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    HIGH ACCURACY BEAM PLACEMENT FOR LOCAL AREA NAVIGATION
    2.
    发明申请
    HIGH ACCURACY BEAM PLACEMENT FOR LOCAL AREA NAVIGATION 审中-公开
    用于当地区域导航的高精度光束放置

    公开(公告)号：US20150016677A1

    公开(公告)日：2015-01-15

    申请号：US14332193

    申请日：2014-07-15

    Applicant: FEI Company

    Inventor： Richard J. Young ,  Chad Rue ,  Peter D. Carleson ,  Reinier Louis Warschauer

    IPC: G06T7/00

    CPC classification number: G06T7/0004 ,  G06T7/73 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3045 ,  H01J2237/31749 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. Preferred embodiments of the present invention can also be used to rapidly navigate to one single bit cell in a memory array or similar structure, for example to characterize or correct a defect in that individual bit cell. High-resolution scanning is used to scan only a “strip” of cells on the one edge of the array (along either the X axis and the Y axis) to locate a row containing the desired cell followed by a similar high-speed scan along the located row (in the remaining direction) until the desired cell location is reached. This allows pattern-recognition tools to be used to automatically “count” the cells necessary to navigate to the desired cell, without the large expenditure of time required to image the entire array.

    Abstract translation: 一种用于半导体芯片制造领域的局部导航的高精度光束放置的改进方法。 本发明的优选实施例也可用于快速导航到存储器阵列或类似结构中的一个单个位单元，例如用于表征或校正该单独位单元中的缺陷。 高分辨率扫描仅用于扫描阵列一个边缘上的“条带”（沿着X轴和Y轴），以定位包含所需单元格的行，然后进行类似的高速扫描 定位的行（在剩余的方向），直到达到所需的单元格位置。 这允许使用模式识别工具来自动“计数”导航到所需单元格所需的单元格，而无需大量花费整个阵列成像所需的时间。

    TEM SAMPLE PREPARATION
    4.
    发明申请
    TEM SAMPLE PREPARATION 审中-公开
    TEM样品制备

    公开(公告)号：US20150325409A1

    公开(公告)日：2015-11-12

    申请号：US14692509

    申请日：2015-04-21

    Applicant: FEI Company

    Inventor： Richard J. Young

    IPC: H01J37/317 ,  H01J37/28 ,  H01J37/20

    CPC classification number: H01J37/317 ,  G01N1/32 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3023 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: A method and apparatus for altering the orientation of a charged particle beam sample is presented. Embodiments of the method includes providing a first work piece on a sample stage having a sample stage plane, the first work piece including a lamella plane in a first orientation. A sample is milled from the first work piece using an ion beam so that the sample is substantially free from the first work piece. A probe is attached to the sample, the probe including a shaft having a shaft axis, the shaft axis oriented at a shaft angle in relation to the sample stage plane, the shaft angle being non-normal to the sample stage plane. The probe is rotated about the shaft axis through a rotational angle so that the lamella plane is in a second orientation. The sample is attached to or placed on the sample on either the first work piece, the first work piece being the work piece from which the sample was milled, or on a second work piece, the second work piece being a work piece from which the sample was not milled. The sample is thinned using the ion beam to form a lamella, the lamella being oriented in the lamella plane.

    Abstract translation: 提出了一种用于改变带电粒子束样品取向的方法和装置。 该方法的实施例包括在具有样品台平面的样品台上设置第一工件，第一工件包括处于第一取向的薄片平面。 使用离子束从第一工件研磨样品，使得样品基本上不含第一工件。 探针附着在样品上，探头包括轴，其轴线相对于样品台平面以轴角取向，轴角与样品台平面不正交。 探头围绕轴线旋转旋转角度，使得薄片平面处于第二取向。 样品在第一工件上附接或放置在样品上，第一工件是样品被研磨的工件，或在第二工件上，第二工件是工件， 样品未研磨。 使用离子束使样品变薄以形成薄片，薄片在薄片平面中取向。

    Plan view sample preparation
    5.
    发明授权
    Plan view sample preparation 有权
    平面图样品准备

    公开(公告)号：US09040908B2

    公开(公告)日：2015-05-26

    申请号：US13930911

    申请日：2013-06-28

    Applicant: FEI Company

    Inventor： Richard J. Young

    IPC: G01N1/28 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317

    CPC classification number: H01J37/317 ,  G01N1/32 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3023 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: A method and apparatus for altering the orientation of a charged particle beam sample is presented. Embodiments of the method includes providing a first work piece on a sample stage having a sample stage plane, the first work piece including a lamella plane in a first orientation. A sample is milled from the first work piece using an ion beam so that the sample is substantially free from the first work piece. A probe is attached to the sample, the probe including a shaft having a shaft axis, the shaft axis oriented at a shaft angle in relation to the sample stage plane, the shaft angle being non-normal to the sample stage plane. The probe is rotated about the shaft axis through a rotational angle so that the lamella plane is in a second orientation. The sample is attached to or placed on the sample on either the first work piece, the first work piece being the work piece from which the sample was milled, or on a second work piece, the second work piece being a work piece from which the sample was not milled. The sample is thinned using the ion beam to form a lamella, the lamella being oriented in the lamella plane.

