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    1,3-Oxathiolane-2-thione compounds
    3.
    发明申请
    1,3-Oxathiolane-2-thione compounds 失效
    1,3-氧硫杂环戊烷-2-硫酮化合物

    公开(公告)号：US20060293280A1

    公开(公告)日：2006-12-28

    申请号：US11354390

    申请日：2006-02-15

    申请人： Kazuya Uenishi ,  Atsushi Sudo ,  Hiroshi Morikawa ,  Takeshi Endo ,  Olaf Lammerschop ,  Thomas Huver ,  Pavel Gentschev

    发明人： Kazuya Uenishi ,  Atsushi Sudo ,  Hiroshi Morikawa ,  Takeshi Endo ,  Olaf Lammerschop ,  Thomas Huver ,  Pavel Gentschev

    IPC分类号： A61K31/695 ,  C07F7/02

    CPC分类号： C08G77/28 ,  C07F7/1804 ,  C08G75/28

    摘要： The present invention relates to 1,3-oxathiolane-2-thione compounds of the general formula (I): wherein R1 and R2 are the same or different, each of which denotes a straight-chain or branched alkoxy residue with 1 to 6 carbon atoms or an aryloxy or aralkyloxy residue, R3 is different or the same as R1 or R2 or an aliphatic residue, an amino residue, a halogen residue, an aromatic or heteroaromatic residue, or an araliphatic or heteroaraliphatic residue, R4 is a bridging group selected from the groups consisting of aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic and heteroaromatic groups and R5 is hydrogen, an aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic, heteroaromatic, cycloaliphatic or heterocycloaliphatic group or R4 and R5 form a cycloaliphatic, cycloheteroaliphatic, aromatic or heteroaromatic residue, which is optionally substituted with an aliphatic, heteroaliphatic residue serving as a bridging group to the silicon atom and X and Y are different and selected from oxygen and sulfur and mixtures of such compounds.

    摘要翻译： 本发明涉及通式（I）的1,3-氧硫杂环戊烷-2-硫酮化合物：其中R 1和R 2各自相同或不同，各自相同或不同， 表示具有1至6个碳原子的直链或支链烷氧基残基或芳氧基或芳烷氧基残基，R 3不同于或不同于R 1或R 2 脂族残基，氨基残基，卤素残基，芳香族或杂芳族残基或芳脂族或杂脂族残基，R 4是选自以下的桥连基团： 由脂族，杂脂族，芳脂族，杂脂肪族，芳族和杂芳族基团组成的基团，R 5是氢，脂族，杂脂族，芳脂族，杂脂族，芳族，杂芳族，脂环族或杂脂族基团或R 4和R 5形成脂环族，杂脂族，芳族或杂芳族残基，其任选被 n个作为与硅原子的桥连基团的脂族，杂脂族残基，X和Y不同，选自氧和硫以及这些化合物的混合物。

    1,3-oxathiolane-2-thione compounds
    4.
    发明授权
    1,3-oxathiolane-2-thione compounds 失效
    1,3-氧硫杂环戊烷-2-硫酮化合物

    公开(公告)号：US07432381B2

    公开(公告)日：2008-10-07

    申请号：US11354390

    申请日：2006-02-15

    申请人： Kazuya Uenishi ,  Atsushi Sudo ,  Hiroshi Morikawa ,  Takeshi Endo ,  Olaf Lammerschop ,  Thomas Huver ,  Pavel Gentschev

    发明人： Kazuya Uenishi ,  Atsushi Sudo ,  Hiroshi Morikawa ,  Takeshi Endo ,  Olaf Lammerschop ,  Thomas Huver ,  Pavel Gentschev

    IPC分类号： C07D327/04

    CPC分类号： C08G77/28 ,  C07F7/1804 ,  C08G75/28

    摘要： The present invention relates to 1,3-oxathiolane-2-thione compounds of the general formula (I): wherein R1 and R2 are the same or different, each of which denotes a straight-chain or branched alkoxy residue with 1 to 6 carbon atoms or an aryloxy or aralkyloxy residue, R3 is different or the same as R1 or R2 or an aliphatic residue, an amino residue, a halogen residue, an aromatic or heteroaromatic residue, or an araliphatic or heteroaraliphatic residue, R4 is a bridging group selected from the groups consisting of aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic and heteroaromatic groups and R5 is hydrogen, an aliphatic, heteroaliphatic, araliphatic, heteroaraliphatic, aromatic, heteroaromatic, cycloaliphatic or heterocycloaliphatic group or R4 and R5 form a cycloaliphatic, cycloheteroaliphatic, aromatic or heteroaromatic residue, which is optionally substituted with an aliphatic, heteroaliphatic residue serving as a bridging group to the silicon atom and X and Y are different and selected from oxygen and sulfur and mixtures of such compounds.

