Abstract:
The disclosure provides a method for fabricating a semiconductor layer having a textured surface, including: (a) providing a textured substrate; (b) forming at least one semiconductor layer on the textured substrate; (c) forming a metal layer on the semiconductor layer; and (d) conducting a thermal process or a low temperature process to the textured substrate, the semiconductor layer and the metal layer, wherein the semiconductor layer is separated from the textured substrate by the thermal process to obtain the semiconductor layer having the metal layer and a textured surface.
Abstract:
A solar cell is disclosed. A substrate includes a first surface and a second surface, wherein the substrate is of a first type. A through hole passes through the substrate, wherein the substrate includes a third surface in the through hole. An insulating layer is on the third surface in the through hole and extends to be over the second surface of the substrate. A first thin film semiconductor layer is disposed on the first surface of the substrate, wherein the first thin film semiconductor layer is of a first type. A transparent conductive layer is on the first thin film semiconductor layer. A through hole connection layer is disposed in the through hole and extends to be over the first surface and the second surface of the substrate.