请号：US16049355
申请日：2018-07-30
Applicant: APPLIED MATERIALS, INC.
Inventor： Sankesha Bhoyar , Mahesh Arcot , Nilesh Chimanrao Bagul , Hemantha Raju , Ravindra Patil
Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.
-
-
-
-
-
-
Search Results
7
records
(took 0.012 seconds)
