公开(公告)号：US09847213B2

公开(公告)日：2017-12-19

申请号：US14723703

申请日：2015-05-28

Applicant: GLOBALFOUNDRIES INC.

Inventor： Joseph K. Comeau ,  David R. Crawford ,  Robert E. Desrosiers ,  Tracy C. Hetrick ,  Mousa H. Ishaq

IPC: H01J37/32 ,  C23C16/50 ,  C23C16/455 ,  C23F1/00 ,  F04F9/00

CPC classification number: H01J37/32633 ,  C23C16/45536 ,  C23C16/45587 ,  C23C16/45589 ,  C23C16/50 ,  C23F1/00 ,  F04F9/00 ,  H01J37/32834 ,  H01J2237/18 ,  H01J2237/1825

Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.