Wire-based metallization for solar cells

    公开(公告)号:US12132126B2

    公开(公告)日:2024-10-29

    申请号:US17836822

    申请日:2022-06-09

    CPC classification number: H01L31/022441 H01L31/0682 Y02E10/547

    Abstract: Approaches for fabricating wire-based metallization for solar cells, and the resulting solar cells, are described. In an example, a solar cell includes a substrate having a back surface and an opposing light-receiving surface. A plurality of alternating N-type and P-type semiconductor regions is disposed in or above the back surface of the substrate. A conductive contact structure is disposed on the plurality of alternating N-type and P-type semiconductor regions. The conductive contact structure includes a plurality of metal wires. Each metal wire of the plurality of metal wires is parallel along a first direction to form a one-dimensional layout of a metallization layer for the solar cell.

    Solar cell module
    7.
    发明授权

    公开(公告)号:US11908957B2

    公开(公告)日:2024-02-20

    申请号:US14622034

    申请日:2015-02-13

    Inventor: Taeki Woo

    CPC classification number: H01L31/0201 H01L31/0516 H01L31/0682 Y02E10/547

    Abstract: A solar cell module includes first and second solar cells each including a plurality of first and second electrodes formed on a back surface of a semiconductor substrate, a first conductive line connected to the first electrodes, and a second conductive line connected to the second electrodes, and an interconnector connecting the first conductive line of the first solar cell to the second conductive line of the second solar cell. At least one of an area of an overlap portion, an area of a connection portion, a connection position, and a connection shape between the interconnector and the first conductive line of the first solar cell is different from at least one of an area of an overlap portion, an area of a connection portion, a connection position, and a connection shape between the interconnector and the second conductive line of the second solar cell.

    Back Structure of Solar Cell, and Solar Cell with Back Structure

    公开(公告)号:US20240014329A1

    公开(公告)日:2024-01-11

    申请号:US18035094

    申请日:2021-02-02

    CPC classification number: H01L31/02167 H01L31/0682

    Abstract: Some embodiments of the present disclosure provide a back structure of a solar cell. The back structure includes an aluminum oxide film layer disposed on a silicon wafer substrate, and a first silicon nitride film layer and a first silicon oxynitride film layer, which are successively disposed on the aluminum oxide film layer from inside to outside; and the back structure further includes a second silicon nitride film layer disposed on the first silicon oxynitride film layer. The refractive index of the first silicon nitride film layer is greater than that of the second silicon nitride film layer, and the refractive index of the second silicon nitride film layer is greater than that of the first silicon oxynitride film layer.

    SOLAR CELL AND PHOTOVOLTAIC MODULE
    10.
    发明公开

    公开(公告)号:US20230402553A1

    公开(公告)日:2023-12-14

    申请号:US17866217

    申请日:2022-07-15

    CPC classification number: H01L31/02168 H01L31/0682

    Abstract: A solar cell includes: a substrate having front and back surfaces opposite to each other, the back surface includes first regions, second regions and gap regions, the first regions and the second regions are staggered and spaced from each other in a first direction, and each gap region is provided between one first region and one adjacent second region; a first conductive layer formed over the first region; a second conductive layer formed over the second region, the second conductive layer has a conductivity type opposite to the first conductive layer; a first electrode forming electrical contact with the first conductive layer; a second electrode forming electrical contact with the second conductive layer; and first pyramidal texture structures formed on the back surface corresponding to the gap regions. A curved interface region is formed between side wall of the first/second conductive layer and side wall of the adjacent gap region.

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