公开(公告)号：US12260583B2

公开(公告)日：2025-03-25

申请号：US17171781

申请日：2021-02-09

Applicant: FEI Company

Inventor： Mark Najarian ,  Victoriea Bird ,  Peter D. Carleson ,  Sean Morgan-Jones

IPC: G06T7/73 ,  G06T7/33 ,  G06T7/55 ,  G06T7/66 ,  G06T17/10 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28 ,  H10B41/27 ,  H10B43/27

Abstract: Systems for and methods for generating precise structure reconstruction using slice and view images, are disclosed. An example method comprises, obtaining a slice and view images of a sample that depicts a 3D fiducial and cross-sections of a structure in the sample. The 3D fiducial is configured such that when a layer of material having a uniform thickness is removed from a surface of the sample that includes the 3D fiducial the cross-sectional shape of the 3D fiducial in the new surface is consistent. Relative positions are determined between the 3D fiducial the cross-sections of the structure in individual images. Positional relationships are then determined between the cross-sections of the structure in different images in a common reference frame based on the relative positions.

公开(公告)号：US20150016677A1

公开(公告)日：2015-01-15

申请号：US14332193

申请日：2014-07-15

Applicant: FEI Company

Inventor： Richard J. Young ,  Chad Rue ,  Peter D. Carleson ,  Reinier Louis Warschauer

IPC: G06T7/00

CPC classification number: G06T7/0004 ,  G06T7/73 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3045 ,  H01J2237/31749 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. Preferred embodiments of the present invention can also be used to rapidly navigate to one single bit cell in a memory array or similar structure, for example to characterize or correct a defect in that individual bit cell. High-resolution scanning is used to scan only a “strip” of cells on the one edge of the array (along either the X axis and the Y axis) to locate a row containing the desired cell followed by a similar high-speed scan along the located row (in the remaining direction) until the desired cell location is reached. This allows pattern-recognition tools to be used to automatically “count” the cells necessary to navigate to the desired cell, without the large expenditure of time required to image the entire array.

Abstract translation: 一种用于半导体芯片制造领域的局部导航的高精度光束放置的改进方法。 本发明的优选实施例也可用于快速导航到存储器阵列或类似结构中的一个单个位单元，例如用于表征或校正该单独位单元中的缺陷。 高分辨率扫描仅用于扫描阵列一个边缘上的“条带”（沿着X轴和Y轴），以定位包含所需单元格的行，然后进行类似的高速扫描 定位的行（在剩余的方向），直到达到所需的单元格位置。 这允许使用模式识别工具来自动“计数”导航到所需单元格所需的单元格，而无需大量花费整个阵列成像所需的时间。

公开(公告)号：US11171048B2

公开(公告)日：2021-11-09

申请号：US16816695

申请日：2020-03-12

Applicant: FEI Company

Inventor： Sean O. Morgan-Jones ,  Sophia E. Weeks ,  Peter D. Carleson

IPC: H01L21/768 ,  H01L21/02 ,  G03F1/84

Abstract: Adaptive endpoint detection is applied to delayering of a multi-layer sample utilizing a combination of dynamic and predetermined parameters. Tuned predetermined parameters, varying between layers of the sample, allow automated operation across multiple sites of a device. A semiconductor logic device is described, having a zone of thick metal layers and a zone of thin metal layers. The described techniques can be integrated with analysis operations and can be applied across a wide range of device types and manufacturing processes.

公开(公告)号：US20210287938A1

公开(公告)日：2021-09-16

申请号：US16816695

申请日：2020-03-12

Applicant: FEI Company

Inventor： Sean O. Morgan-Jones ,  Sophia E. Weeks ,  Peter D. Carleson

IPC: H01L21/768 ,  G03F1/84 ,  H01L21/02

Abstract: Adaptive endpoint detection is applied to delayering of a multi-layer sample utilizing a combination of dynamic and predetermined parameters. Tuned predetermined parameters, varying between layers of the sample, allow automated operation across multiple sites of a device. A semiconductor logic device is described, having a zone of thick metal layers and a zone of thin metal layers. The described techniques can be integrated with analysis operations and can be applied across a wide range of device types and manufacturing processes.

公开(公告)号：US09087366B2

公开(公告)日：2015-07-21

申请号：US14332193

申请日：2014-07-15

Applicant: FEI Company

Inventor： Richard J. Young ,  Chad Rue ,  Peter D. Carleson ,  Reinier Louis Warschauer

IPC: G06K9/00 ,  G06T7/00 ,  H01J37/22 ,  H01J37/28 ,  H01J37/304 ,  H01L21/66

CPC classification number: G06T7/0004 ,  G06T7/73 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3045 ,  H01J2237/31749 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. Preferred embodiments of the present invention can also be used to rapidly navigate to one single bit cell in a memory array or similar structure, for example to characterize or correct a defect in that individual bit cell. High-resolution scanning is used to scan only a “strip” of cells on the one edge of the array (along either the X axis or the Y axis) to locate a row containing the desired cell followed by a similar high-speed scan along the located row (in the remaining direction) until the desired cell location is reached. This allows pattern-recognition tools to be used to automatically “count” the cells necessary to navigate to the desired cell, without the large expenditure of time required to image the entire array.

Abstract translation: 一种用于半导体芯片制造领域的局部导航的高精度光束放置的改进方法。 本发明的优选实施例也可用于快速导航到存储器阵列或类似结构中的一个单个位单元，例如用于表征或校正该单独位单元中的缺陷。 高分辨率扫描仅用于扫描阵列的一个边缘（沿着X轴或Y轴）的单元格的“条带”，以便定位包含所需单元格的行，然后进行类似的高速扫描 定位的行（在剩余的方向），直到达到所需的单元格位置。 这允许使用模式识别工具来自动“计数”导航到所需单元格所需的单元格，而无需大量花费整个阵列成像所需的时间。