Wafer alignment apparatus
    1.
    发明授权
    Wafer alignment apparatus 失效
    晶圆对准装置

    公开(公告)号:US3870416A

    公开(公告)日:1975-03-11

    申请号:US43208274

    申请日:1974-01-09

    CPC classification number: G03F7/70716 B23Q1/36 H05K13/0015

    Abstract: A wafer alignment device comprises a support platform supported by three flexible rods extending downwardly to a linking ring. Three flexible rods extend upwardly from the linking ring to a stationary table. The support platform can be moved in x, y and theta directions, to align the wafer with great accuracy and without accompanying z-direction motion, for photolithographic printing purposes.

    Abstract translation: 晶片对准装置包括由向下延伸到连接环的三个柔性杆支撑的支撑平台。 三个柔性杆从连接环向上延伸到固定台。 支撑平台可以在x,y和θ方向上移动,以便以高精度对准晶片,并且不伴随z方向运动,用于光刻打印目的。

    Apparatus for reducing rotation components in table translation
    2.
    发明授权
    Apparatus for reducing rotation components in table translation 失效
    用于减小表格转换中旋转分量的装置

    公开(公告)号:US3927939A

    公开(公告)日:1975-12-23

    申请号:US42903773

    申请日:1973-12-27

    CPC classification number: G03F7/70716

    Abstract: A table is reciprocated along a straight line by a force that does not precisely control movement direction. Accurate motion constraint is provided by two separated air bearings arranged along a common axis. A third air bearing, displaced from the common axis, supports the table on a sleeve that is free to rotate on its axis.

    Abstract translation: 通过不精确地控制运动方向的力沿着直线往复运动的台子。 精确的运动约束由沿公共轴线布置的两个分离的空气轴承提供。 从公共轴线移位的第三个空气轴承将桌子支撑在可自由旋转的轴套上。

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