公开(公告)号：US20240258137A1

公开(公告)日：2024-08-01

申请号：US18632509

申请日：2024-04-11

Applicant: Applied Materials, Inc.

Inventor： Nir Merry ,  Schubert S. Chu ,  Sushant S. Koshti ,  Michael C. Kuchar ,  Nyi Oo Myo ,  Songjae Lee

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67196 ,  H01L21/67167 ,  H01L21/68707 ,  H01L21/67207

Abstract: A substrate processing system includes a factory interface, a transfer chamber of heptagonal shape and including four first facets and three second facets, each having a width that is narrower than that of each of the four first facets. A processing chamber is attached to one of the four first facets. A first auxiliary chamber attached to a first of the three second facets and is smaller than the first processing chamber. A load lock is attached to a second of the three second facets and to the factory interface. A second auxiliary chamber is attached to a third of the three second facets. The load lock is attached to the transfer chamber between the first and second auxiliary chambers. A robot is attached to a bottom of the transfer chamber and adapted to transfer substrates to/from the first processing chamber, the first auxiliary chamber, and the load lock.

公开(公告)号：US11996307B2

公开(公告)日：2024-05-28

申请号：US17317566

申请日：2021-05-11

Applicant: Applied Materials, Inc.

Inventor： Nir Merry ,  Schubert S. Chu ,  Sushant S. Koshti ,  Michael C. Kuchar ,  Nyi Oo Myo ,  Songjae Lee

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67196 ,  H01L21/67167 ,  H01L21/68707 ,  H01L21/67207

Abstract: A substrate processing system includes a factory interface having a controlled environment and a transfer chamber. The transfer chamber includes four first facets and three second facets, where each of the three second facets has a width that is narrower than that of each of the four first facets. A first processing chamber is attached to one of the four first facets. A first auxiliary chamber is attached to a first of the three second facets, where the first auxiliary chamber is smaller than the first processing chamber. A load lock is attached to a second of the three second facets and to the factory interface. A robot is attached to a bottom of the transfer chamber, the robot adapted to transfer substrates to and from the first processing chamber, the first auxiliary chamber, and the load lock.

公开(公告)号：US20220375751A1

公开(公告)日：2022-11-24

申请号：US17463966

申请日：2021-09-01

Applicant: Applied Materials, Inc.

Inventor： Yi-Chiau HUANG ,  Songjae Lee ,  Manoj Vellaikal ,  Chen-Ying Wu ,  Eric Davey ,  Saurabh Chopra

IPC: H01L21/02 ,  C30B25/18 ,  C23C16/02 ,  C23C16/54

Abstract: Embodiments of the present disclosure generally relate to an integrated substrate processing system for cleaning a substrate surface and subsequently performing an epitaxial deposition process thereon. A processing system includes a film formation chamber, a transfer chamber coupled to the film formation chamber, and an oxide removal chamber coupled to the transfer chamber, the oxide removal chamber having a substrate support. The processing system includes a controller configured to introduce a process gas mixture into the oxide removal chamber, the process gas mixture including a fluorine-containing gas and a vapor including at least one of water, an alcohol, an organic acid, or combinations thereof. The controller is configured to expose a substrate positioned on the substrate support to the process gas mixture, thereby removing an oxide film from the substrate.

公开(公告)号：US20220199436A1

公开(公告)日：2022-06-23

申请号：US17317566

申请日：2021-05-11

Applicant: Applied Materials, Inc.

Inventor： Nir Merry ,  Schubert S. Chu ,  Sushant S. Koshti ,  Michael C. Kuchar ,  Nyi Oo Myo ,  Songjae Lee

IPC: H01L21/67 ,  H01L21/687

Abstract: A substrate processing system includes a factory interface having a controlled environment and a transfer chamber. The transfer chamber includes four first facets and three second facets, where each of the three second facets has a width that is narrower than that of each of the four first facets. A first processing chamber is attached to one of the four first facets. A first auxiliary chamber is attached to a first of the three second facets, where the first auxiliary chamber is smaller than the first processing chamber. A load lock is attached to a second of the three second facets and to the factory interface. A robot is attached to a bottom of the transfer chamber, the robot adapted to transfer substrates to and from the first processing chamber, the first auxiliary chamber, and the load lock.