公开(公告)号：US20180016469A1

公开(公告)日：2018-01-18

申请号：US15649378

申请日：2017-07-13

Applicant: Cabot Microelectronics Corporation

Inventor： Steven KRAFT ,  Phillip W. CARTER ,  Andrew R. WOLFF

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/321 ,  H01L21/768

CPC classification number: C09G1/02 ,  C09K3/14 ,  C09K3/1463 ,  H01L21/3212 ,  H01L21/7684

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive, (b) a cobalt accelerator, and (c) an oxidizing agent that oxidizes a metal, wherein the polishing composition has a pH of about 4 to about 10. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.