Abstract:
A wafer alignment device comprises a support platform supported by three flexible rods extending downwardly to a linking ring. Three flexible rods extend upwardly from the linking ring to a stationary table. The support platform can be moved in x, y and theta directions, to align the wafer with great accuracy and without accompanying z-direction motion, for photolithographic printing purposes.
Abstract:
A table is reciprocated along a straight line by a force that does not precisely control movement direction. Accurate motion constraint is provided by two separated air bearings arranged along a common axis. A third air bearing, displaced from the common axis, supports the table on a sleeve that is free to rotate on its axis.
Abstract:
Integrated circuit mask patterns are laser machined by mounting substrates on a support that is periodically stepped in a y direction after each scan by a laser writing beam in an x direction. X-direction scanning is accomplished by mounting a mirror on a carriage that reciprocates by rebounding between two displaced coil springs. A coding laser beam is reflected from the carriage through a stationary code plate, comprising alternate transparent and opaque stripes, to monitor the position of the carriage and to control the modulation of the writing beam.