公开(公告)号：US07050710B2

公开(公告)日：2006-05-23

申请号：US10491432

申请日：2002-10-22

申请人： Hiroshi Shinya ,  Yasutaka Souma ,  Takahiro Kitano

发明人： Hiroshi Shinya ,  Yasutaka Souma ,  Takahiro Kitano

IPC分类号： F26B19/00

CPC分类号： H01L21/67109

摘要： A heat treatment apparatus configured to perform heat treatment on a wafer having a surface on which a coating film is formed, and includes: a holding member for holding the wafer almost horizontally; a chamber for housing the wafer held by the holding member; a hot plate having gas permeability and disposed above the wafer held by the holding member in the chamber so that the coating film formed on the wafer can be directly heated; and an exhaust port provided on the top face of the chamber and exhausting gas in the chamber. Gas generated from the coating film passes through the hot plate and is exhausted from the chamber. Accordingly, uniformity of a coating film is improved. As a result, CD uniformity may be improved, LER characteristics may be improved, and a smooth pattern side face may be obtained.

摘要翻译： 一种热处理设备，被配置为对具有形成有涂膜的表面的晶片进行热处理，并且包括：用于保持晶片几乎水平的保持构件; 用于容纳由保持构件保持的晶片的室; 具有透气性的热板，并且设置在由所述保持构件保持在所述室中的所述晶片上方，使得可以直接加热形成在所述晶片上的涂膜; 以及设置在所述室的顶面上并在所述室中排出气体的排气口。 从涂膜产生的气体通过热板并从室排出。 因此，涂膜的均匀性提高。 结果，可以提高CD均匀性，可以提高LER特性，并且可以获得平滑的图案侧面。

公开(公告)号：US06986214B2

公开(公告)日：2006-01-17

申请号：US10859088

申请日：2004-06-03

申请人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

发明人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： F26B3/00

CPC分类号： H01L21/67109 ,  H01L21/67034 ,  Y10S134/902

摘要： A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

公开(公告)号：US07060939B2

公开(公告)日：2006-06-13

申请号：US10377802

申请日：2003-03-04

申请人： Hiroshi Shinya ,  Takahiro Kitano

发明人： Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： F27B5/14

CPC分类号： H01L21/67253 ,  H01L21/67098 ,  H01L21/67248

摘要： A substrate on which a resist solution is applied is mounted on a heating plate in a processing vessel. Then, a purge gas is supplied into the processing vessel, and heating is started. Above the mounting position of the substrate, a thickness detecting sensor for monitoring the thickness of the resist film formed on the surface of the substrate is provided. When the thickness becomes a predetermined value or less, a control part causes a lift pin to upwardly move so as to increase the distance between the substrate and the heating plate. Thus, the heating value applied to the substrate decreases, and thereafter, only the solvent is volatilized without having a bad influence on a polymer in the resist film.

摘要翻译： 将其上施加有抗蚀剂溶液的基板安装在处理容器中的加热板上。 然后，向处理容器供给净化气体，开始加热。 在基板的安装位置之上，设置有用于监测形成在基板的表面上的抗蚀剂膜的厚度的厚度检测传感器。 当厚度变为预定值或更小时，控制部分使提升销向上移动，以增加基板和加热板之间的距离。 因此，施加到基板的加热值降低，此后仅溶剂挥发而对抗蚀剂膜中的聚合物没有不利影响。

公开(公告)号：US20070137556A1

公开(公告)日：2007-06-21

申请号：US11525904

申请日：2006-09-25

申请人： Hiroshi Shinya ,  Takahiro Kitano

发明人： Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： B05C13/02

CPC分类号： H01L21/67017

摘要： A thermal processing apparatus has a discharger for discharging process gas from a processing chamber and a ceiling plate provided between the substrate and the discharger. The ceiling plate has apertures at different aperture ratios in accordance with distances from the center of the ceiling plate. The apparatus may have dischargers provided over concentric circles of the substrate and adjusters for adjusting a discharging amount of the corresponding discharger. The apparatus may have gas suppliers provided over the concentric circles of the substrate and adjusters each for adjusting a supply amount of the corresponding supplier.

摘要翻译： 热处理装置具有用于从处理室排出处理气体的排放器和设置在基板和排出器之间的顶板。 天花板根据距离天花板中心的距离，具有不同孔径比的孔径。 该设备可以具有设置在基板的同心圆上的放电器和用于调节相应放电器的放电量的调节器。 该设备可以具有在基板的同心圆上提供的气体供应器和每个用于调节相应供应商的供应量的调节器。

公开(公告)号：US20060127593A1

公开(公告)日：2006-06-15

申请号：US11352340

申请日：2006-02-13

申请人： Hiroshi Shinya ,  Takahiro Kitano

发明人： Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： H05B3/68

CPC分类号： H01L21/67253 ,  H01L21/67098 ,  H01L21/67248

摘要： With respect to a substrate on which a resist solution is applied, the inplane uniformity of the quality of a resist film is improved in a heating processing carried out before exposure, and the yields of products are improved. A substrate on which a resist solution is applied is mounted on a heating plate in a processing vessel. Then, a purge gas is supplied into the processing vessel, and heating is started. Above the mounting position of the substrate, a thickness detecting sensor for monitoring the thickness of the resist film formed on the surface of the substrate is provided. When the thickness becomes a predetermined value or less, a control part cause a lift pin to upwardly move so as to increase the distance between the substrate and the heating plate. Thus, the heating value applied to the substrate decreases, and thereafter, only the solvent is volatilized without having a bad influence on a polymer in the resist film.

