公开(公告)号：US10311186B2

公开(公告)日：2019-06-04

申请号：US15096551

申请日：2016-04-12

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Jaime Bravo ,  Vikrant Chauhan ,  Piyush Pathak ,  Shobhit Malik ,  Uwe Paul Schroeder

IPC: G06F17/50

Abstract: Methodologies and a device for assessing integrated circuit and pattern for yield risk based on 3D simulation of semiconductor patterns are provided. Embodiments include generating, with a processor, a 3D simulation of semiconductor patterns; obtaining critical dimensions of distances between layers or within a layer of the 3D simulation of semiconductor patterns; comparing the set of critical dimensions with predefined minimum dimensions; and yield scoring each of the semiconductor patterns of the 3D simulation based on the comparing step.

公开(公告)号：US10095826B2

公开(公告)日：2018-10-09

申请号：US15184164

申请日：2016-06-16

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Shikha Somani ,  Sriram Madhavan ,  Thomas Herrmann ,  Stefan Schüler ,  Uwe Schroeder ,  Shobhit Malik ,  Eric Chiu

IPC: G06F17/50

Abstract: A method and apparatus for selecting Si wafer WP based on individual or multiple DFM decks for Si-feed-forward and Si-feed-back analysis are provided. Embodiments include generating markers for a wafer from an individual DFM deck; generating UCF Indexes; determining whether a representative marker corresponding to a UCF is a candidate for WP prediction; extracting markers corresponding to that UCF-Index (UEF data) from a candidate; performing a UCF-Index-based sampling on the extracted UEF data set if a number of markers in the extracted UEF data set is larger than an inspection requirement; adding a location of each marker or group of markers in the extracted UEF data set to a sitelist after the UCF-Index-based sampling; sending the sitelist to a foundry for metrology analysis on sitelist locations; and adding the sitelist locations and corresponding UCF Index and metrology parameters to a design analysis database for analyzing other wafers/UCF Indexes.