公开(公告)号：US20230323248A1

公开(公告)日：2023-10-12

申请号：US18124355

申请日：2023-03-21

Applicant: ENTEGRIS, INC.

Inventor： Volley Wang ,  Atanu K. Das ,  Michael L. White ,  Chun-I Lee ,  Nilesh Gunda ,  Daniela White ,  Donald Frye

IPC: C11D3/30 ,  C11D3/43 ,  C11D17/00 ,  C11D1/66 ,  C11D3/00 ,  C11D3/24 ,  C11D11/00

CPC classification number: C11D3/0042 ,  C11D1/66 ,  C11D3/245 ,  C11D3/30 ,  C11D3/43 ,  C11D11/0047 ,  C11D17/0008

Abstract: The invention provides compositions useful in post-CMP cleaning operations where ceria is present. In one aspect, the invention provides a composition comprising a reducing agent; a chelating agent; an amino(C6-C12 alkyl)alcohol; and water; wherein the composition has a pH of less than about 8. The compositions of the invention were found to show improved ceria removal on, for example, poly silicon (poly Si) substrates. Also provided is a method for cleaning a microelectronic device substrate using such compositions and a kit comprising, in one or more containers, selected components of the compositions.