公开(公告)号：US20240337950A1

公开(公告)日：2024-10-10

申请号：US18575925

申请日：2022-07-04

申请人： FUSION BIONIC GMBH

发明人： Tim KUNZE ,  Sabri ALAMRI

IPC分类号： G03F7/00 ,  G02B27/09 ,  G02B27/10

CPC分类号： G03F7/70408 ,  G02B27/0927 ,  G02B27/0955 ,  G02B27/1093 ,  G03F7/70025

摘要： The present invention relates to the field of patterning substrates with periodic dot structures in the micro- or sub-micrometer range, in particular to an apparatus and a method for structuring surfaces and the interior of a transparent substrate by means of laser interference structuring. The pattern produced in this way with periodic dot structures in the micro- or sub-micrometer range is characterized by a pronounced anti-reflective property. In addition, the present invention relates to a patterned substrate with anti-reflective properties comprising a periodic dot structure.

公开(公告)号：US12085585B2

公开(公告)日：2024-09-10

申请号：US18142913

申请日：2023-05-03

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： En Hao Lai ,  Chi Yang ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Po-Chung Cheng

IPC分类号： G01P5/20 ,  G02B27/00 ,  G03F1/42 ,  G03F7/00 ,  G03F7/20 ,  H05G2/00

CPC分类号： G01P5/20 ,  G02B27/0006 ,  G03F1/42 ,  G03F7/20 ,  G03F7/70025 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A method includes irradiating a target droplet in an extreme ultraviolet light source of an extreme ultraviolet lithography tool with light from a droplet illumination module. Light reflected and/or scattered by the target droplet is detected. Particle image velocimetry is performed to monitor one or more flow parameters inside the extreme ultraviolet light source.

公开(公告)号：US12078933B2

公开(公告)日：2024-09-03

申请号：US17501848

申请日：2021-10-14

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Tai-Yu Chen ,  Shang-Chieh Chien ,  Sheng-Kang Yu ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC分类号： G03F7/00 ,  G06N20/00

CPC分类号： G03F7/70033 ,  G03F7/70025 ,  G03F7/709 ,  G06N20/00

摘要： An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a collector and a plurality of vibration sensors coupled to the collector. The vibration sensors generate sensor signals indicative of shockwaves from laser pulses and impacts from debris. The system utilizes the sensor signals to improve the quality of EUV light generation.

公开(公告)号：US12032319B2

公开(公告)日：2024-07-09

申请号：US17735455

申请日：2022-05-03

申请人： CANON KABUSHIKI KAISHA

发明人： Yoji Misao

IPC分类号： G03G15/01 ,  B41J2/44 ,  B41J2/45 ,  B41J2/455 ,  B41J2/47 ,  B41J29/02 ,  G03F7/00 ,  G03G13/04 ,  G03G13/06 ,  G03G13/20 ,  G03G15/00 ,  G03G15/04 ,  G03G15/043

CPC分类号： G03G15/80 ,  B41J2/442 ,  B41J2/45 ,  B41J2/455 ,  G03F7/70025 ,  G03G13/04 ,  G03G13/06 ,  G03G13/20 ,  G03G15/011 ,  G03G15/0121 ,  G03G15/0142 ,  G03G15/04072 ,  G03G15/043

摘要： An image forming apparatus includes a unit configured to perform image forming operation, a unit board in the unit, a wiring configured to be connected to the unit board, and a control board configured to be connected to the unit board with the wiring and control the unit. The unit board includes a connector to which the wiring is to be connected. A length of the connector in a longitudinal direction of the connector is longer than a length of the unit board in a widthwise direction of the unit board, and the longitudinal direction of the connector intersects the widthwise direction of the unit board.

公开(公告)号：US20240217253A1

公开(公告)日：2024-07-04

申请号：US18590518

申请日：2024-02-28

申请人： FUJIFILM Corporation

发明人： Atsushi MATSUURA ,  Keisuke Arimura

IPC分类号： B41N1/08 ,  B41C1/10 ,  B41N3/08 ,  G03F7/00 ,  G03F7/30

CPC分类号： B41N1/083 ,  B41C1/1016 ,  B41N3/08 ,  G03F7/3035 ,  G03F7/70025 ,  B41C2201/06 ,  B41C2210/04 ,  B41C2210/08

摘要： The present invention provides a support for a lithographic printing plate, from which a lithographic printing plate precursor having excellent scratch resistance can be obtained by combining the support with an image recording layer, a lithographic printing plate precursor, and a method of producing a lithographic printing plate. The support for a lithographic printing plate according to the present invention, including an aluminum plate, and an anodized aluminum film disposed on the aluminum plate, in which a plurality of projections are present on a surface of the support for a lithographic printing plate on a side of the anodized film, an average value of equivalent circular diameters of the projections in a cut surface at a position that is 0.5 μm greater than a position of the projections with an average height is in a range of 3.0 to 10.0 μm, and a density of the projections with a height of 0.5 μm or greater from the position of the projections with the average height is in a range of 3,000 to 9,000 pc/mm2.

