公开(公告)号：US20220082927A1

公开(公告)日：2022-03-17

申请号：US17397554

申请日：2021-08-09

Applicant: Gigaphoton Inc.

Inventor： Yusuke HOSHINO ,  Yukio WATANABE ,  Toshihiro NISHISAKA ,  Atsushi UEDA ,  Koichiro KOGE ,  Takayuki OSANAI ,  Gouta NIIMI

IPC: G03F1/24 ,  G21K1/06 ,  H05G2/00 ,  G03F7/20

Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.

公开(公告)号：US20250062587A1

公开(公告)日：2025-02-20

申请号：US18939232

申请日：2024-11-06

Applicant: Gigaphoton Inc.

Inventor： Takayuki OSANAI

IPC: H01S3/108 ,  G02F1/35 ,  G02F1/355 ,  G02F1/39 ,  H01S3/00 ,  H01S3/02 ,  H01S3/102

Abstract: A laser system includes a pump laser device outputting pump laser light having a first wavelength, a signal laser device outputting signal laser light having a second wavelength, and an amplification system including optical parametric crystals outputting amplification light. The optical parametric crystals include first and second optical parametric crystals. The amplification system is arranged such that beam waist positions of first amplification light and the pump laser light coincide with each other, and that the first amplification light and the pump laser light are coaxially incident on the second optical parametric crystal; and includes a first beam diameter adjustment optical system in which a ratio of a beam waist diameter of the pump laser light to that of the first amplification light is set larger than a ratio of a beam waist diameter of the pump laser light to that of the signal laser light.

公开(公告)号：US20210298160A1

公开(公告)日：2021-09-23

申请号：US17156186

申请日：2021-01-22

Applicant: Gigaphoton Inc.

Inventor： Takayuki OSANAI ,  Atsushi UEDA ,  Koichiro KOGE ,  Akihiro OHSAWA ,  Toshiya SHINTANI ,  Yoshiaki YOSHIDA ,  Yuki ISHIDA ,  Yosuke TAKADA

IPC: H05G2/00 ,  H01J37/32

Abstract: An extreme ultraviolet light generation apparatus may include a chamber device, a concentrating mirror, a central gas supply port configured to supply gas along a focal line passing through a first focal point and a second focal point from the center side of the reflection surface, and a first peripheral gas supply port disposed at a peripheral portion of the reflection surface and configured to supply gas in a direction from the outer side of the reflection surface toward the inner side of the reflection surface. The first peripheral gas supply port may supply gas, when viewed along the focal line, in an inclined direction inclined to a tangential direction side of the peripheral portion at the peripheral portion where the first peripheral gas supply port is located with respect to a first straight line passing through the first peripheral gas supply port and the focal line.

公开(公告)号：US20240291220A1

公开(公告)日：2024-08-29

申请号：US18658286

申请日：2024-05-08

Applicant: Gigaphoton Inc.

Inventor： Seiji NOGIWA ,  Takayuki OSANAI

IPC: H01S3/00 ,  G02B27/14 ,  G02F1/35 ,  G02F1/355 ,  G02F1/39 ,  G03F7/00 ,  G03F7/20 ,  H01S5/00

CPC classification number: H01S3/0092 ,  G02F1/3507 ,  G02F1/3534 ,  G02F1/3551 ,  G02F1/392 ,  G03F7/2002 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S5/0085 ,  G02B27/141 ,  G02F2203/11

Abstract: A laser system includes a first laser outputting first laser light, an optical intensity changer outputting first pulse laser light, a modulator widening spectral linewidth of the first laser light or the first pulse laser light, an optical fiber amplifier amplifying the first pulse laser light and outputting second pulse laser light, a second laser outputting second laser light, an optical parametric amplifier amplifying the second laser light and outputting third pulse laser light, a wavelength converter outputting fourth pulse laser light using the second and third pulse laser light, an amplification section amplifying the fourth pulse laser light and outputting fifth pulse laser light, and a processor controlling a modulation signal such that the fifth pulse laser light having target spectral linewidth is generated, and controlling the center wavelength of the second laser light such that the fifth pulse laser light having a target center wavelength is generated.

公开(公告)号：US20210307150A1

公开(公告)日：2021-09-30

申请号：US17160486

申请日：2021-01-28

Applicant: Gigaphoton Inc.

Inventor： Koichiro KOGE ,  Atsushi UEDA ,  Takayuki OSANAI

IPC: H05G2/00 ,  G03F7/20

Abstract: An extreme ultraviolet light generation apparatus includes a chamber device, a concentrating mirror, an exhaust port, and a central gas supply port. The exhaust port is formed at the chamber device and is formed on the side lateral to a focal line and opposite to the reflection surface with respect to the plasma generation region. The central gas supply port is formed on the side opposite to the exhaust port with respect to the plasma generation region on the supply line passing through the exhaust port, the plasma generation region, and an inner side of a peripheral portion of the reflection surface. The central gas supply port supplies the gas toward the exhaust port along the supply line through the plasma generation region.

公开(公告)号：US20220146943A1

公开(公告)日：2022-05-12

申请号：US17492280

申请日：2021-10-01

Applicant: Gigaphoton Inc.

Inventor： Koichiro KOGE ,  Atsushi UEDA ,  Takayuki OSANAI

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

Abstract: An extreme ultraviolet light generation system may include a chamber, a first partition wall having at least one opening which provides communication between a first space and a second space, an EUV light concentrating mirror located in the second space and configured to concentrate extreme ultraviolet light generated in a plasma generation region located in the first space, a first gas supply port formed at the chamber, and a gas exhaust port formed in the first partition wall, a distance between the center of the plasma generation region and an edge of the at least one opening being equal to or more than a stop distance LSTOP [mm] calculated by the following equation. LSTOP=272.8·EVG0.4522·P−1 EAVG [eV] representing average kinetic energy of ions generated in the plasma generation region and P [Pa] representing a gas pressure inside the first partition wall

公开(公告)号：US20210289611A1

公开(公告)日：2021-09-16

申请号：US17156376

申请日：2021-01-22

Applicant: Gigaphoton Inc.

Inventor： Atsushi UEDA ,  Takayuki OSANAI ,  Koichiro KOGE

IPC: H05G2/00 ,  G21K1/06 ,  G03F7/20

Abstract: A chamber device may include a concentrating mirror, a central gas supply port, an inner wall, an exhaust port, a recessed portion, and a lateral gas supply port. The recessed portion may be on a side lateral to the focal line and recessed outward from the inner wall when viewed from a direction perpendicular to the focal line. The lateral gas supply port is formed at the recessed portion and may supply gas toward gas supplied from the central gas supply port so that a flow direction of the gas supplied from the central gas supply port is bent from a direction along the focal line toward the exhaust port and an internal space of the recessed portion.