Abstract:
A wafer alignment device comprises a support platform supported by three flexible rods extending downwardly to a linking ring. Three flexible rods extend upwardly from the linking ring to a stationary table. The support platform can be moved in x, y and theta directions, to align the wafer with great accuracy and without accompanying z-direction motion, for photolithographic printing purposes.
Abstract:
A table is reciprocated along a straight line by a force that does not precisely control movement direction. Accurate motion constraint is provided by two separated air bearings arranged along a common axis. A third air bearing, displaced from the common axis, supports the table on a sleeve that is free to rotate on its axis.