公开(公告)号：US20170137937A1

公开(公告)日：2017-05-18

申请号：US15286234

申请日：2016-10-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Ranga Rao Arnepalli ,  Nilesh Chimanrao Bagul ,  Prerna Sonthalia Goradia ,  Robert Jan Visser

IPC: C23C16/448 ,  H01L21/02 ,  H01L21/311 ,  C23F1/08

CPC classification number: C23C16/4486 ,  H01L21/02107 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/30621 ,  H01L21/31116 ,  H01L21/32 ,  H01L21/465

Abstract: Systems and methods for processing films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a condensed matter (liquid or solid) of one or more precursors. A carrier gas is flowed through the condensed matter and push the droplets toward a substrate placed in a substrate processing region. An inline pump connected with the aerosol generator can also be used to push the droplets towards the substrate. A direct current (DC) electric field is applied between two conducting plates configured to pass the droplets in-between. The size of the droplets is desirably reduced by application of the DC electric field. After passing through the DC electric field, the droplets pass into the substrate processing region and chemically react with the substrate to deposit or etch films.

公开(公告)号：US12134822B2

公开(公告)日：2024-11-05

申请号：US17529463

申请日：2021-11-18

Applicant: Applied Materials, Inc.

Inventor： Tapash Chakraborty ,  Nitin Deepak ,  Prerna Sonthalia Goradia ,  Bahubali S. Upadhye ,  Nilesh Chimanrao Bagul ,  Subramanya P. Herle ,  Visweswaren Sivaramakrishnan

IPC: C23C16/44

Abstract: Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

公开(公告)号：US11180849B2

公开(公告)日：2021-11-23

申请号：US16546170

申请日：2019-08-20

Applicant: Applied Materials, Inc.

Inventor： Subramanya P. Herle ,  Vicente M. Lim ,  Basavaraj Pattanshetty ,  Ajay More ,  Marco Mohr ,  Bjoern Sticksel-Weis ,  Nilesh Chimanrao Bagul ,  Visweswaren Sivaramakrishnan

IPC: C23C16/455 ,  C23C16/448 ,  C23C14/24 ,  C23C16/50 ,  C23C14/08

Abstract: An apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The apparatus includes a vaporizer assembly having an injection valve for receiving a liquid reactant, vaporizing the liquid reactant, and delivering the vaporized liquid reactant. The injection valve includes a valve body encompassing an interior region therein, a gas inlet port, a liquid inlet port, and a vapor outlet port all in fluid communication with the interior region. The vaporizer assembly further includes a first inlet line having a first end fluidly coupled with the liquid inlet port and a second end to be connected to a liquid source. The vaporizer assembly further includes a second inlet line with a first end fluidly coupled with the gas inlet port, a second end fluidly coupled with a carrier gas source, and a heater positioned between the first end and the second end.

公开(公告)号：US10273577B2

公开(公告)日：2019-04-30

申请号：US15286234

申请日：2016-10-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Ranga Rao Arnepalli ,  Nilesh Chimanrao Bagul ,  Prerna Sonthalia Goradia ,  Robert Jan Visser

IPC: B44C1/22 ,  C23C16/448 ,  H01L21/02 ,  H01L21/311

Abstract: Systems and methods for processing films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a condensed matter (liquid or solid) of one or more precursors. A carrier gas is flowed through the condensed matter and push the droplets toward a substrate placed in a substrate processing region. An inline pump connected with the aerosol generator can also be used to push the droplets towards the substrate. A direct current (DC) electric field is applied between two conducting plates configured to pass the droplets in-between. The size of the droplets is desirably reduced by application of the DC electric field. After passing through the DC electric field, the droplets pass into the substrate processing region and chemically react with the substrate to deposit or etch films.

