公开(公告)号：US20240355819A1

公开(公告)日：2024-10-24

申请号：US18760970

申请日：2024-07-01

Applicant: Intel Corporation

Inventor： Quan SHI ,  Sukru YEMENICIOGLU ,  Marni NABORS ,  Nikolay RYZHENKO ,  Xinning WANG ,  Sivakumar VENKATARAMAN

IPC: H01L27/088 ,  H01L23/50 ,  H01L29/06 ,  H01L29/78

CPC classification number: H01L27/0886 ,  H01L23/50 ,  H01L29/0669 ,  H01L29/785 ,  H01L2029/7858

Abstract: Integrated circuit structures having front side signal lines and backside power delivery are described. In an example, an integrated circuit structure includes a plurality of gate lines extending over a plurality of semiconductor nanowire stack or fin channel structures within a cell boundary. A plurality of trench contacts is extending over a plurality of source or drain structures within the cell boundary, individual ones of the plurality of trench contacts alternating with individual ones of the plurality of gate lines. A first signal line, a second signal line, a third signal line, and a fourth signal line are over the plurality of gate lines and the plurality of trench contacts within the cell boundary. A backside power delivery line is coupled to one of the plurality of trench contacts within the cell boundary.

公开(公告)号：US20220262791A1

公开(公告)日：2022-08-18

申请号：US17176412

申请日：2021-02-16

Applicant: Intel Corporation

Inventor： Quan SHI ,  Sukru YEMENICIOGLU ,  Marni NABORS ,  Nikolay RYZHENKO ,  Xinning WANG ,  Sivakumar VENKATARAMAN

IPC: H01L27/088 ,  H01L23/50 ,  H01L29/06 ,  H01L29/78

Abstract: Integrated circuit structures having front side signal lines and backside power delivery are described. In an example, an integrated circuit structure includes a plurality of gate lines extending over a plurality of semiconductor nanowire stack or fin channel structures within a cell boundary. A plurality of trench contacts is extending over a plurality of source or drain structures within the cell boundary, individual ones of the plurality of trench contacts alternating with individual ones of the plurality of gate lines. A first signal line, a second signal line, a third signal line, and a fourth signal line are over the plurality of gate lines and the plurality of trench contacts within the cell boundary. A backside power delivery line is coupled to one of the plurality of trench contacts within the cell boundary.

公开(公告)号：US20240362391A1

公开(公告)日：2024-10-31

申请号：US18769148

申请日：2024-07-10

Applicant: Intel Corporation

Inventor： Ranjith KUMAR ,  Quan SHI ,  Mark T. BOHR ,  Andrew W. YEOH ,  Sourav CHAKRAVARTY ,  Barbara A. CHAPPELL ,  M. Clair WEBB

IPC: G06F30/392 ,  G06F30/20 ,  G06F30/337 ,  G06F30/347 ,  G06F30/373 ,  G06F30/3947 ,  H01L27/02 ,  H01L27/092 ,  H01L27/118

CPC classification number: G06F30/392 ,  G06F30/337 ,  G06F30/347 ,  H01L27/0207 ,  H01L27/0924 ,  H01L27/11807 ,  G06F30/20 ,  G06F30/373 ,  G06F30/3947 ,  H01L2027/11875

Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.

公开(公告)号：US20220149075A1

公开(公告)日：2022-05-12

申请号：US17585101

申请日：2022-01-26

Applicant: Intel Corporation

Inventor： Ranjith KUMAR ,  Quan SHI ,  Mark T. BOHR ,  Andrew W. YEOH ,  Sourav CHAKRAVARTY ,  Barbara A. CHAPPELL ,  M. Clair WEBB

IPC: H01L27/118 ,  G06F30/392 ,  H01L27/02 ,  H01L27/092

Abstract: Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.