公开(公告)号：US20050160619A1

公开(公告)日：2005-07-28

申请号：US11087690

申请日：2005-03-24

申请人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

发明人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： H01L21/00 ,  F26B5/04 ,  B41F35/00

CPC分类号： H01L21/67109 ,  H01L21/67034 ,  Y10S134/902

摘要： A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

摘要翻译： 低压干燥器在低压下干燥在其上涂布涂布溶液的基材。 干燥机包括安装基板台的气密室，以将基板放置在其上; 扩散板，其设置为具有间隙放置在基板台上的基板，用于将存在于间隙中的气体朝向外部排出，扩散板具有与基板大致相同或更大的尺寸; 衬底温度调节器，安装在衬底台中，用于调节衬底的温度; 以及用于对气密室进行减压的减压机构。 扩散板具有温度调节器，用于使温度调节在扩散板的第一区域和第二区域之间具有温度差，第一区域面向基板的中心区域，第二区域在第一区域的外部，并且包括 面向衬底的外部区域的区域。

公开(公告)号：US07223945B2

公开(公告)日：2007-05-29

申请号：US11352340

申请日：2006-02-13

申请人： Hiroshi Shinya ,  Takahiro Kitano

发明人： Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： H05B1/02

CPC分类号： H01L21/67253 ,  H01L21/67098 ,  H01L21/67248

摘要： With respect to a substrate on which a resist solution is applied, the inplane uniformity of the quality of a resist film is improved in a heating processing carried out before exposure, and the yields of products are improved. A substrate on which a resist solution is applied is mounted on a heating plate in a processing vessel. Then, a purge gas is supplied into the processing vessel, and heating is started. Above the mounting position of the substrate, a thickness detecting sensor for monitoring the thickness of the resist film formed on the surface of the substrate is provided. When the thickness becomes a predetermined value or less, a control part cause a lift pin to upwardly move so as to increase the distance between the substrate and the heating plate. Thus, the heating value applied to the substrate decreases, and thereafter, only the solvent is volatilized without having a bad influence on a polymer in the resist film.

摘要翻译： 对于其上施加抗蚀剂溶液的基板，在曝光之前进行的加热处理中抗蚀剂膜的质量的面内均匀性得到改善，并且产品的收率得到改善。 将其上施加有抗蚀剂溶液的基板安装在处理容器中的加热板上。 然后，向处理容器供给净化气体，开始加热。 在基板的安装位置之上，设置有用于监测形成在基板的表面上的抗蚀剂膜的厚度的厚度检测传感器。 当厚度变为预定值或更小时，控制部分使升降销向上移动，以增加基板和加热板之间的距离。 因此，施加到基板的加热值降低，此后仅溶剂挥发而对抗蚀剂膜中的聚合物没有不利影响。

公开(公告)号：US07024798B2

公开(公告)日：2006-04-11

申请号：US11087690

申请日：2005-03-24

申请人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

发明人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： F26B3/00

CPC分类号： H01L21/67109 ,  H01L21/67034 ,  Y10S134/902

摘要： A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

公开(公告)号：US06796054B2

公开(公告)日：2004-09-28

申请号：US10384571

申请日：2003-03-11

申请人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

发明人： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

IPC分类号： F26B300

CPC分类号： H01L21/67109 ,  H01L21/67034 ,  Y10S134/902

摘要： A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

摘要翻译： 低压干燥器在低压下干燥在其上涂布涂布溶液的基材。 干燥机包括安装基板台的气密室，以将基板放置在其上; 扩散板，其设置为具有间隙放置在基板台上的基板，用于将存在于间隙中的气体朝向外部排出，扩散板具有与基板大致相同或更大的尺寸; 衬底温度调节器，安装在衬底台中，用于调节衬底的温度; 以及用于对气密室进行减压的减压机构。 扩散板具有温度调节器，用于使温度调节在扩散板的第一区域和第二区域之间具有温度差，第一区域面向基板的中心区域，第二区域在第一区域的外部，并且包括 面向衬底的外部区域的区域。

公开(公告)号：US09315679B2

公开(公告)日：2016-04-19

申请号：US12597802

申请日：2008-04-24

申请人： Takahiro Kitano

发明人： Takahiro Kitano

IPC分类号： B32B9/00 ,  C09D5/24 ,  C01B31/02 ,  B05D7/04

CPC分类号： C09D5/24 ,  B05D7/04 ,  B05D2601/20 ,  C01B32/158 ,  C01B2202/00 ,  Y10T428/30

摘要： Disclosed is a transparent conductive film containing a single-walled carbon nanotube and a fullerene.

摘要翻译： 公开了含有单壁碳纳米管和富勒烯的透明导电膜。