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1.发明申请公开(公告)号：US20110239278A1
公开(公告)日：2011-09-29
申请号：US13154386
申请日：2011-06-06
Applicant: Brandon A. Downey , Amit J. Patel , Chris Yu
Inventor： Brandon A. Downey , Amit J. Patel , Chris Yu
CPC classification number: H04L63/105 , G06F21/34 , G06F21/40 , G06F21/42 , G06F21/43 , H04L63/083
Abstract: A computer-implemented system and method for verifying access to a network account are provided. A first user communication portal is associated with a user network account. A request to access the user network account is received from a second user communication portal. Security criteria related to the second user communication portal is determined. Access to the user network account is enabled upon receipt of a communication associated with the first user communication portal when the security criteria is of a predetermined value.
Abstract translation: 提供了用于验证对网络帐户的访问的计算机实现的系统和方法。 第一用户通信门户与用户网络帐户相关联。 从第二用户通信门户接收到访问用户网络帐户的请求。 确定与第二用户通信门户相关的安全标准。 当安全标准是预定值时，在接收到与第一用户通信门户相关联的通信时，启用对用户网络帐户的访问。
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公开(公告)号：US07575376B2
公开(公告)日：2009-08-18
申请号：US10907132
申请日：2005-03-22
Applicant: Chris Yu
Inventor： Chris Yu
CPC classification number: A45C7/0077
Abstract: An apparatus is capable of collapsing into a smaller configuration is disclosed. The apparatus comprises a first sidewall and a second sidewall interconnected by a bottom wall, a front wall, a rear wall, and a top wall to form a collapsible bag. A first zipper track is disposed into the bottom wall connecting between a portion of the bottom wall and a first position. A second zipper track is disposed into the bottom wall opposite to the first zipper track. The second zipper track is located between the portion of the bottom wall and a second position. A zipper slider is provided for connecting together the first zipper track and the second zipper track for coupling of the first zipper track and the second zipper track along the contour of the collapsible bag.
Abstract translation: 一种能够折叠成较小结构的装置被公开。 该装置包括通过底壁，前壁，后壁和顶壁互连的第一侧壁和第二侧壁，以形成可折叠袋。 第一拉链轨道设置在连接在底壁的一部分和第一位置之间的底壁中。 第二拉链轨道设置在与第一拉链轨道相对的底壁中。 第二拉链轨迹位于底壁的一部分和第二位置之间。 提供拉链滑块，用于将第一拉链轨道和第二拉链轨道连接在一起，用于沿着可折叠袋的轮廓联接第一拉链轨道和第二拉链轨道。
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公开(公告)号：US20070026656A1
公开(公告)日：2007-02-01
申请号：US11190392
申请日：2005-07-26
Applicant: Chris Yu , Hongxiu Peng
Inventor： Chris Yu , Hongxiu Peng
IPC: H01L21/44
CPC classification number: H01L21/76895 , H01L21/31053 , H01L21/3212 , H01L21/76819 , H01L21/7684 , H01L22/26
Abstract: A method for fabricating an integrated circuit device, e.g., DRAM. The method includes providing a semiconductor substrate, e.g., silicon wafer. The method includes forming a plurality of MOS transistor devices overlying the semiconductor substrate. Each of the MOS transistor devices has a nitride cap and nitride sidewall spacers. Each of the transistors is separated from each other by a predetermined width. The method includes forming an interlayer dielectric layer overlying the plurality of MOS transistor devices and removing a portion of the interlayer dielectric material to expose at least portions of three MOS transistor devices and expose at least three regions between respective MOS transistor devices. The method deposits polysilicon fill material overlying the exposed three regions and overlying the three MOS transistor devices. Next, the method performs a chemical mechanical planarization process on the polysilicon material to reduce a thickness of the polysilicon material to expose a portion of the interlayer dielectric material. The method continues the chemical mechanical planarization process to remove the interlayer dielectric material and the polysilicon film material until the cap nitride layer on each of the MOS transistors has been exposed. The method uses the cap nitride layer overlying each of the MOS transistors as a polish stop layer.
