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公开(公告)号：US20080257723A1
公开(公告)日：2008-10-23
申请号：US11577305
申请日：2005-10-14
申请人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Ichiro Shiota , Takahisa Yamamoto
发明人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Ichiro Shiota , Takahisa Yamamoto
IPC分类号： C23C14/34
CPC分类号： C23C14/228 , C23C14/22
摘要： A physical vapor deposition system for making microparticles generated by using a non-transfer type plasma torch not generating an outgas even in an ultra-high vacuum environment accelerate by a supersonic gas flow and depositing microparticles on a substrate to form a coating film is provided. Provision is made of an evaporation chamber (10, 20) having a plasma torch (16, 26) and an evaporation source (15, 25) inside it and a film formation chamber 30 having a supersonic nozzle 35 and a substrate for film formation 33. Each plasma torch has a substantially cylindrical electrically conductive anode 40, a polymer-based or non-polymer-based insulation pipe 50 inserted to the inner side of that and generating less outgas than a Bakelite, and a rod shaped cathode 60 inserted to the inner side of an insulation pipe 50. Microparticles are generated from an evaporation source (15, 25) by a plasma obtained by applying voltages to the anode 40 and the cathode 60, ejected from a supersonic nozzle 35, made to ride on a supersonic gas flow, and deposited by physical vapor deposition onto a substrate for film formation 33.
摘要翻译： 提供了一种用于制造通过使用非转移型等离子体焰炬而产生的微粒的物理气相沉积系统，即使在超高真空环境中也不产生逸出气体，并通过超音速气流加速并将微粒沉积在基底上以形成涂膜。 具有在其内部具有等离子体焰炬（16,26）和蒸发源（15,25）的蒸发室（10,20）和具有超音速喷嘴35和成膜基片33的成膜室30 。 每个等离子体焰炬具有基本上圆柱形的导电阳极40，插入其内侧的基于聚合物或非聚合物的绝缘管50，并产生比电木炭少的排气，以及插入内部的棒状阴极60 绝缘管50的一侧。 通过将电压施加到阳极40和阴极60获得的等离子体从蒸发源（15,25）产生微粒，其由超声波喷嘴35喷射，使其骑在超音速气流上，并通过物理气相沉积 到用于成膜的基材33上。
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2.发明授权公开(公告)号：US08889223B2
公开(公告)日：2014-11-18
申请号：US13056385
申请日：2008-07-28
申请人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Takahisa Yamamoto
发明人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Takahisa Yamamoto
CPC分类号： C23C14/228 , C23C14/02 , C23C14/0688 , C23C14/22 , C23C24/04
摘要： A physical vapor deposition apparatus and a physical vapor deposition method for forming a film of a substance which is hard to be made fine particles even when it is heated by plasma, arc discharge, or the like are provided. It has an evaporation chamber 10 provided inside it with an evaporation source material 15 and a heating part 16 for heating the evaporation source material 15, a powder supply source 20 provided inside it with a powder, and a film forming chamber 30, wherein the evaporation source material 15 is heated by the heating part 16 to produce fine particles (nanoparticles), the fine particles and powder are sprayed out of a supersonic nozzle 35, are placed on a supersonic gas stream, and are deposited on a substrate for film formation 33 by physical vapor deposition.
摘要翻译： 提供了用于形成即使通过等离子体，电弧放电等加热也难以制成微粒的物质的膜的物理气相沉积装置和物理气相沉积方法。 在其内部设置有蒸发源材料15和用于加热蒸发源材料15的加热部分16，在其内部设置有粉末的粉末供应源20和成膜室30，其中蒸发源 源材料15被加热部分16加热以产生细颗粒（纳米颗粒），将细颗粒和粉末从超音速喷嘴35喷出，放置在超音速气流上，并沉积在用于成膜的基板33上 通过物理气相沉积。
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3.发明申请公开(公告)号：US20110189390A1
公开(公告)日：2011-08-04
申请号：US13056385
申请日：2008-07-28
申请人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Takahisa Yamamoto
发明人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Takahisa Yamamoto
IPC分类号： B05D1/12
CPC分类号： C23C14/228 , C23C14/02 , C23C14/0688 , C23C14/22 , C23C24/04
摘要： A physical vapor deposition apparatus and a physical vapor deposition method for forming a film of a substance which is hard to be made fine particles even when it is heated by plasma, arc discharge, or the like are provided. It has an evaporation chamber 10 provided inside it with an evaporation source material 15 and a heating part 16 for heating the evaporation source material 15, a powder supply source 20 provided inside it with a powder, and a film forming chamber 30, wherein the evaporation source material 15 is heated by the heating part 16 to produce fine particles (nanoparticles), the fine particles and powder are sprayed out of a supersonic nozzle 35, are placed on a supersonic gas stream, and are deposited on a substrate for film formation 33 by physical vapor deposition.