    摘要翻译： 本发明涉及通式（I）的1,3-氧硫杂环戊烷-2-硫酮化合物：其中R 1和R 2各自相同或不同，各自相同或不同， 表示具有1至6个碳原子的直链或支链烷氧基残基或芳氧基或芳烷氧基残基，R 3不同于或不同于R 1或R 2 脂族残基，氨基残基，卤素残基，芳香族或杂芳族残基或芳脂族或杂脂族残基，R 4是选自以下的桥连基团： 由脂族，杂脂族，芳脂族，杂脂肪族，芳族和杂芳族基团组成的基团，R 5是氢，脂族，杂脂族，芳脂族，杂脂族，芳族，杂芳族，脂环族或杂脂族基团或R 4和R 5形成脂环族，杂脂族，芳族或杂芳族残基，其任选被 n个作为与硅原子的桥连基团的脂族，杂脂族残基，X和Y不同，选自氧和硫以及这些化合物的混合物。

    Positive resist composition
    6.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US06489080B2

    公开(公告)日：2002-12-03

    申请号：US09449899

    申请日：1999-12-02

    申请人： Kazuya Uenishi ,  Toru Fujimori ,  Kunihiko Kodama ,  Koji Shirakawa ,  Shiro Tan

    发明人： Kazuya Uenishi ,  Toru Fujimori ,  Kunihiko Kodama ,  Koji Shirakawa ,  Shiro Tan

    IPC分类号： G03F7027

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/115

    摘要： The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.

    摘要翻译： 本发明提供一种正电子束或X射线抗蚀剂组合物，其含有（a）通过辐射照射产生酸的化合物和（b）具有阳离子可聚合官能团的化合物。 正电子束或X射线抗蚀剂组成灵敏度高，分辨率高，可提供优异的矩形图案，PCD稳定性和PED稳定性优异。

    Positive photosensitive composition
    7.
    发明授权
    Positive photosensitive composition 有权
    正光敏组合物

    公开(公告)号：US06200729B1

    公开(公告)日：2001-03-13

    申请号：US09422344

    申请日：1999-10-21

    申请人： Toshiaki Aoai ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Tsukasa Yamanaka

    发明人： Toshiaki Aoai ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Tsukasa Yamanaka

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

    摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises (1) a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and (2) a compound represented by formula (I), (II) or (III) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: wherein R1 to R5 and R7 to R10 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by —S—R6, where R6 represents an alkyl group or an aryl group; X− represents the anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid as deifined in the specification; and m, n, p and q each represents an integer of 1 to 3.

    摘要翻译： 提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。 正型感光性组合物包含（1）具有能够通过酸分解的基团的树脂，以提高树脂在碱性显影液中的溶解度，（2）由式（I）表示的化合物，（II ）或（III），其能够在用光化射线或辐射照射时产生磺酸：其中R 1至R 5和R 7至R 10各自表示氢原子，烷基，环烷基，烷氧基，羟基 基团，卤素原子或-S-R6表示的基团，其中R6表示烷基或芳基; X-表示说明书中所述的苯磺酸，萘磺酸或蒽磺酸的阴离子; m，n，p和q各自表示1〜3的整数。

    Photosensitive resin composition for far-ultraviolet exposure
    8.
    发明授权
    Photosensitive resin composition for far-ultraviolet exposure 失效
    用于远紫外线曝光的感光树脂组合物

    公开(公告)号：US6150068A

    公开(公告)日：2000-11-21

    申请号：US911165

    申请日：1997-08-14

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Toshiaki Aoai

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  H01L21/027 ,  B03F7/004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/121

    摘要： A photosensitive resin composition for far-ultraviolet exposure of from 170 to 220 nm, which comprises an N-hydroxymaleinimide-type sulfonate photo acid generator having a specific structure and a resin having a substituent capable of increasing the solubility to an alkali developer by an acid, and a pattern forming method using the photosensitive resin composition. The photosensitive resin composition has a high transparency to light having a wavelength of from 170 to 220 nm and is excellent in the photocomposition property and the acid generating efficiency.