公开(公告)号：US20240208200A1

公开(公告)日：2024-06-27

申请号：US18588680

申请日：2024-02-27

申请人： FUJIFILM Corporation

发明人： Shumpei WATANABE ,  Akira SAKAGUCHI

IPC分类号： B41C1/10 ,  B41N1/08 ,  B41N3/08 ,  G03F7/00 ,  G03F7/20

CPC分类号： B41C1/1016 ,  B41N1/083 ,  B41N3/08 ,  G03F7/2004 ,  G03F7/70025 ,  B41C2201/02 ,  B41C2201/06 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22

摘要： The present invention provides an on-press development type lithographic printing plate precursor including, in the following order, a support, an image-recording layer, and a protective layer, in which the image-recording layer contains a) a polymerizable compound, b) an infrared absorber, c) a polymerization initiator, and d) a color forming substance precursor, and the protective layer contains an ultraviolet absorber, and a method of preparing a printing plate.

公开(公告)号：US20240128702A1

公开(公告)日：2024-04-18

申请号：US18399011

申请日：2023-12-28

申请人： Gigaphoton Inc.

发明人： Shinichi MATSUMOTO

IPC分类号： H01S3/00 ,  G03F7/00 ,  H01S3/23

CPC分类号： H01S3/0071 ,  G03F7/70025 ,  G03F7/7015 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70316 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/2308

摘要： A bypass apparatus is attachable to and detachable from a laser apparatus, and constitutes a bypass optical path bypassing a pulse width stretching apparatus stretching the pulse width of pulse laser light having entered the pulse width stretching apparatus, the bypass apparatus including optical elements constituting the bypass optical path, and an enclosure housing the optical elements, the optical elements including a first highly reflective mirror that reflects the pulse laser light entering the pulse width stretching apparatus out of the pulse width stretching apparatus and that guides the reflected pulse laser light to the bypass optical path, and a second highly reflective mirror reflecting the pulse laser light reflected off the first highly reflective mirror and incident on the second highly reflective mirror through the bypass optical path to cause the reflected pulse laser light to return to a light-exiting-side optical path of the pulse width stretching apparatus.

公开(公告)号：US20240111219A1

公开(公告)日：2024-04-04

申请号：US18539324

申请日：2023-12-14

申请人： Gigaphoton Inc.

发明人： Shigeto KISHIMOTO ,  Hirotaka MIYAMOTO

IPC分类号： G03F7/00 ,  H01S3/134

CPC分类号： G03F7/70575 ,  G03F7/70025 ,  H01S3/134

摘要： A wavelength control method in a laser apparatus including a wavelength actuator configured to cyclically change the wavelength of pulse laser light output in the form of a burst includes reading data on a wavelength target value, determining from the data a first target wavelength and a second target wavelength shorter than the first target wavelength, and setting wavelengths of at least one first-period long wavelength pulse and at least one first-period short wavelength pulse contained in a first period at a start of a burst to a first set wavelength shorter than the first target wavelength and a second set wavelength longer than the second target wavelength, respectively, by using the first target wavelength and the second target wavelength to control the wavelength actuator.

公开(公告)号：US11860540B2

公开(公告)日：2024-01-02

申请号：US17308334

申请日：2021-05-05

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Jun Hatakeyama

IPC分类号： G03F7/039 ,  G03F7/38 ,  C08F220/04 ,  C08F220/38 ,  G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/70025 ,  C08F220/04 ,  C08F220/382

摘要： A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a sulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and improved CDU, and forms a pattern of good profile after exposure and development.

公开(公告)号：US20230400787A1

公开(公告)日：2023-12-14

申请号：US18210548

申请日：2023-06-15

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： Chih-Ping YEN ,  Yen-Shuo SU ,  Jui-Pin WU ,  Chun-Lin CHANG ,  Han-Lung CHANG ,  Heng-Hsin LIU

IPC分类号： G03F7/00

CPC分类号： G03F7/70925 ,  G03F7/70033 ,  G03F7/70916 ,  G03F7/70025 ,  G03F7/70975

摘要： An apparatus for manufacturing semiconductors includes a power amplifier to power a laser, a catalyst disposed in the power amplifier, an inlet port, and an exhaust port. The inlet port introduces a mixing gas to an interior of the power amplifier during a cleaning operation so that the mixing gas contacts a surface of the catalyst having a build-up thereon. The mixing gas reacts with and removes the build-up by generating gaseous by-products. The exhaust port removes the gaseous by-products from the power amplifier.