摘要:
In a load port apparatus, a slit is formed between an inner circumferential surface of an opening on a wall of the chamber of the apparatus and an outer circumferential surface of a door. In a predetermined section of the slit, the slit width at the chamber side opening of the slit is made larger than the slit width at other positions with respect to the depth direction of the slit. By this feature, gas flow from the interior of the load port apparatus to the exterior through a clearance formed between the inner surface of the opening that allows to bring wafers out of/into a pod and the door that substantially closes the opening can be made stable.
摘要:
A fine pressure fluctuation at short time intervals occurring when a portable type hermetically sealed container is purged is reduced to thereby prevent the deterioration or the like of a seal member due to the pressure fluctuation. In order to achieve this object, a gas flow rate regulating apparatus is disposed in a gas supplying system in a purging system, and pressure in the portable type hermetically sealed container during purge is measured and the result thereof is fed back to thereby control the flow rate of a supplied gas.
摘要:
A seal member has a configuration including a ring-shaped main body portion, an inner peripheral lip portion protruding from a ring inner peripheral portion of the main body portion and an outer peripheral lip portion protruding from a ring outer peripheral portion of the main body portion. The inner peripheral lip portion takes an O-ring shape deformable in a protruding direction. The outer peripheral lip portion takes a structure deformable in a direction different from an extending direction, corresponding to a pressure in a sealed area. The member preferably seals when in communication with a plurality of spaces separated from an external space, the plurality of spaces from an external environment.
摘要:
A fine pressure fluctuation at short time intervals occurring when a portable type hermetically sealed container is purged is reduced to thereby prevent the deterioration or the like of a seal member due to the pressure fluctuation. In order to achieve this object, a gas flow rate regulating apparatus is disposed in a gas supplying system in a purging system, and pressure in the portable type hermetically sealed container during purge is measured and the result thereof is fed back to thereby control the flow rate of a supplied gas.
摘要:
In a load port apparatus, a slit is formed between an inner circumferential surface of an opening on a wall of the chamber of the apparatus and an outer circumferential surface of a door. In a predetermined section of the slit, the slit width at the chamber side opening of the slit is made larger than the slit width at other positions with respect to the depth direction of the slit. By this feature, gas flow from the interior of the load port apparatus to the exterior through a clearance formed between the inner surface of the opening that allows to bring wafers out of/into a pod and the door that substantially closes the opening can be made stable.
摘要:
In a load port apparatus, a clearance is formed between an inner circumferential surface of an opening of the chamber and an outer circumferential surface of a door. The area of the clearance between the plate and the opening portion on a plane flush with an interior side of the chamber is larger than the area of the clearance between the plate and the opening portion on a plane flush with the exterior of the chamber. A fan located at an upper side of the chamber generates a first flow of air in the downward direction. The clearance generates a second flow of air from the interior of the chamber to the exterior of the chamber. The second flow of air is generated by the difference in the area of the interior cross section of the clearance and area of the exterior cross section of the clearance.
摘要:
In order to easily and surely remove contaminants or the like from wafers stored in a pod (FOUP), a gas supply pipe is located above an opening portion in a FIMS system. A clean gas is blown to the upper surfaces of the wafers stored in the inner portion of the pod through the gas supply pipe to remove the contaminants or the like from wafers.
摘要:
A seal member has a configuration including a ring-shaped main body portion, an inner peripheral lip portion protruding from a ring inner peripheral portion of the main body portion and an outer peripheral lip portion protruding from a ring outer peripheral portion of the main body portion. The inner peripheral lip portion takes an O-ring shape deformable in a protruding direction. The outer peripheral lip portion takes a structure deformable in a direction different from an extending direction, corresponding to a pressure in a sealed area. The member preferably sealing, when communicating a plurality of spaces separated from an external space, these spaces from an external environment, is thereby provided.
摘要:
In order to easily and surely remove contaminants or the like from wafers stored in a pod (FOUP), a gas supply pipe is located above an opening portion in a FIMS system. A clean gas is blown to the upper surfaces of the wafers stored in the inner portion of the pod through the gas supply pipe to remove the contaminants or the like from wafers.
摘要:
In a load port apparatus, a clearance is formed between an inner circumferential surface of an opening of the chamber and an outer circumferential surface of a door. The area of the clearance between the plate and the opening portion on a plane flush with an interior side of the chamber is larger than the area of the clearance between the plate and the opening portion on a plane flush with the exterior of the chamber. A fan located at an upper side of the chamber generates a first flow of air in the downward direction. The clearance generates a second flow of air from the interior of the chamber to the exterior of the chamber. The second flow of air is generated by the difference in the area of the interior cross section of the clearance and area of the exterior cross section of the clearance.