公开(公告)号：US20170140920A1

公开(公告)日：2017-05-18

申请号：US15045081

申请日：2016-02-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Ranga Rao Arnepalli ,  Nilesh Chimanrao Bagul ,  Prerna Sonthalia Goradia ,  Robert Jan Visser

IPC: H01L21/02 ,  C23C16/448 ,  H01L21/3065

CPC classification number: H01L21/0262 ,  C23C16/045 ,  C23C16/4486 ,  C23C16/45525 ,  H01L21/02107 ,  H01L21/0228 ,  H01L21/02521 ,  H01L21/30621 ,  H01L21/32 ,  H01L21/465

Abstract: Systems and methods for processing films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a condensed matter (liquid or solid) of one or more precursors. A carrier gas is flowed through the condensed matter and push the droplets toward a substrate placed in a substrate processing region. An inline pump connected with the aerosol generator can also be used to push the droplets towards the substrate. A direct current (DC) electric field is applied between two conducting plates configured to pass the droplets in-between. The size of the droplets is desirably reduced by application of the DC electric field. After passing through the DC electric field, the droplets pass into the substrate processing region and chemically react with the substrate to deposit or etch films.

公开(公告)号：US20220281168A1

公开(公告)日：2022-09-08

申请号：US17751536

申请日：2022-05-23

Applicant: Applied Materials, Inc.

Inventor： Dakshalkumar Patel ,  Girish Kumar Chaturvedi ,  Bahubali S. Upadhye ,  Sumedh Acharya ,  Mahendran Chidambaram ,  Nilesh Chimanrao Bagul

IPC: B29C64/20 ,  B29C64/35 ,  B29C64/371

Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife assembly.
The air knife assembly includes an inlet unit to deliver gas over the platform and an exhaust unit to receive gas from over the platform. The exhaust unit includes a plenum having a port connected to a gas return conduit, and a gas collector that is open at a front end to receive gas from over the platform and has a concave plate at a back end of the gas collector. An aperture is formed at a back of the concave plate between the gas collector and the plenum to provide a constricted flow path for gas from the collector to the plenum.

公开(公告)号：US11192153B2

公开(公告)日：2021-12-07

申请号：US16049355

申请日：2018-07-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Sankesha Bhoyar ,  Mahesh Arcot ,  Nilesh Chimanrao Bagul ,  Hemantha Raju ,  Ravindra Patil

IPC: B08B3/12 ,  B08B3/00 ,  C02F1/00 ,  G01N15/14 ,  B08B3/14 ,  C02F1/42 ,  G01N15/06 ,  G01N15/00 ,  C02F103/34

Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.

公开(公告)号：US10163629B2

公开(公告)日：2018-12-25

申请号：US15045081

申请日：2016-02-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Ranga Rao Arnepalli ,  Nilesh Chimanrao Bagul ,  Prerna Sonthalia Goradia ,  Robert Jan Visser

IPC: H01L21/02 ,  C23C16/448 ,  H01L21/3065 ,  C23C16/04 ,  C23C16/455 ,  H01L21/306 ,  H01L21/32 ,  H01L21/465

Abstract: Systems and methods for processing films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a condensed matter (liquid or solid) of one or more precursors. A carrier gas is flowed through the condensed matter and push the droplets toward a substrate placed in a substrate processing region. An inline pump connected with the aerosol generator can also be used to push the droplets towards the substrate. A direct current (DC) electric field is applied between two conducting plates configured to pass the droplets in-between. The size of the droplets is desirably reduced by application of the DC electric field. After passing through the DC electric field, the droplets pass into the substrate processing region and chemically react with the substrate to deposit or etch films.

公开(公告)号：US20180339314A1

公开(公告)日：2018-11-29

申请号：US16049355

申请日：2018-07-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Sankesha Bhoyar ,  Mahesh Arcot ,  Nilesh Chimanrao Bagul ,  Hemantha Raju ,  Ravindra Patil

IPC: B08B3/12 ,  B08B3/14 ,  C02F1/00 ,  C02F1/42 ,  G01N15/06 ,  G01N15/14 ,  B08B3/00 ,  C02F103/34

Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.

公开(公告)号：US20220396732A1

公开(公告)日：2022-12-15

申请号：US17836578

申请日：2022-06-09

Applicant: Applied Materials, Inc.

Inventor： Nitin Deepak ,  Tapash Chakraborty ,  Prerna Sonthalia Goradia ,  Visweswaren Sivaramakrishnan ,  Nilesh Chimanrao Bagul ,  Bahubali S. Upadhye

IPC: C09K13/00

Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a β-diketone to form a volatile alkali metal β-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.