Abstract translation: 一种用于制造例如DRAM的集成电路器件的方法。 该方法包括提供半导体衬底，例如硅晶片。 该方法包括形成覆盖半导体衬底的多个MOS晶体管器件。 每个MOS晶体管器件具有氮化物盖和氮化物侧壁间隔物。 每个晶体管彼此分开预定的宽度。 该方法包括形成覆盖多个MOS晶体管器件的层间电介质层，并去除部分层间电介质材料，以露出三个MOS晶体管器件的至少一部分，并暴露各个MOS晶体管器件之间的至少三个区域。 该方法沉积覆盖暴露的三个区域并覆盖三个MOS晶体管器件的多晶硅填充材料。 接下来，该方法对多晶硅材料进行化学机械平坦化处理以减小多晶硅材料的厚度以暴露部分层间电介质材料。 该方法继续进行化学机械平面化处理以去除层间电介质材料和多晶硅膜材料，直到每个MOS晶体管上的帽状氮化物层已经暴露。 该方法使用覆盖每个MOS晶体管的覆盖氮化物层作为抛光停止层。
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4.发明授权Verifying access to a network account over multiple user communication portals based on security criteria 有权根据安全标准验证通过多个用户通信门户对网络帐户的访问公开(公告)号：US08087068B1
公开(公告)日：2011-12-27
申请号：US11074007
申请日：2005-03-08
Applicant: Brandon A. Downey , Amit J. Patel , Chris Yu
Inventor： Brandon A. Downey , Amit J. Patel , Chris Yu
CPC classification number: H04L63/105 , G06F21/34 , G06F21/40 , G06F21/42 , G06F21/43 , H04L63/083
Abstract: A computer-implemented system and method for verifying access to a network account are provided. A first user communication portal is associated with a user network account. A request to access the user network account is received from a second user communication portal. Security criteria related to the second user communication portal is determined. Access to the user network account is enabled upon receipt of a communication associated with the first user communication portal when the security criteria is of a predetermined value.
Abstract translation: 提供了用于验证对网络帐户的访问的计算机实现的系统和方法。 第一用户通信门户与用户网络帐户相关联。 从第二用户通信门户接收到访问用户网络帐户的请求。 确定与第二用户通信门户相关的安全标准。 当安全标准是预定值时，在接收到与第一用户通信门户相关联的通信时，启用对用户网络帐户的访问。
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公开(公告)号：US20070026634A1
公开(公告)日：2007-02-01
申请号：US11388359
申请日：2006-03-23
Applicant: Chris Yu
Inventor： Chris Yu
IPC: H01L21/76
CPC classification number: G02F1/133553 , G02F1/136277
Abstract: A method for manufacturing an LCOS device. The method includes providing a substrate (e.g., silicon wafer) having a surface region. The method includes forming an interlayer dielectric layer overlying the surface region of the substrate. The method patterns the interlayer dielectric layer to form a plurality of recessed regions. Each of the recessed regions corresponds to a pixel element for a LCOS device. Each of the recessed regions is isolated by a portion of dielectric material defining a border for each of the recessed regions. Each of the border regions forming a peripheral region surrounding each recessed region. The method deposits an aluminum material or aluminum alloy material within each of the recessed regions to fill each of the recessed regions and to cover exposed portions of the border regions. The method forms a photomask overlying the aluminum material and patterns the photomask to expose regions corresponding to the recessed regions and protects regions corresponding to the border regions. The method removes exposed regions of the aluminum material while protecting the regions corresponding to the border regions with the photomask. The method continues the removing until the aluminum material has been removed to a vicinity of an upper region of the border regions. Next, the method strips the patterned photomask to expose protruding aluminum material, which surrounds the patterned aluminum material. The method touch-up polishes the protruding aluminum material and portions of the patterned aluminum material while using the border regions as a polish stop to planarize an upper surface region formed by the border regions and the patterned aluminum material.
Abstract translation: 一种用于制造LCOS装置的方法。 该方法包括提供具有表面区域的衬底（例如，硅晶片）。 所述方法包括形成覆盖在所述基板的表面区域上的层间电介质层。 该方法使层间绝缘层形成多个凹陷区域。 每个凹陷区域对应于用于LCOS器件的像素元件。 每个凹陷区域由限定每个凹陷区域的边界的电介质材料的一部分隔离。 每个边界区域形成围绕每个凹进区域的周边区域。 该方法在每个凹陷区域内沉积铝材料或铝合金材料，以填充每个凹陷区域并覆盖边界区域的暴露部分。 该方法形成覆盖在铝材料上的光掩模，并且对光掩模进行图案化以暴露对应于凹陷区域的区域并保护对应于边界区域的区域。 该方法除去铝材料的暴露区域，同时用光掩模保护对应于边界区域的区域。 该方法继续去除，直到铝材料已经被移除到边界区域的上部区域附近。 接下来，该方法剥去图案化的光掩模以露出包围图案化铝材料的突出的铝材料。 该方法的上光抛光凸出的铝材料和图案化的铝材料的部分，同时使用边界区域作为抛光停止来平坦化由边界区域形成的上表面区域和图案化的铝材料。
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Patent Agency Ranking
公开(公告)号：US20060215938A1
公开(公告)日：2006-09-28
申请号：US10907132
申请日：2005-03-22
Applicant: Chris Yu
Inventor： Chris Yu
CPC classification number: A45C7/0077
Abstract: An apparatus is capable of collapsing into a smaller configuration is disclosed. The apparatus comprises a first sidewall and a second sidewall interconnected by a bottom wall, a front wall, a rear wall, and a top wall to form a collapsible bag. A first zipper track is disposed into the bottom wall connecting between a portion of the bottom wall and a first position. A second zipper track is disposed into the bottom wall opposite to the first zipper track. The second zipper track is located between the portion of the bottom wall and a second position. A zipper slider is provided for connecting together the first zipper track and the second zipper track for coupling of the first zipper track and the second zipper track along the contour of the collapsible bag.