    摘要翻译： 一种用于远紫外线暴露于170至220nm的感光树脂组合物，其包含具有特定结构的N-羟基马来酰亚胺型磺酸盐光致酸产生剂和具有能够通过酸增加对碱性显影剂的溶解度的取代基的树脂 ，以及使用感光性树脂组合物的图案形成方法。 感光性树脂组合物对波长为170〜220nm的光具有高透明性，并且光致变色性和酸产生效率优异。

    Positive photosensitive composition
    9.
    发明授权
    Positive photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US6010820A

    公开(公告)日：2000-01-04

    申请号：US814826

    申请日：1997-03-11

    申请人： Toshiaki Aoai ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Tsukasa Yamanaka

    发明人： Toshiaki Aoai ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Tsukasa Yamanaka

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03C1/73

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

    摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises (1) a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and (2) a compound represented by formula (I), (II) or (III) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: ##STR1## wherein R.sub.1 to R.sub.5 and R.sub.7 to R.sub.10 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by --S--R.sub.6, where R.sub.6 represents an alkyl group or an aryl group; X.sup.- represents the anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid as defined in the specification; and m, n, p and q each represents an integer of 1 to 3.

    摘要翻译： 提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。 正型感光性组合物包含（1）具有能够通过酸分解的基团的树脂，以提高树脂在碱性显影液中的溶解度，（2）由式（I）表示的化合物，（II ）或（III），其能够在用光化射线或辐射照射时产生磺酸：其中R 1至R 5和R 7至R 10各自表示氢原子，烷基，环烷基，烷氧基，羟基 基团，卤素原子或-S-R6表示的基团，其中R6表示烷基或芳基; X-表示说明书中定义的苯磺酸，萘磺酸或蒽磺酸的阴离子; m，n，p和q各自表示1〜3的整数。

    Positive image forming composition
    10.
    发明授权
    Positive image forming composition 失效
    正成像组合物

    公开(公告)号：US5731123A

    公开(公告)日：1998-03-24

    申请号：US791901

    申请日：1997-01-31

    申请人： Koichi Kawamura ,  Kazuya Uenishi

    发明人： Koichi Kawamura ,  Kazuya Uenishi

    IPC分类号： C07C311/48 ,  G03F7/004 ,  G03F7/039 ,  G03F7/021

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/127

    摘要： Provided is a positive image forming composition which comprises (a) a compound generating an acid when exposed to light or heat and (b) a sulfonimide compound represented by the following formula (I): L.sub.1 --(SO.sub.2 --NR.sub.2 --SO.sub.2 --R.sub.1).sub.n (I) wherein n is an integer from 1 to 6; R.sub.1 is an aromatic group or an alkyl group; L.sub.1 is an aromatic group or an alkyl group in the case of n=1, while it is a polyvalent organic linkage group in the case of n=2-6; and R.sub.2 is an alkoxymethyl group, an arylmethyl group, or an alicyclic alkyl group; or a polymer containing in side chains constitutional units represented by the following formula (I'): --L--SO.sub.2 --NR.sup.2 --SO.sub.2 --R.sup.1 (I') wherein R.sup.1 has the same meaning as R.sub.1 in formula (I); L is a polyvalent organic group for connecting the constitutional unit of formula (I') to the polymer skeleton; and R.sup.2 has the same meaning as R.sub.2 in formula (I).

    摘要翻译： 提供了一种正成像组合物，其包含（a）当暴露于光或热时产生酸的化合物和（b）由下式（I）表示的磺酰亚胺化合物：L1-（SO2-NR2-SO2-R1） n（I）其中n为1至6的整数; R1是芳基或烷基; 在n = 1的情况下，L 1为芳基或烷基，n = 2-6的情况下为多价有机连接基; R2是烷氧基甲基，芳基甲基或脂环族烷基; 或含有下式（I'）表示的侧链结构单元的聚合物：-L-SO 2 -NR 2 -SO 2 -R 1（I'）其中R 1与式（I）中的R 1相同; L是用于将式（I'）的结构单元与聚合物骨架连接的多价有机基团; R2与式（I）中的R 2具有相同的含义。