摘要翻译： 提供了用于形成即使通过等离子体，电弧放电等加热也难以制成微粒的物质的膜的物理气相沉积装置和物理气相沉积方法。 在其内部设置有蒸发源材料15和用于加热蒸发源材料15的加热部分16，在其内部设置有粉末的粉末供应源20和成膜室30，其中蒸发源 源材料15被加热部分16加热以产生细颗粒（纳米颗粒），将细颗粒和粉末从超音速喷嘴35喷出，放置在超音速气流上，并沉积在用于成膜的基板33上 通过物理气相沉积。
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公开(公告)号：US08136480B2
公开(公告)日：2012-03-20
申请号：US11577305
申请日：2005-10-14
申请人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Ichiro Shiota , Takahisa Yamamoto
发明人： Atsushi Yumoto , Naotake Niwa , Fujio Hiroki , Ichiro Shiota , Takahisa Yamamoto
CPC分类号： C23C14/228 , C23C14/22
摘要： A physical vapor deposition system for making microparticles generated by using a non-transfer type plasma torch not generating an outgas even in an ultra-high vacuum environment accelerate by a supersonic gas flow and depositing microparticles on a substrate to form a coating film is provided. Provision is made of an evaporation chamber (10, 20) having a plasma torch (16, 26) and an evaporation source (15, 25) inside it and a film formation chamber 30 having a supersonic nozzle 35 and a substrate for film formation 33. Each plasma torch has a substantially cylindrical electrically conductive anode 40, a polymer-based or non-polymer-based insulation pipe 50 inserted to the inner side of that and generating less outgas than a phenol resin, and a rod shaped cathode 60 inserted to the inner side of an insulation pipe 50. Microparticles are generated from an evaporation source (15, 25) by a plasma obtained by applying voltages to the anode 40 and the cathode 60, ejected from a supersonic nozzle 35, made to ride on a supersonic gas flow, and deposited by physical vapor deposition onto a substrate for film formation 33.
摘要翻译： 提供了一种用于制造通过使用非转移型等离子体焰炬而产生的微粒的物理气相沉积系统，即使在超高真空环境中也不产生逸出气体，并通过超音速气流加速并将微粒沉积在基底上以形成涂膜。 具有在其内部具有等离子体焰炬（16,26）和蒸发源（15,25）的蒸发室（10,20）和具有超音速喷嘴35和成膜基片33的成膜室30 每个等离子体焰炬具有基本上圆柱形的导电阳极40，插入其内侧的基于聚合物或非聚合物的绝缘管50，并且产生比酚醛树脂少的排气，以及插入到 绝缘管50的内侧。通过对从阳极40和阴极60施加电压而获得的等离子体从蒸发源（15,25）产生微粒，从超音速喷嘴35喷射，制成骑在超音速 气流，并通过物理气相沉积沉积到用于成膜的基底上33。
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公开(公告)号：US09014483B2
公开(公告)日：2015-04-21
申请号：US12873159
申请日：2010-08-31
申请人： Yoshinori Ito , Takahisa Yamamoto , Masami Kato
发明人： Yoshinori Ito , Takahisa Yamamoto , Masami Kato
CPC分类号： G06K9/6257 , G06K9/00973 , G06K9/4614 , G06K9/4642
摘要： Input information of a multidimensional array is divided into a plurality of divided areas, accumulated information is generated by calculating accumulated values at respective element positions of the input information from a corresponding reference location for each of the plurality of divided areas, and the generated accumulated information is held in a memory for each divided area. Calculation using the accumulated information is executed for a predetermined processing range. The input information is divided into the plurality of divided areas so that two neighboring divided areas have an overlapping area, and the overlapping area has a size at least in which the whole processing range fits.
