摘要:
A constant velocity universal joint is provided, having a hollow outer joint member, an inner joint member, an outer roller including a cylindrical surface, an inner roller including a concave sphere, and plural leg shafts each including a convex sphere formed in a tip portion and engaging with the concave sphere, where the cylindrical surface of the outer roller satisfies the following: W1>PCR(1−cos θ)/2+μ3R3+μ2R1 W2>3PCR(1−cos θ)/2−μ3R3+μ2R1, where W1 indicates a length of the cylindrical surface from a center of the leg shaft and an intersection of the cylindrical surface and an upper side taper portion of the outer roller, W2 indicates a length of the cylindrical surface from the center of the leg shaft and an intersection of the cylindrical surface and a lower side taper portion of the outer roller, and θ indicates a maximum joint angle.
摘要:
In a constant velocity universal joint including a double roller type roller unit, a cylindrical surface is formed in a radially outer surface of the outer roller; a flat engagement surface which is engaged with the cylindrical surface is formed in each of the guide grooves of the outer joint member; and the cylindrical surface satisfies following two equations, W1>PCR (1−cos θ)/2+μ3R3+μ2R1, W2>3PCR (1−cos θ)/2−μ3R3+μ2R1wherein W1, W2: a length from a center of the cylindrical surface to each of axially both end portions; PCR: a distance from an axis of the inner joint member to a center of the convex sphere of each of the leg shafts; θ: a required maximum joint angle; R1, R3: radii of the cylindrical surface and the concave sphere, respectively; and μ2, μ3: friction coefficients between the inner roller and the outer roller, and between the convex sphere and the concave sphere, respectively.
摘要翻译:在包括双辊型辊单元的等速万向接头中,在外辊的径向外表面上形成圆柱面; 在外接头构件的每个引导槽中形成有与圆筒形表面接合的平坦接合表面; 并且圆柱形表面满足以下两个等式:W 1> PCR(1-cosθ)/ 2 + mu 3 R 3 + mu 2 R 1,W 2> 3PCR (1-cosθ)/ 2-mu 3 R 3 +μ2 R 1其中W 1,W 2:从圆柱形表面的中心到每个的长度 轴向两端部; PCR:从内接头构件的轴线到每个腿轴的凸球的中心的距离; θ:所需的最大关节角度; R 1,R 3分别为圆柱面和凹球的半径; 和内部辊子和外部辊子之间以及凸形球体和凹形球体之间的摩擦系数分别为μ2,3/3。
摘要:
A constant velocity universal joint is provided, having a hollow outer joint member, an inner joint member, an outer roller including a cylindrical surface, an inner roller including a concave sphere, and plural leg shafts each including a convex sphere formed in a tip portion and engaging with the concave sphere, where the cylindrical surface of the outer roller satisfies the following: W1>PCR(1−cos θ)/2+μ3R3+μ2R1 W2>3PCR(1−cos θ)/2−μ3R3+μ2R1, where W1 indicates a length of the cylindrical surface from a center of the leg shaft and an intersection of the cylindrical surface and an upper side taper portion of the outer roller, W2 indicates a length of the cylindrical surface from the center of the leg shaft and an intersection of the cylindrical surface and a lower side taper portion of the outer roller, and θ indicates a maximum joint angle.
摘要:
A constant velocity universal joint is provided, having a hollow outer joint member, an inner joint member, an outer roller including a cylindrical surface, an inner roller including a concave sphere, and plural leg shafts each including a convex sphere formed in a tip portion and engaging with the concave sphere, where the cylindrical surface of the outer roller satisfies the following: W1>PCR (1−cos θ)/2+μ3R3+μ2R1 W2>3PCR (1−cos θ)/2−μ3R3+μ2R1, where W1 indicates a length of the cylindrical surface from a center of the leg shaft and an intersection of the cylindrical surface and an upper side taper portion of the outer roller, W2 indicates a length of the cylindrical surface from the center of the leg shaft and an intersection of the cylindrical surface and a lower side taper portion of the outer roller, and θ indicates a maximum joint angle.
摘要:
A housing is provided with a partition wall portion that partitions an inner space of the housing into an electric motor accommodating space and a speed reducer accommodating space. The partition wall portion fixes a gear that constitutes a speed reducer. In addition, the partition wall portion has a housing boss portion, and an inner stator is fixed to the housing boss portion. Thus, heat generated by the inner stator is dissipated to the outside through the housing boss portion and the partition wall portion.
摘要:
A charged particle beam lithography system includes: a charged particle beam source which generates a charged particle beam and irradiates a substrate therewith; an aperture in which has been formed a pattern of a shape corresponding to an arbitrary pattern to be drawn; an illuminator which adjusts the diameter of the charged particle beam and illuminates the aperture with the charged particle beam; a first deflector which deflects the charged particle beam by an electrical field to cause the charged particle beam to be incident on an arbitrary pattern, allowing the charged particle beam to pass through the aperture and be reflected back along the optical axis; a first demagnification optical projection system which demagnifies the aperture image of the charged particle beam which has passed through the aperture with the use of an electrical field or electromagnetic field; a second demagnification optical projection system which demagnifies the aperture image of the charged particle beam which has been demagnified by the first demagnification projection optical system, with the use of an electrical field or electromagnetic field to form an image on the substrate; and a beam diameter adjuster which adjusts the illuminator in such a manner that the beam diameter at crossovers of the charged particle beam, formed between the aperture and the first demagnification optical projection system and within the second demagnification optical projection system, is greater than the size of the pattern.
摘要:
A charged particle beam exposure method for shaping a charged particle beam by using an aperture mask having character apertures corresponding to the character shapes extracted from a semiconductor device pattern, the method comprises arranging the character apertures in the aperture mask, each of the character apertures having a shape corresponding to character shapes extracted from a standard cell pattern used for designing a semiconductor device, and varying the shape of the charged particle beam according to the outer shape of each of the character apertures, thereby applying the shaped charged particle beam to the character apertures.
摘要:
An assembly part for constituting a unit in a vacuum column is provided with wirings and wiring terminals. Each wiring is provided on a first insulating film, and is covered with a second insulating film made of an electro-deposited polyimide film. The assembly part is used to constitute a semiconductor manufacturing system such as an electron beam exposure system.
摘要:
To achieve down-sizing and improvements of throughputs, light exposure and charge beam exposure are sometimes used together. In case of performing exposure of a desired pattern in a plurality of stages, a positional displacement of each of exposure patterns in the stages leads to a decrease in exposure accuracy. According to the present invention, in case of forming a fine pattern by exposure after exposure of a rough pattern, the exposure position of the rough pattern is adjusted, based on a latent image of the rough pattern which has been subjected to exposure. As a result, a positional displacement between rough and fine patterns is reduced so that a desired pattern can be formed with high accuracy.
摘要:
A microangle drive circuit for a stepping motor and the system therefor comprising output elements pairs of which are connected to one another in series, a sense resistance connected to the output elements in series to make a motor coil control circuit for a phase or coil, a stepping motor control circuit made for n-phases, and motor coils. These circuit and system increase accuracy in rotation and stop by dividing the rotation angles of the stepping motor into microangles.