    Abstract translation: 提出了一种用于改变带电粒子束样品取向的方法和装置。 该方法的实施例包括在具有样品台平面的样品台上设置第一工件，第一工件包括处于第一取向的薄片平面。 使用离子束从第一工件研磨样品，使得样品基本上不含第一工件。 探针附着在样品上，探头包括轴，其轴线相对于样品台平面以轴角取向，轴角与样品台平面不正交。 探头围绕轴线旋转旋转角度，使得薄片平面处于第二取向。 样品在第一工件上附接或放置在样品上，第一工件是样品被研磨的工件，或在第二工件上，第二工件是工件， 样品未研磨。 使用离子束使样品变薄以形成薄片，薄片在薄片平面中取向。

    High accuracy beam placement for local area navigation
    6.
    发明授权
    High accuracy beam placement for local area navigation 有权
    用于局部导航的高精度光束放置

    公开(公告)号：US09087366B2

    公开(公告)日：2015-07-21

    申请号：US14332193

    申请日：2014-07-15

    Applicant: FEI Company

    Inventor： Richard J. Young ,  Chad Rue ,  Peter D. Carleson ,  Reinier Louis Warschauer

    IPC: G06K9/00 ,  G06T7/00 ,  H01J37/22 ,  H01J37/28 ,  H01J37/304 ,  H01L21/66

    CPC classification number: G06T7/0004 ,  G06T7/73 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3045 ,  H01J2237/31749 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. Preferred embodiments of the present invention can also be used to rapidly navigate to one single bit cell in a memory array or similar structure, for example to characterize or correct a defect in that individual bit cell. High-resolution scanning is used to scan only a “strip” of cells on the one edge of the array (along either the X axis or the Y axis) to locate a row containing the desired cell followed by a similar high-speed scan along the located row (in the remaining direction) until the desired cell location is reached. This allows pattern-recognition tools to be used to automatically “count” the cells necessary to navigate to the desired cell, without the large expenditure of time required to image the entire array.

    Abstract translation: 一种用于半导体芯片制造领域的局部导航的高精度光束放置的改进方法。 本发明的优选实施例也可用于快速导航到存储器阵列或类似结构中的一个单个位单元，例如用于表征或校正该单独位单元中的缺陷。 高分辨率扫描仅用于扫描阵列的一个边缘（沿着X轴或Y轴）的单元格的“条带”，以便定位包含所需单元格的行，然后进行类似的高速扫描 定位的行（在剩余的方向），直到达到所需的单元格位置。 这允许使用模式识别工具来自动“计数”导航到所需单元格所需的单元格，而无需大量花费整个阵列成像所需的时间。

    Plan View Sample Preparation
    7.
    发明申请
    Plan View Sample Preparation 有权
    平面图样品准备

    公开(公告)号：US20150001176A1

    公开(公告)日：2015-01-01

    申请号：US13930911

    申请日：2013-06-28

    Applicant: FEI Company

    Inventor： Richard J. Young

    IPC: H01J37/305 ,  H01J37/317

    CPC classification number: H01J37/317 ,  G01N1/32 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3023 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: A method and apparatus for altering the orientation of a charged particle beam sample is presented. Embodiments of the method includes providing a first work piece on a sample stage having a sample stage plane, the first work piece including a lamella plane in a first orientation. A sample is milled from the first work piece using an ion beam so that the sample is substantially free from the first work piece. A probe is attached to the sample, the probe including a shaft having a shaft axis, the shaft axis oriented at a shaft angle in relation to the sample stage plane, the shaft angle being non-normal to the sample stage plane. The probe is rotated about the shaft axis through a rotational angle so that the lamella plane is in a second orientation. The sample is attached to or placed on the sample on either the first work piece, the first work piece being the work piece from which the sample was milled, or on a second work piece, the second work piece being a work piece from which the sample was not milled. The sample is thinned using the ion beam to form a lamella, the lamella being oriented in the lamella plane.

    Abstract translation: 提出了一种用于改变带电粒子束样品取向的方法和装置。 该方法的实施例包括在具有样品台平面的样品台上设置第一工件，第一工件包括处于第一取向的薄片平面。 使用离子束从第一工件研磨样品，使得样品基本上不含第一工件。 探针附着在样品上，探头包括轴，其轴线相对于样品台平面以轴角取向，轴角与样品台平面不正交。 探头围绕轴线旋转旋转角度，使得薄片平面处于第二取向。 样品在第一工件上附接或放置在样品上，第一工件是样品被研磨的工件，或在第二工件上，第二工件是工件， 样品未研磨。 使用离子束使样品变薄以形成薄片，薄片在薄片平面中取向。

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