摘要翻译： 多维阵列的输入信息被划分为多个分割区域，通过从多个分割区域中的每一个的相应参考位置计算输入信息的各个元素位置处的累积值来生成累积信息，并且生成累积信息 被保存在每个划分区域的存储器中。 在预定的处理范围内执行使用累积信息的计算。 输入信息被分成多个分割区域，使得两个相邻分割区域具有重叠区域，并且重叠区域具有至少整个处理范围适合的尺寸。
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公开(公告)号：US08594432B2
公开(公告)日：2013-11-26
申请号：US12966725
申请日：2010-12-13
申请人： Takahisa Yamamoto , Masami Kato , Yoshinori Ito
发明人： Takahisa Yamamoto , Masami Kato , Yoshinori Ito
CPC分类号： G06K9/4604 , G06K2009/4666
摘要： An image processing apparatus includes a comparison unit that selects a pixel of interest in a processing image, and compare magnitudes of luminance value of the pixel of interest and luminance value of each of a plurality of neighboring pixels having a predetermined positional relationship with the pixel of interest; a calculation unit that calculates a feature amount of the pixel of interest based on the predetermined positional relationship between the pixel of interest and each of the plurality of neighboring pixels and a comparison result obtained by the comparison unit. For two neighboring pixels at positions which are point symmetrical with respect to the pixel of interest, the comparison unit sets that only one of the two neighboring pixels has the predetermined positional relationship.
摘要翻译： 一种图像处理装置，包括：比较单元，其选择处理图像中的感兴趣像素，并将感兴趣像素的亮度值的大小与具有预定位置关系的多个相邻像素的亮度值与 利益; 计算单元，其基于所述关注像素和所述多个相邻像素中的每一个之间的预定位置关系以及由所述比较单元获得的比较结果来计算所述感兴趣像素的特征量。 对于相对于感兴趣像素点对称的位置处的两个相邻像素，比较单元设置两个相邻像素中只有一个具有预定的位置关系。
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公开(公告)号：US07937346B2
公开(公告)日：2011-05-03
申请号：US12663687
申请日：2008-06-11
申请人： Masami Kato , Takahisa Yamamoto , Yoshinori Ito
发明人： Masami Kato , Takahisa Yamamoto , Yoshinori Ito
IPC分类号： G06N3/04
CPC分类号： G06N3/08
摘要： A calculation processing apparatus for executing network calculations defined by hierarchically connecting a plurality of logical processing nodes that apply calculation processing to input data, sequentially designates a processing node which is to execute calculation processing based on sequence information that specifies an execution order of calculations of predetermined processing units to be executed by the plurality of processing nodes, so as to implement the network calculations, and executes the calculation processing of the designated processing node in the processing unit to obtain a calculation result. The calculation apparatus allocates partial areas of a memory to the plurality of processing nodes as ring buffers, and writes the calculation result in the memory while circulating a write destination of data to have a memory area corresponding to the amount of the calculation result of the processing unit as a unit.
摘要翻译： 一种用于执行网络计算的计算处理装置，所述计算处理装置执行通过将应用计算处理的多个逻辑处理节点分层连接到输入数据而定义的网络计算，依次指定执行计算处理的处理节点，该处理节点是基于指定预定的 要由多个处理节点执行的处理单元，以便实现网络计算，并且执行处理单元中的指定处理节点的计算处理以获得计算结果。 计算装置将多个处理节点的存储器的部分区域分配为环形缓冲器，并将计算结果写入存储器，同时循环数据的写入目的地以具有对应于处理的计算结果的量的存储区域 单位为单位。
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公开(公告)号：US20100223219A1
公开(公告)日：2010-09-02
申请号：US12663687
申请日：2008-06-11
申请人： Masami Kato , Takahisa Yamamoto , Yoshinori Ito
发明人： Masami Kato , Takahisa Yamamoto , Yoshinori Ito
CPC分类号： G06N3/08
摘要： A calculation processing apparatus for executing network calculations defined by hierarchically connecting a plurality of logical processing nodes that apply calculation processing to input data, sequentially designates a processing node which is to execute calculation processing based on sequence information that specifies an execution order of calculations of predetermined processing units to be executed by the plurality of processing nodes, so as to implement the network calculations, and executes the calculation processing of the designated processing node in the processing unit to obtain a calculation result. The calculation apparatus allocates partial areas of a memory to the plurality of processing nodes as ring buffers, and writes the calculation result in the memory while circulating a write destination of data to have a memory area corresponding to the amount of the calculation result of the processing unit as a unit.