Abstract translation: 一种能够折叠成较小结构的装置被公开。 该装置包括通过底壁，前壁，后壁和顶壁互连的第一侧壁和第二侧壁，以形成可折叠袋。 第一拉链轨道设置在连接在底壁的一部分和第一位置之间的底壁中。 第二拉链轨道设置在与第一拉链轨道相对的底壁中。 第二拉链轨迹位于底壁的一部分和第二位置之间。 提供拉链滑块，用于将第一拉链轨道和第二拉链轨道连接在一起，用于沿着可折叠袋的轮廓联接第一拉链轨道和第二拉链轨道。
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公开(公告)号：US20060084271A1
公开(公告)日：2006-04-20
申请号：US10970547
申请日：2004-10-20
IPC: H01L21/461 , B44C1/22 , C23F1/00
CPC classification number: H01L21/31053 , C09G1/02 , C23F3/04 , H01L21/3212 , H01L23/53242 , H01L2924/0002 , H01L2924/00
Abstract: Process, slurries formulation and polishing mechanism are disclosed for the formation of silver (Ag) or Ag alloy film features on a substrate using CMP. The process and slurries can achieve Ag or Ag alloy film features with good planarization, low roughness, high reflectivity, and low defectivity.
Abstract translation: 公开了用于使用CMP在衬底上形成银（Ag）或Ag合金膜特征的工艺，浆料配方和抛光机理。 该工艺和浆料可以实现Ag或Ag合金膜的特征，具有良好的平面化，低粗糙度，高反射率和低缺陷性。
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公开(公告)号：US20070044300A1
公开(公告)日：2007-03-01
申请号：US11395956
申请日：2006-03-30
Applicant: Chris Yu , Yung Chi Yang
Inventor： Chris Yu , Yung Chi Yang
IPC: B23P19/00
CPC classification number: G06F1/1656 , G06F1/1613 , Y10T29/53174
Abstract: A fixing structure for fixing a casing and a base frame of an electronic device together includes: a melt hole disposed in the base frame and a melt post formed on the casing, wherein the melt hole is provided with an opening having its diameter being gradually enlarged from inside outward, so that when combining the casing with the base frame, the melt post passes through the melt hole and is exposed by the opening. Through the design of the opening, the fixing effect upon melting can be strengthened without occupying a lot of space around the melt hole.
Abstract translation: 用于将电子设备的壳体和基座固定在一起的固定结构包括：设置在基座框架中的熔体孔和形成在壳体上的熔体柱，其中熔体孔设置有其直径逐渐扩大的开口 从内向外，使得当将壳体与基架组合时，熔体柱穿过熔体孔并被开口暴露。 通过开口的设计，可以加强熔融时的固定效果，而不会在熔体孔周围占用大量空间。
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公开(公告)号：US07077445B2
公开(公告)日：2006-07-18
申请号：US10315768
申请日：2002-12-10
Applicant: Chris Yu
Inventor： Chris Yu
IPC: B66C1/36
CPC classification number: F16B45/02 , Y10T24/45335 , Y10T24/45408
Abstract: A dual lever locking hook comprises a hook member having a mounting portion and a catching portion, first and second locking levers, and a connecting member rotatably coupled to the hook member. The locking levers are affixed to the hook member at the mounting portion and latch onto the hook member at the catching portion. The arrangement of the locking levers at the mounting portion provides a biasing condition which prevents a breach of the locking hook.
Abstract translation: 双杠杆锁定钩包括具有安装部分和捕获部分的钩构件，第一和第二锁定杆以及可旋转地联接到钩构件的连接构件。 锁定杆在安装部分处固定到钩构件并且在捕获部分处锁定到钩构件上。 在安装部分处的锁定杆的布置提供了防止锁定钩的突破的偏压状态。
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公开(公告)号：US20060118760A1
公开(公告)日：2006-06-08
申请号：US11004326
申请日：2004-12-03
CPC classification number: C09K13/04 , C09G1/02 , C09K3/1454 , C23F3/02 , C23F3/04 , H01L21/3212
Abstract: A chemical-mechanical planarization (CMP) slurry comprising at least one abrasive particles at least one oxidizer, and at least one carrier. The abrasive particles can be selected from: a particle with all soft material, a particle having a soft outer material and a hard inner material, an inner charged particle, a magnetized particle, and an empty core particle. The substrate to be polished can be Aluminum, Copper, Ti, TiN, Ag. W, or their alloys, Oxide, Ni—P, Si3N4 for example.
Abstract translation: 包括至少一种磨料颗粒至少一种氧化剂和至少一种载体的化学机械平面化（CMP）浆料。 研磨颗粒可以选自：具有所有软质材料的颗粒，具有柔软的外部材料的颗粒和硬的内部材料，内部带电颗粒，磁化颗粒和空芯颗粒。 待抛光的基材可以是铝，铜，钛，钛，银。 W或其合金，例如氧化物，Ni-P，Si 3 N 4 N 4。
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