摘要翻译： 一种用于执行网络计算的计算处理装置，所述计算处理装置执行通过将应用计算处理的多个逻辑处理节点分层连接到输入数据而定义的网络计算，依次指定执行计算处理的处理节点，该处理节点是基于指定预定的 要由多个处理节点执行的处理单元，以便实现网络计算，并且执行处理单元中的指定处理节点的计算处理以获得计算结果。 计算装置将多个处理节点的存储器的部分区域分配为环形缓冲器，并将计算结果写入存储器，同时循环数据的写入目的地以具有对应于处理的计算结果的量的存储区域 单位为单位。
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公开(公告)号：US20100215253A1
公开(公告)日：2010-08-26
申请号：US12602628
申请日：2008-06-11
申请人： Takahisa Yamamoto , Masami Kato , Yoshinori Ito
发明人： Takahisa Yamamoto , Masami Kato , Yoshinori Ito
IPC分类号： G06K9/62
CPC分类号： G06N3/08
摘要： A calculation processing apparatus, which executes calculation processing based on a network composed by hierarchically connecting a plurality of processing nodes, assigns a partial area of a memory to each of the plurality of processing nodes, stores a calculation result of a processing node in a storable area of the partial area assigned to that processing node, and sets, as storable areas, areas that store the calculation results whose reference by all processing nodes connected to the subsequent stage of that processing node is complete. The apparatus determines, based on the storage states of calculation results in partial areas of the memory assigned to the processing node designated to execute the calculation processing of the processing nodes, and to processing nodes connected to the previous stage of the designated processing node, whether or not to execute a calculation of the designated processing node.
摘要翻译： 执行基于通过分层连接多个处理节点组成的网络的计算处理的计算处理装置，将多个处理节点中的每个处理节点的存储器的部分区域分配，将处理节点的计算结果存储在可存储 分配给该处理节点的部分区域的区域，并且存储存储连接到该处理节点的后续阶段的所有处理节点的参考的计算结果的存储区域。 该装置基于分配给指定用于执行处理节点的计算处理的处理节点的存储器的部分区域中的计算结果的存储状态以及连接到指定处理节点的前一级的处理节点，确定是否 或者不执行指定的处理节点的计算。
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10.发明授权公开(公告)号：US07647805B2
公开(公告)日：2010-01-19
申请号：US10574609
申请日：2004-11-05
申请人： Takahisa Yamamoto
发明人： Takahisa Yamamoto
IPC分类号： B21D5/02
CPC分类号： B21D5/02 , B21D5/0209
摘要： A precision metal sheet bend angle adjustment device is provided, which includes a lifter plate, a wedge plate, a support plate and a positioning frame. The lifter plate has a tapered bottom face. The wedge plate has a tapered top face and side recesses. The support plate has a top guiding grove and the positioning frame includes a rotary dial and adjustment screw. The support plate is fixed on the positioning frame. The wedge plate is located on top of the assembly such that it is able to slide within the guiding grove of the support plate. The adjustment screw of the rotary dial is inserted into the side recess of the wedge plate. The lifter plate rests on top of the wedge plate within the positioning frame such that, as the wedge plate slides back and forth, the lifter plate moves up and down within the positioning frame by rotating the rotary dial clockwise or counter clockwise. The die of the metal sheet bending equipment can be moved vertically while sitting atop the lifter plate.
摘要翻译： 提供了一种精密金属板弯曲角度调节装置，其包括升降板，楔形板，支撑板和定位框架。 升降板具有锥形底面。 楔形板具有锥形顶面和侧凹。 支撑板具有顶部引导槽，并且定位框架包括旋转拨盘和调节螺钉。 支撑板固定在定位架上。 楔形板位于组件的顶部，使得其能够在支撑板的引导槽内滑动。 旋转拨盘的调节螺钉插入楔形板的侧凹槽中。 升降板位于定位框架内的楔形板的顶部，使得当楔块前后滑动时，升降板通过顺时针或逆时针旋转旋转拨盘在定位框架内上下移动。 当坐在升降板顶部时，金属板弯曲设备的模具可以垂直移动。
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